Patents by Inventor Koen Ingen Schenau

Koen Ingen Schenau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for coating a substrate for euv lithography and substrate with photoresist layer
    Publication number: 20050008864
    Abstract: A method for coating a substrate for EUV lithography includes coating a photoresist layer on the substrate. A device manufacturing method using a lithographic projection apparatus includes providing a substrate that is at least partially covered by a photoresist layer by coating the photoresist layer on the substrate and projecting a patterned beam of radiation onto a target portion of the photoresist layer. A substrate includes a photoresist layer.
    Type: Application
    Filed: May 19, 2004
    Publication date: January 13, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Ingen Schenau, Marcel Mathijs Marie Dierichs