Patents by Inventor Koichi Kamijima

Koichi Kamijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6248501
    Abstract: Disclosed are a photosensitive resin composition which comprises: (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group; (D) a photopolymerization initiator which produces free radical by irradiation of active light; and (E) a surface treated phosphor, a photosensitive film and a process for preparing a fluorescent pattern using the same, and a plate for a display panel.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: June 19, 2001
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
  • Patent number: 6077647
    Abstract: Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: June 20, 2000
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
  • Patent number: 5858616
    Abstract: Disclosed are a photosensitive resin composition which comprises:(A) a compound having a carboxyl group;(B) a resin having a carboxyl group;(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: January 12, 1999
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroyuki Tanaka, Hideyasu Tsuiki, Takeshi Nojiri, Koichi Kamijima, Seiji Tai, Seikichi Tanno, Hajime Kakumaru
  • Patent number: 5773508
    Abstract: An antifouling coating composition comprising a biodegradable polymer (A) comprising one or more constituent units (a) capable of imparting biodegradability such as derived from an alkyl vinyl ether, and one or more constituent units (b) derived from e.g. maleic anhydride, itaconic anhydride, or an unsaturated dicarboxylic acid monoester, and an antifouling agent is excellent in coating consuming properties, antifouling performance, biodegradability and other properties.
    Type: Grant
    Filed: September 28, 1995
    Date of Patent: June 30, 1998
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kazuyoshi Tendo, Seiji Tai, Koichi Kamijima, Hiroyuki Tanaka
  • Patent number: 5646198
    Abstract: A coating composition comprising (A) a polymer obtained by polymerizing (a1) one or more unsaturated acid anhydrides or unsaturated carboxylic acids and (a2) one or more other unsaturated monomers copolmerizable therewith, and (B) at least one compound selected from one or both of (b1) a compound group comprising amino-acids, compounds having one or more carboxyl groups in the molecule, compounds having both hydrophobic group and hydrophilic group in the molecule, chelate compounds, hydroxyl- or acetyl-substituted carboxylic acid esters, ion-exchangeable layer clay minerals and powers of inorganic materials which have been made lipophilic with an organic material, and (b2) a group of compound which is crystallizable and selected from polyether compounds, polyester compounds, polyether-polyester compounds, olefinic glycol compounds, acrylic esters, methacrylic esters and polycarbonate compounds, is useful for preparing an antifouling coating composition by mixing with a copper compound.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: July 8, 1997
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroyuki Tanaka, Seiji Tai, Koichi Kamijima, Yumiko Wada, Tsutomu Mamiya, Makoto Murakami, Teruo Yoshida
  • Patent number: 5484685
    Abstract: A naphthalocyanine derivative of the formula: ##STR1## wherein M, Y, R.sup.1, k, l, m, n are as defined in the specification, is an effective substance for forming a recording layer on a substrate of an optical recording medium having high sensitivity with good properties.
    Type: Grant
    Filed: May 30, 1991
    Date of Patent: January 16, 1996
    Assignees: Hitachi, Ltd., Hitachi Chemical Co., Ltd.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Mitsuo Katayose, Takayuki Akimoto, Shigeru Hayashida, Hideo Hagiwara, Susumu Era, Setsuo Kobayashi, Akio Mukoh
  • Patent number: 5439511
    Abstract: A coating varnish composition comprising (A) a polymer obtained by polymerizing (a) at least one unsaturated acid anhydride and (b) at least one other unsaturated monomer, and (B) at least one additive selected from triazole derivatives, benzothiazole derivatives, thiadiazole derivatives, polyethers and carboxylic acid anhydride derivatives, is capable of forming a coating which has no danger of poisoning like the organotin copolymers, shows a coating consuming property and antifouling performance comparable with those of the organotin copolymers and does not gel even when mixed with a copper compound.
    Type: Grant
    Filed: January 12, 1994
    Date of Patent: August 8, 1995
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroyuki Tanaka, Seiji Tai, Koichi Kamijima
  • Patent number: 5439512
    Abstract: A coating varnish composition comprising (A) a polymer obtained by polymerizing one or more unsaturated carboxylic acids (a) with one or more unsaturated monomers (b), and (B) at least one additive selected from triazole derivatives, thiadiazole derivatives, and benzothiazole derivatives, and an antifouling coating composition comprising (i) said coating varnish and (ii) an antifouling agent containing a copper compound as a major component, do not show a danger of organotin copolymers, but provide a coating excellent in coating consuming properties and antifouling properties for a long period of time without causing gelation when mixed with a copper compound.
    Type: Grant
    Filed: January 12, 1994
    Date of Patent: August 8, 1995
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Koichi Kamijima, Seiji Tai, Hiroyuki Tanaka
  • Patent number: 5284943
    Abstract: Special tetraazaporphins containing Si, Ge or Sn as the central metal are useful for forming a recording layer in an optical recording medium.
    Type: Grant
    Filed: January 22, 1992
    Date of Patent: February 8, 1994
    Assignee: Hitachi Chemical Company, Co.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Mitsuo Katayose, Takayuki Akimoto, Hideo Hagiwara
  • Patent number: 5242917
    Abstract: 1-(2,3-Dicarboxyphenyl)-3-(3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldisiloxa ne dianhydride is useful as a curing agent for epoxy resins.
    Type: Grant
    Filed: March 13, 1991
    Date of Patent: September 7, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tohru Kikuchi, Koichi Kamijima, Takayuki Saito
  • Patent number: 5217856
    Abstract: Special tetraazaporphins containing Si, Ge or Sn as the central metal are useful for forming a recording layer in an optical recording medium.
