Patents by Inventor Kouji Ogura

Kouji Ogura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11724235
    Abstract: A mixing apparatus includes a phosphoric acid aqueous solution supply, an additive supply, a tank, a phosphoric acid aqueous solution supply path and an additive supply path. The phosphoric acid aqueous solution supply is configured to supply a phosphoric acid aqueous solution. The additive supply is configured to supply an additive configured to suppress precipitation of a silicon oxide. The phosphoric acid aqueous solution supply path is configured to connect the phosphoric acid aqueous solution supply with the tank. The additive supply path is configured to connect the additive supply with the tank. The additive is supplied while fluidity is imparted to the phosphoric acid aqueous solution supplied from the phosphoric acid aqueous solution supply into the tank.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: August 15, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Jun Nonaka, Takao Inada, Kouji Ogura
  • Patent number: 11615971
    Abstract: There is provided a substrate processing apparatus including: a processing part configured to process a substrate with a processing liquid; and a processing liquid generation part configured to generate the processing liquid supplied to the processing part. The processing liquid generation part includes: a reservoir configured to store the processing liquid; a circulation line through which the processing liquid stored in the reservoir is circulated; a heater configured to heat the processing liquid; and a nozzle provided at a downstream side of the circulation line and has at least one ejection port formed to eject the processing liquid heated by the heater from above a liquid level of the processing liquid stored in the reservoir.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: March 28, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Teruaki Konishi, Kouzou Kanagawa, Osamu Kuroda, Koji Tanaka, Kotaro Tsurusaki, Hidemasa Aratake, Kouji Ogura, Keita Hirase
  • Patent number: 11353894
    Abstract: A liquid processing apparatus includes: a substrate processing unit; a supply line that supplies the fluid to the substrate processing unit; a flow meter that measures a flow rate of the fluid flowing through the supply line; a flow rate adjustment mechanism that adjusts the flow rate of the fluid flowing through the supply line; and a controller that control the flow rate adjustment mechanism based on a measurement result of the flow meter. The controller receives the measurement result at a first cycle. When the measurement result of the flow meter indicates that the flow rate of the fluid flowing through the supply line is included in a preset range, the controller causes the flow rate adjustment mechanism to adjust the flow rate of the fluid flowing through the supply line at a cycle having a time interval longer than a time interval of the first cycle.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: June 7, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Keigo Satake, Hiroshi Komiya, Kouji Ogura
  • Publication number: 20220139734
    Abstract: A substrate processing method includes: generating a mixture liquid by mixing a phosphoric acid aqueous solution with an additive that suppresses precipitation of silicon oxide in a tank and circulating the mixture liquid through a circulation path that exits and returns to the tank, the circulation path including a back pressure valve; sending the mixture liquid to a processing bath through a liquid path diverging from the circulation path and positioned upstream from the back pressure valve; and supplying a silicon-containing compound aqueous solution to the mixture liquid generated in the generating. The back pressure valve is fully open in the generating and throttled in the sending. A substrate processing apparatus includes a processing bath, a mixing device, a liquid path, and a silicon solution supply.
    Type: Application
    Filed: January 17, 2022
    Publication date: May 5, 2022
    Inventors: Kouji OGURA, Jun NONAKA, Takao INADA, Yoshinori NISHIWAKI, Hiroshi YOSHIDA
  • Patent number: 11257692
    Abstract: A substrate processing apparatus includes a processing bath, a mixing device, a liquid path, and a silicon solution supply. A substrate is immersed in the processing bath to be processed. The mixing device generates a mixture liquid by mixing a phosphoric acid aqueous solution with an additive that suppresses precipitation of silicon oxide. The liquid path sends the mixture liquid from the mixing device to the processing bath. The silicon solution supply is connected to at least one of the liquid path and the processing bath, and supplies a silicon-containing compound aqueous solution to the mixture liquid supplied from the mixing device.
    Type: Grant
    Filed: March 12, 2020
    Date of Patent: February 22, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kouji Ogura, Jun Nonaka, Takao Inada, Yoshinori Nishiwaki, Hiroshi Yoshida
  • Publication number: 20200294823
    Abstract: A substrate processing apparatus includes a processing bath, a mixing device, a liquid path, and a silicon solution supply. A substrate is immersed in the processing bath to be processed. The mixing device generates a mixture liquid by mixing a phosphoric acid aqueous solution with an additive that suppresses precipitation of silicon oxide. The liquid path sends the mixture liquid from the mixing device to the processing bath. The silicon solution supply is connected to at least one of the liquid path and the processing bath, and supplies a silicon-containing compound aqueous solution to the mixture liquid supplied from the mixing device.
    Type: Application
    Filed: March 12, 2020
    Publication date: September 17, 2020
    Inventors: Kouji Ogura, Jun Nonaka, Takao Inada, Yoshinori Nishiwaki, Hiroshi Yoshida
  • Publication number: 20200289994
    Abstract: A mixing apparatus includes a phosphoric acid aqueous solution supply, an additive supply, a tank, a phosphoric acid aqueous solution supply path and an additive supply path. The phosphoric acid aqueous solution supply is configured to supply a phosphoric acid aqueous solution. The additive supply is configured to supply an additive configured to suppress precipitation of a silicon oxide. The phosphoric acid aqueous solution supply path is configured to connect the phosphoric acid aqueous solution supply with the tank. The additive supply path is configured to connect the additive supply with the tank. The additive is supplied while fluidity is imparted to the phosphoric acid aqueous solution supplied from the phosphoric acid aqueous solution supply into the tank.
