Patents by Inventor Koji MITAMURA

Koji MITAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9845394
    Abstract: Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: December 19, 2017
    Assignees: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, DAIHACHI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kimihiro Matsukawa, Seiji Watase, Koji Mitamura, Manabu Hirata
  • Publication number: 20160200913
    Abstract: Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein R1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.
    Type: Application
    Filed: August 20, 2014
    Publication date: July 14, 2016
    Applicants: OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, DAIHACHI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Kimihiro MATSUKAWA, Seiji WATASE, Koji MITAMURA, Manabu HIRATA