    Type: Grant
    Filed: April 6, 1989
    Date of Patent: June 8, 1993
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Mitsuo Katayose, Takayuki Akimoto, Hideo Hagiwara
  • Patent number: 5214188
    Abstract: 2,3-dicyanonaphthalene derivatives useful in the synthesis of naphthalocyanine derivatives are disclosed. The 2,3-dicyanonaphthalene derivatives have the formula: ##STR1## wherein each R.sup.1 may be the same or different and represents an alkyl group, substituted alkyl group, or aryl group; and n is an integer from 1 to 4.
    Type: Grant
    Filed: May 2, 1991
    Date of Patent: May 25, 1993
    Assignees: Hitachi, Ltd., Hitachi Chemical Company, Ltd.
    Inventors: Seiji Tai, Shigeru Hayashida, Nobuyuki Hayashi, Hideo Hagiwara, Mitsuo Katayose, Koichi Kamijima, Takayuki Akimoto, Susumu Era, Setsuo Kobayashi, Akio Mukoh
  • Patent number: 5166363
    Abstract: A process for producing (i) a 1,3-bis(dicarboxyphenyl)disiloxane derivative represented by the general formula ##STR1## wherein Rs and R's independently of one another denote methyl or phenyl or (ii) a 1,3-bis(dicarboxyphenyl)-disiloxane derivative dianhydride represented by the general formula ##STR2## wherein Rs and R's are as defined above, the process comprising coupling a Grignard reagent of halo-o-xylene with a disubstituted halosilane represented by the general formula ##STR3## wherein R and R' are as defined above and X denotes halogen, to form a dimethylphenyl(disubstituted silane) represented by the general formula ##STR4## wherein R and R' are as defined above, hydroxylating the dimethylphenyl(disubstituted silane) to form a dimethylphenyl(disubstituted hydroxysilane) represented by the general formula ##STR5## wherein R and R' are as defined above, to form a 1,3-bis(dimethylphenyl)-disilanedehydrating-condensing the dimethylphenyl-(disubstituted hydroxysilane derivative represented by the general
    Type: Grant
    Filed: December 9, 1991
    Date of Patent: November 24, 1992
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tohru Kikuchi, Toshiyuki Fujita, Koichi Kamijima, Takayuki Saito
  • Patent number: 5110968
    Abstract: A naphthalocyanine derivative having as substituents at least one group of a formula: SR.sup.1 wherein R.sup.1 is --(CR.sup.2 R.sup.3).sub.x SiR.sup.4 R.sup.5 R.sup.6, in which R.sup.2 to R.sup.6 are H, alkyl groups, etc. is excellent in solubility in saturated hydrocarbon solvents and in absorption of semiconductor laser lights and thus, is suitable for producing optical recording media.
    Type: Grant
    Filed: May 30, 1991
    Date of Patent: May 5, 1992
    Assignee: Hitachi, Chemical Company Ltd.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Takayuki Akimoto, Mitsuo Katayose, Hideo Hagiwara
  • Patent number: 5075203
    Abstract: A naphthalocyanine derivative having at least one substituent of the formula: SO.sub.2 R.sup.1, wherein R.sup.1 is an alkyl group, a substituted alkyl group or an aryl group is excellent in ability to absorb diode laser beams and suitable for use in an optical recording medium.
    Type: Grant
    Filed: August 22, 1989
    Date of Patent: December 24, 1991
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Mitsuo Katayose, Nobuyuki Hayashi, Seiji Tai, Takayuki Akimoto, Koichi Kamijima, Hideo Hagiwara
  • Patent number: 5039600
    Abstract: A naphthalocyanine derivative having as substituents at least one group of a formula: SR.sup.1 wherein R.sup.1 is --(CR.sup.2 R.sup.3).sub.x SiR.sup.4 R.sup.5 R.sup.6, in which R.sup.2 to R.sup.6 are H, alkyl groups, etc. is excellent in solubility in saturated hydrocarbon solvents and in absorption of semiconductor laser lights and thus, is suitable for producing optical recording media.
    Type: Grant
    Filed: January 4, 1990
    Date of Patent: August 13, 1991
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Takayuki Akimoto, Mitsuo Katayose, Hideo Hagiwara
  • Patent number: 5034309
    Abstract: Novel naphthalocyanine derivatives are disclosed in the specification are useful for forming a recording layer in an optical recording medium. These derivatives are represented by the following formula (I): ##STR1## in which k, l, m and n, which may be the same or different, are zero or integers of 1 to 4, k+l+m+n being an integer of 1 or more; R.sup.1 's in a number of (k+l+m+n), which may be the same or different, are alkyl groups, substituted alkyl groups, or aryl groups; M is Si, Ge or Sn; and two Y's, which may be the same or different, are aryloxyl groups, alkoxyl groups, trialkylsiloxyl groups, triarylsiloxyl groups, trialkoxysiloxyl groups, triaryloxysiloxyl groups, trityloxyl groups, or acyloxyl groups. These derivatives are especially useful in the preparation of an optical recording medium.
    Type: Grant
    Filed: June 24, 1988
    Date of Patent: July 23, 1991
    Assignees: Hitachi Chemical Co., Ltd., Hitachi, Ltd.
    Inventors: Seiji Tai, Shigeru Hayashida, Nobuyuki Hayashi, Hideo Hagiwara, Mitsuo Katayose, Koichi Kamijima, Takayuki Akimoto, Susumu Era, Setsuo Kobayashi, Akio Mukoh