Patents by Inventor Konstantin Nikolaevich Koshelev

Konstantin Nikolaevich Koshelev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7825390
    Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
    Type: Grant
    Filed: February 14, 2007
    Date of Patent: November 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Mihallovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • Patent number: 7772570
    Abstract: An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: August 10, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Publication number: 20100002211
    Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
    Type: Application
    Filed: June 15, 2009
    Publication date: January 7, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Denis GLUSHKOV, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Konstantin Nikolaevich KOSHELEV, Givi Georgievich ZUKAKISHVILI, Vladimir Mihailovitch KRIVTSUN, Yurii Victorovitch SIDELNIKOV, Kurt GIELISSEN, Oleg YAKUSHEV
  • Patent number: 7518135
    Abstract: A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: April 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vital'evich Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev
  • Publication number: 20090040492
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
  • Publication number: 20090040491
    Abstract: A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
    Type: Application
    Filed: August 6, 2007
    Publication date: February 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Publication number: 20080266654
    Abstract: An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.
    Type: Application
    Filed: April 26, 2007
    Publication date: October 30, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich Banine, Arno Jan Bleeker, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Frank Jeroen Pieter Schuurmans, Vladimir Mihailovitch Krivtsun, Maarten Marinus Johannes Wilhelmus Van Herpen
  • Publication number: 20080192218
    Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
    Type: Application
    Filed: February 14, 2007
    Publication date: August 14, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • Publication number: 20080148978
    Abstract: An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.
    Type: Application
    Filed: December 22, 2006
    Publication date: June 26, 2008
    Applicant: ASML Netherlands B. V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun