Patents by Inventor Kohei Fukushima

Kohei Fukushima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210268113
    Abstract: The object of the present invention is to provide a technique for promoting membrane permeation of a drug, which is highly versatile and highly safe. The object can be solved by a polymer compound having a molecular weight of 1000 or more, wherein the polymer compound has, at an end of a side chain, one arginine or a basic peptide of chain length of 2 to 6 containing one or more arginine, and comprises a guanidino group of 0.5 to 20 mmol/g, originating from arginine.
    Type: Application
    Filed: July 11, 2019
    Publication date: September 2, 2021
    Applicants: JOSHO GAKUEN EDUCATIONAL FOUNDATION, ADEKA CORPORATION
    Inventors: Shinji SAKUMA, Masami UKAWA, Shunsuke TAKAHI, Kazunori FUKUSHIMA, Mio MUTO, Kohei MIYATA, Akiko TASAKI, Hotaru MATSUMOTO
  • Publication number: 20200058526
    Abstract: A vertical heat treatment apparatus includes: a substrate holder including a column, substrate holding parts configured to hold the substrates, and gas flow guide parts installed in the column in a corresponding relationship with the substrates; an elevator stand configured to support the substrate holder and to load the substrate holder into the reaction vessel from below the reaction vessel; a rotating mechanism installed in the elevator stand and configured to rotate the substrate holder about a vertical axis; a process gas supply port and an exhaust port respectively formed at a rear side and a front side of a substrate holding region; and a plurality of baffle parts installed independently of the substrate holder so that the baffle parts protrude from the outside toward spaces between the gas flow guide parts adjoining each other and run into the spaces.
    Type: Application
    Filed: October 23, 2019
    Publication date: February 20, 2020
    Inventors: Hiroki IRIUDA, Kohei FUKUSHIMA
  • Patent number: 10475641
    Abstract: A substrate processing apparatus includes an inner tube installed to accommodate a plurality of substrates and having a first opening, an outer tube configured to surround the inner tube, a movable wall installed inside the inner tube or between the inner tube and the outer tube, configured to be movable, and having a second opening, a gas supply part configured to supply a process gas to the substrates and an exhaust part installed outside the movable wall and configured to exhaust the process gas supplied to the substrates.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: November 12, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kohei Fukushima, Hiromi Nitadori
  • Patent number: 10287682
    Abstract: A substrate processing apparatus includes: a process container configured to receive a substrate therein; a pressure detection part configured to measure an internal pressure of the process container; an exhaust-side valve installed in an exhaust pipe configured to exhaust an interior of the process container; a gas storage tank connected to the process container through a first gas supply pipe; a gas amount measuring part configured to measure an amount of gas stored in the gas storage tank; and a control valve installed in the first gas supply pipe and configured to control the internal pressure of the process container by changing an opening degree of the control valve based on the internal pressure of the process container which is detected by the pressure detection part and by controlling a flow path cross section through which the gas is supplied from the gas storage tank to the process container.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: May 14, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuyuki Kikuchi, Tsuneyuki Okabe, Kohei Fukushima
  • Publication number: 20190093230
    Abstract: A substrate processing method includes supplying processing gas from a plurality of gas holes formed along a longitudinal direction of an injector, which extends in a vertical direction along an inner wall surface of a processing container and is rotatable around a rotational axis extending in the vertical direction, to perform a predetermined process on a substrate accommodated in the processing container. The predetermined process includes a plurality of operations, and a supply direction of the processing gas is changed by rotating the injector in accordance with the operations.
    Type: Application
    Filed: September 20, 2018
    Publication date: March 28, 2019
    Inventor: Kohei FUKUSHIMA
  • Publication number: 20180258528
    Abstract: A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.
