Patents by Inventor Kosta S. Selinidis

Kosta S. Selinidis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100104852
    Abstract: An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
    Type: Application
    Filed: October 22, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Edward B. Fletcher, Frank Y. Xu, Weijun Liu, Fen Wan, Marlon Menezes, Kosta S. Selinidis
  • Publication number: 20100092599
    Abstract: Systems and methods for minimizing overlay error during alignment of a template with a substrate are described. Templates generally include two distinct types of alignment marks: buried alignment marks and complementary alignment marks. Buried marks may be fabricated separately from the patterning surface, and the complementary marks may be fabricated in the same step as the patterning surface.
    Type: Application
    Filed: October 8, 2009
    Publication date: April 15, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Kosta S. Selinidis, Gerard M. Schmid, Ecron D. Thompson, Ian Matthew McMackin, Douglas J. Resnick
  • Publication number: 20100040718
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
    Type: Application
    Filed: October 26, 2009
    Publication date: February 18, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Publication number: 20100015270
    Abstract: A nano-imprint lithography template system having a support layer with at least one port, and a patterned surface layer coupled to the support layer. Coupling of the patterned surface layer to the support layer forms a cavity. Pressure within the cavity is controlled through the port of the support layer.
    Type: Application
    Filed: July 7, 2009
    Publication date: January 21, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Kosta S. Selinidis
  • Publication number: 20090250840
    Abstract: Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
    Type: Application
    Filed: May 12, 2009
    Publication date: October 8, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Kosta S. Selinidis, Byung-Jin Choi, Gerard M. Schmid, Ecron D. Thompson, Ian Matthew McMackin
  • Publication number: 20090140458
    Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
    Type: Application
    Filed: November 21, 2008
    Publication date: June 4, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung Jin Choi, Niyaz Khusnatdinov, Anshuman Cherala, Kosta S. Selinidis
  • Publication number: 20090004319
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1×d<t<a/c2; wherein d is said first thickness, t is said second thickness, a is said third thickness, c1 has a value greater than 20, and c2 has a value greater than 350.
    Type: Application
    Filed: May 30, 2008
    Publication date: January 1, 2009
    Applicant: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Patent number: 6913404
    Abstract: A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: July 5, 2005
    Assignee: Eastman Kodak Company
    Inventors: Richard A. Patterson, Joseph B. Gault, John J. Straigis, William D. Mapel, Michael R. Thering, G. Gregory Mooty, Patrick W. Lea, Kosta S. Selinidis, Steven K. Brown, Homero Saldana, Eric C. Segerstrom, Stacy S. Cook, Leland A. Lester
  • Patent number: 6733960
    Abstract: An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic film is also provided, and includes the steps of coating an aqueous developer solution containing at least one surfactant or thickener onto the film, thereby developing the film, and scanning the film through the coating of developer solution.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: May 11, 2004
    Assignee: Eastman Kodak Company
    Inventors: Lorin C. Nash, Douglas E. Corbin, Kosta S. Selinidis, Alexei L. Krasnoselsky, Jamie M. Kropka
  • Publication number: 20040076425
    Abstract: A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.
    Type: Application
    Filed: March 3, 2003
    Publication date: April 22, 2004
    Inventors: Richard A. Patterson, Joseph B. Gault, John J. Straigis, William D. Mapel, Michael R. Thering, G. Gregory Mooty, Patrick W. Lea, Kosta S. Selinidis, Steven K. Brown, Homero Saldana, Eric C. Segerstrom, Stacy S. Cook, Leland A. Lester
  • Patent number: 6599036
    Abstract: A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.
    Type: Grant
    Filed: February 5, 2001
    Date of Patent: July 29, 2003
    Assignee: Applied Science Fiction, Inc.
    Inventors: Richard A. Patterson, Joseph B. Gault, John J. Straigis, William D. Mapel, Michael R. Thering, G. Gregory Mooty, Patrick W. Lea, Kosta S. Selinidis, Steven K. Brown, Homero Saldana, Eric C. Segerstrom, Stacy S. Cook, Leland A. Lester
  • Publication number: 20020164166
    Abstract: An aqueous developer solution for use in digital film processing. The developer solution includes a developing agent and at least one surfactant or thickener. A method of processing a photographic film is also provided, and includes the steps of coating an aqueous developer solution containing at least one surfactant or thickener onto the film, thereby developing the film, and scanning the film through the coating of developer solution.
    Type: Application
    Filed: February 11, 2002
    Publication date: November 7, 2002
    Inventors: Lorin C. Nash, Douglas E. Corbin, Kosta S. Selinidis, Alexei L. Krasnoselsky, Jamie M. Kropka
  • Patent number: D503187
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: March 22, 2005
    Assignee: Eastman Kodak Company
    Inventors: Kosta S. Selinidis, Paul N. Winberg, Richard A. Patterson, Joseph B. Gault, Jonathan D. Isom
  • Patent number: D505443
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: May 24, 2005
    Assignee: Eastman Kodak Company
    Inventors: Homero Saldana, Kosta S. Selinidis, Paul N. Winberg, Paul E. Pergande