Patents by Inventor Koji Shirakawa
Koji Shirakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20050277060Abstract: A positive resist composition satisfying high sensitivity, high resolution, good pattern profile and good in-vacuum PED property at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising: (A) a resin which is insoluble or sparingly soluble in an alkali developer and becomes soluble in an alkali developer under the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) an organic basic compound, wherein (A1) a resin containing a repeating unit having a specific structure and (A2) a resin other than the resin (A1) are contained as the resin of the component (A); and a pattern forming method using the composition.Type: ApplicationFiled: June 14, 2005Publication date: December 15, 2005Inventors: Koji Shirakawa, Tomoya Sasaki
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Patent number: 6887647Abstract: A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.Type: GrantFiled: March 20, 2002Date of Patent: May 3, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Shoichiro Yasunami, Koji Shirakawa, Yutaka Adegawa
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Publication number: 20050064327Abstract: A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkali developer and becomes soluble in an alkali developer by an action of an acid, and (B) a compound generating a sulfonic acid compound represented by formula (3) defined in the specification upon irradiation of actinic ray or radiation.Type: ApplicationFiled: September 16, 2004Publication date: March 24, 2005Inventors: Shoichiro Yasunami, Koji Shirakawa
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Publication number: 20040197702Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.Type: ApplicationFiled: March 30, 2004Publication date: October 7, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
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Publication number: 20040175654Abstract: A positive working resist composition comprising (A1) a resin containing a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification and having a property of being insoluble or sparingly soluble in an alkali developing solution and becoming soluble in an alkali developing solution by the action of an acid, and (B) a compound capable of generating sulfonic acid upon irradiation with active rays or radiations in an amount of from 5 to 20% by weight based on the total solid content of the positive working resist composition.Type: ApplicationFiled: March 3, 2004Publication date: September 9, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Koji Shirakawa, Kazuyoshi Mizutani
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Patent number: 6773862Abstract: A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.Type: GrantFiled: October 21, 2002Date of Patent: August 10, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Koji Shirakawa, Yutaka Adegawa, Shoichiro Yasunami
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Patent number: 6746813Abstract: A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.Type: GrantFiled: March 26, 2003Date of Patent: June 8, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Shoichiro Yasunami, Yutaka Adegawa, Koji Shirakawa
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Patent number: 6727040Abstract: A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; and having a group capable of leaving by the action of an acid, in which the leaving group includes a residue of a compound, the compound having a smaller ionization potential value than p-ethylphenol; and (c) a solvent.Type: GrantFiled: December 21, 2001Date of Patent: April 27, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Tomoya Sasaki, Kazuyoshi Mizutani, Koji Shirakawa
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Publication number: 20040053160Abstract: A resist composition comprising:Type: ApplicationFiled: July 7, 2003Publication date: March 18, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Hyou Takahashi, Kazuyoshi Mizutani, Koji Shirakawa, Shoichiro Yasunami
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Publication number: 20040033441Abstract: A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.Type: ApplicationFiled: August 18, 2003Publication date: February 19, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Koji Shirakawa
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Patent number: 6673512Abstract: A chemical amplification system negative-working resist composition for an electron beam and/or an X-ray, which is excellent in sensitivity and resolution and has a rectangular profile, comprising an alkali-soluble resin having structural units represented by the following general formula (a), a compound generating an acid by irradiation of the electron beam or the X-ray, and a crosslinking agent which initiates crosslinking by the acid:Type: GrantFiled: January 17, 2001Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Yutaka Adegawa, Koji Shirakawa
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Publication number: 20030203305Abstract: A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.Type: ApplicationFiled: March 26, 2003Publication date: October 30, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Yutaka Adegawa, Koji Shirakawa
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Publication number: 20030124456Abstract: A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.Type: ApplicationFiled: October 21, 2002Publication date: July 3, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Koji Shirakawa, Yutaka Adegawa, Shoichiro Yasunami
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Publication number: 20020192592Abstract: A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.Type: ApplicationFiled: March 20, 2002Publication date: December 19, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Koji Shirakawa, Yutaka Adegawa
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Patent number: 6489080Abstract: The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.Type: GrantFiled: December 2, 1999Date of Patent: December 3, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Toru Fujimori, Kunihiko Kodama, Koji Shirakawa, Shiro Tan
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Publication number: 20020136980Abstract: A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; and having a group capable of leaving by the action of an acid, in which the leaving group includes a residue of a compound, the compound having a smaller ionization potential value than p-ethylphenol; and (c) a solvent.Type: ApplicationFiled: December 21, 2001Publication date: September 26, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Tomoya Sasaki, Kazuyoshi Mizutani, Koji Shirakawa
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Publication number: 20020015916Abstract: The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.Type: ApplicationFiled: December 2, 1999Publication date: February 7, 2002Inventors: KAZUYA UENISHI, TORU FUJIMORI, KUNIHIKO KODAMA, KOJI SHIRAKAWA, SHIRO TAN
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Patent number: 5714303Abstract: The present invention provides new image forming methods. The image forming methods use a combination of a light-sensitive material and an image receiving material. The light-sensitive material comprises a support, a strippable layer and a light-sensitive polymerizable layer in order. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. The light-sensitive polymerizable layer may further contain a colorant. An image forming method using the light-sensitive polymerizable layer containing no colorant comprises an exposing step, a developing step, a toning step and a transferring step. Another image forming method using the colorant-containing light-sensitive polymerizable layer comprises an exposing step, a developing step, a removing step and a transferring step.Type: GrantFiled: November 25, 1996Date of Patent: February 3, 1998Assignee: Fuji Photo Film Co., Ltd.Inventors: Hiroaki Yokoya, Koji Shirakawa
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Patent number: 5639587Abstract: A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.Type: GrantFiled: March 14, 1996Date of Patent: June 17, 1997Assignee: Fuji Photo Film Co., Ltd.Inventors: Kenichiro Sato, Koji Shirakawa, Shinji Sakaguchi
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Patent number: 5629128Abstract: A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.Type: GrantFiled: September 20, 1995Date of Patent: May 13, 1997Assignee: Fuji Photo Film Co., Ltd.Inventors: Koji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe, Shinji Sakaguchi