    Type: Application
    Filed: March 5, 2018
    Publication date: September 13, 2018
    Inventors: Kohei FUKUSHIMA, Tsuneyuki OKABE
  • Patent number: 9970111
    Abstract: A substrate processing apparatus includes: a processing vessel configured to be vacuumed; a holding unit configured to hold a plurality of substrates and to be inserted into or separated from the processing vessel; a gas supply unit configured to supply gas into the processing vessel; a plasma generation box partitioned and formed by a plasma partition wall; an inductively coupled electrode located at an outer sidewall of the plasma generation box along its length direction; a high frequency power supply connected to the inductively coupled electrode through a feed line; and a ground electrode located outside the plasma generation box and between the processing vessel and the inductively coupled electrode and arranged in the vicinity of the outer sidewall of the plasma generation box or at least partially in contact with the outer sidewall.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: May 15, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kohei Fukushima, Hiroyuki Matsuura, Yutaka Motoyama, Koichi Shimada, Takeshi Ando
  • Publication number: 20180087156
    Abstract: A gas introduction mechanism includes a manifold disposed in a process vessel and having an injector support part extending vertically along an inner wall surface of the process vessel and having an insertion hole, and a gas introduction part having a gas flow passage which protrudes outward from the injector support part and which communicates with the insertion hole and an outside of the process vessel so that a gas can flow through the insertion hole and the outside of the process vessel, an injector inserted and fitted into the insertion hole to be supported by the insertion hole, and extending linearly entirely within the injector along the inner wall surface and has an opening communicating with the gas flow passage at a position inserted into the insertion hole, and a rotation mechanism connected to a lower end portion of the injector to rotate the injector.
    Type: Application
    Filed: September 26, 2017
    Publication date: March 29, 2018
    Inventors: Kohei FUKUSHIMA, Hiromi NITADORI
  • Publication number: 20180076021
    Abstract: A substrate processing apparatus includes an inner tube installed to accommodate a plurality of substrates and having a first opening, an outer tube configured to surround the inner tube, a movable wall installed inside the inner tube or between the inner tube and the outer tube, configured to be movable, and having a second opening, a gas supply part configured to supply a process gas to the substrates and an exhaust part installed outside the movable wall and configured to exhaust the process gas supplied to the substrates.
    Type: Application
    Filed: September 8, 2017
    Publication date: March 15, 2018
    Inventors: Kohei FUKUSHIMA, Hiromi NITADORI
  • Patent number: 9789579
    Abstract: In an apparatus for detecting tip-over of a rammer equipped with a crankcase accommodating an output shaft rotatably connected to an engine, a movable unit accommodating a converter mechanism for converting rotation of the output shaft to vertical motion of a movable member, a tamping shoe connected to the movable unit, and a handle operable by an user, and adapted to thrust upward in the gravitational direction by the vertical motion of the movable member and go into a free fall to compact a ground surface, it is determined whether a detected engine speed becomes equal to or smaller than a threshold value set lower than an engine idling speed when the engine has been operated at a rammer working speed set greater than the engine idling speed, and if it does, it is discriminated that the rammer has tipped over.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: October 17, 2017
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Kohei Fukushima, Takamasa Takeshige, Yasunori Matsubara
  • Patent number: 9776202
    Abstract: A driving method of a vertical heat treatment apparatus having a vertical reaction container with a heating part installed includes: performing a process of loading wafers by a substrate holder support to the reaction container; performing a film forming process of storing a first gas at a storage unit and pressurizing the first gas, and alternatively performing a step of supplying the first gas to the vacuum atmosphere reaction container and a step of supplying the second gas to the reaction container; subsequently performing a purge process of unloading the substrate holder support and supplying a purge gas into the reaction container to forcibly peel off a thin film attached to the reaction container; and while the purge process is performed, performing a process of repeating storing the purge gas at the storage unit, pressurizing the gas and discharging the gas into the reaction container.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: October 3, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yutaka Motoyama, Keisuke Suzuki, Kohei Fukushima, Shingo Hishiya
  • Publication number: 20170275757
    Abstract: A substrate processing apparatus includes: a process container configured to receive a substrate therein; a pressure detection part configured to measure an internal pressure of the process container; an exhaust-side valve installed in an exhaust pipe configured to exhaust an interior of the process container; a gas storage tank connected to the process container through a first gas supply pipe; a gas amount measuring part configured to measure an amount of gas stored in the gas storage tank; and a control valve installed in the first gas supply pipe and configured to control the internal pressure of the process container by changing an opening degree of the control valve based on the internal pressure of the process container which is detected by the pressure detection part and by controlling a flow path cross section through which the gas is supplied from the gas storage tank to the process container.
    Type: Application
    Filed: March 24, 2017
    Publication date: September 28, 2017
    Inventors: Kazuyuki KIKUCHI, Tsuneyuki OKABE, Kohei FUKUSHIMA
  • Publication number: 20170114464
    Abstract: A vertical heat treatment apparatus includes: a substrate holder including a column, substrate holding parts configured to hold the substrates, and gas flow guide parts installed in the column in a corresponding relationship with the substrates; an elevator stand configured to support the substrate holder and to load the substrate holder into the reaction vessel from below the reaction vessel; a rotating mechanism installed in the elevator stand and configured to rotate the substrate holder about a vertical axis; a process gas supply port and an exhaust port respectively formed at a rear side and a front side of a substrate holding region; and a plurality of baffle parts installed independently of the substrate holder so that the baffle parts protrude from the outside toward spaces between the gas flow guide parts adjoining each other and run into the spaces.
    Type: Application
    Filed: October 17, 2016
    Publication date: April 27, 2017
    Inventors: Hiroki IRIUDA, Kohei FUKUSHIMA
  • Patent number: 9624579
    Abstract: An apparatus for forming a thin film on a substrate in a reaction container by alternately supplying a raw material gas and a reaction gas into the reaction container under a vacuum atmosphere is provided. The apparatus includes: a raw material gas supply unit installed in an end portion of a supply path of the raw material gas; a pressure adjusting valve installed in an vacuum exhaust path; a pressure regulating valve and an opening and closing valve which are respectively installed in a bypass path detouring the pressure adjusting valve; a tank installed in the middle of the supply path of the raw material gas; a flow rate adjusting valve installed in a downstream side of the tank; and a control unit configured to control the opening and closing valve to be opened when the raw material gas stored in the tank is supplied into the reaction container.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: April 18, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Kohei Fukushima
  • Patent number: 9487859
    Abstract: An operating method of a vertical heat treatment apparatus which performs a film forming process by keeping the interior of a vertical reaction tube surrounded by a heating mechanism at a vacuum atmosphere and by supplying film forming gases to substrates accommodated within the reaction tube, includes: performing a film forming process with respect to the substrates by carrying a substrate holder holding a plurality of substrates in a shelf form into the reaction tube; carrying out the substrate holder from the reaction tube; and carrying a cooling jig into the reaction tube to cool an inner wall of the reaction tube so as to peel a thin film adhering to the inner wall of the reaction tube by a thermal stress and so as to collect the thin film in the cooling jig by thermophoresis.
    Type: Grant
    Filed: March 23, 2015
    Date of Patent: November 8, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yutaka Motoyama, Kohei Fukushima, Keisuke Suzuki, Hiromi Takahashi
  • Publication number: 20160024654
    Abstract: A film forming apparatus includes a first and second source gas suppliers configured to limitedly supply a source gas only to a first and second substrate areas, respectively, a reaction gas supplier configured to supply a reaction gas to the first substrate area and the second substrate area, a purge gas supplier configured to supply a purge gas for preventing the source gas supplied to one of the first and second substrate areas from being supplied to the other substrate area, a division-purpose substrate held between the first and second substrate areas in a substrate holding part, and a control part configured to output a control signal such that a first cycle including supplying the source gas and the reaction gas to the first substrate area and a second cycle including supplying the source gas and the reaction gas to the second substrate area are each performed plural times.
    Type: Application
    Filed: July 27, 2015
    Publication date: January 28, 2016
    Inventors: Kohei FUKUSHIMA, Yutaka MOTOYAMA, Pao-Hwa CHOU
  • Publication number: 20150376789
    Abstract: A vertical heat treatment apparatus includes: a gas supply part that supplies a film forming gas into a reaction chamber; and gas distribution adjusting members arranged above and below a region in which target substrates are disposed. The gas distribution adjusting members include a first plate-shaped member with convex and concave portions and a second plate-shaped member with convex and concave portions, the first plate-shaped member and the second plate-shaped member being arranged above and below each other, and the first plate-shaped member and the second plate-shaped member being arranged above a bottom plate of a substrate holding and supporting part and below a ceiling plate of a substrate holding and supporting part. The first plate-shaped member has a first surface area and the second plate-shaped member has a second surface area different from the first surface area.
    Type: Application
    Filed: September 4, 2015
    Publication date: December 31, 2015
    Inventors: Yutaka MOTOYAMA, Kohei FUKUSHIMA, Masanobu MATSUNAGA, Keiji TABUKI, Yamato TONEGAWA
  • Patent number: D784937
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: April 25, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Yutaka Motoyama, Kohei Fukushima
  • Patent number: D785576
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 2, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Yutaka Motoyama, Kohei Fukushima
  • Patent number: D786810
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: May 16, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Yutaka Motoyama, Kohei Fukushima