    Type: Application
    Filed: March 12, 2020
    Publication date: September 17, 2020
    Inventors: Jun Nonaka, Takao Inada, Kouji Ogura
  • Publication number: 20200194280
    Abstract: There is provided a substrate processing apparatus including: a processing part configured to process a substrate with a processing liquid; and a processing liquid generation part configured to generate the processing liquid supplied to the processing part. The processing liquid generation part includes: a reservoir configured to store the processing liquid; a circulation line through which the processing liquid stored in the reservoir is circulated; a heater configured to heat the processing liquid; and a nozzle provided at a downstream side of the circulation line and has at least one ejection port formed to eject the processing liquid heated by the heater from above a liquid level of the processing liquid stored in the reservoir.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 18, 2020
    Inventors: Teruaki KONISHI, Kouzou KANAGAWA, Osamu KURODA, Koji TANAKA, Kotaro TSURUSAKI, Hidemasa ARATAKE, Kouji OGURA, Keita HIRASE
  • Patent number: 10551125
    Abstract: Provided is a technology for uniformly increasing atmosphere temperature while rapidly achieving a desired uniform atmosphere composition. A combustion apparatus is provided with: a combustion part including a combustion space with a combustible gas inlet which is opened toward the combustion space for allowing the entry of a combustible gas, an air inlet which is opened toward the combustion space for allowing the entry of air, and a combustion gas outlet for discharging a combustible gas to the outside; and a regulated gas through channel part including a regulated gas outlet for discharging the gas prepared into a desired composition to the outside, the regulated gas outlet located adjacent to the combustion gas outlet and having an opening facing the combustion gas immediately after being discharged from the combustion gas outlet.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: February 4, 2020
    Assignee: NGK Insulators, Ltd.
    Inventors: Shigeru Hanzawa, Kouji Ogura, Hitoshi Mori
  • Publication number: 20200035336
    Abstract: There is provided an information processing apparatus and method that allow a user to easily adequately move a display area by guiding a browsed part when a needle biopsy image is browsed. The information processing apparatus includes a storage unit to store a pathological image of a specimen and guide information along the center line of a shape of the specimen in the pathological image, a display control unit to display at least a part of the stored pathological image, as an observation image, on a screen, an input unit to receive an instruction for changing a range on the pathological image of the observation image displayed on the screen, from a user, and a control unit to calculate the range on the pathological image of the observation image based on the instruction and the stored guide information.
    Type: Application
    Filed: October 2, 2019
    Publication date: January 30, 2020
    Inventors: YUTAKA HASEGAWA, HIDAKA UCHIDA, YOICHI MIZUTANI, SHIGEATSU YOSHIOKA, MASATO KAJIMOTO, KOUJI OGURA, MASASHI KIMOTO, NAOKI TAGAMI, TORU MITOME
  • Patent number: 10460075
    Abstract: To provide an information processing apparatus, an information processing method, and an information processing program that allow a user to easily adequately move a display area by guiding a browsed part when a needle biopsy image is browsed. [Solving Means] An information processing apparatus includes: a storage unit to store a pathological image of a specimen and guide information along the center line of a shape of the specimen in the pathological image; a display control unit to display at least a part of the stored pathological image, as an observation image, on a screen; an input unit to receive an instruction for changing a range on the pathological image of the observation image displayed on the screen, from a user; and a control unit to calculate the range on the pathological image of the observation image based on the instruction and the stored guide information.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: October 29, 2019
    Assignee: Sony Corporation
    Inventors: Yutaka Hasegawa, Hidaka Uchida, Yoichi Mizutani, Shigeatsu Yoshioka, Masato Kajimoto, Kouji Ogura, Masashi Kimoto, Naoki Tagami, Toru Mitome
  • Patent number: 10451323
    Abstract: A chemical heat pump includes a reaction section containing a heat storage material, a condensing section enabling a phase transition between water vapor and water, a connecting section connecting the reaction section and the condensing section, a valve adapted to open or close the connecting section, and a first fluid passage. The reaction section contains a plurality of heat storage materials having respective different conversion temperatures at which the heat storage material and the hydrate thereof are converted into each other. The plurality of heat storage materials and the first fluid passage are arranged so that the fluid flowing in the first fluid passage can perform heat exchanges with the heat storage materials in such a manner that the higher the conversion temperature of the heat storage material, the closer the position of the heat exchange to “the first side” of the first fluid passage.
    Type: Grant
    Filed: April 12, 2017
    Date of Patent: October 22, 2019
    Assignee: NGK Insulators, Ltd.
    Inventors: Shigeru Hanzawa, Kouji Ogura
  • Patent number: 10359236
    Abstract: The “heat storage material storage container” comprises “a main body having a longitudinal direction and including a plurality of flow channels therein, the flow channels extending parallel to each other in the longitudinal direction and separated from each other by porous walls” and “a heat storage material contained in only one or some of the plurality of flow channels.” The plurality of flow channels include “a plurality of first flow channels each having an open end on a first side in the longitudinal direction and a closed end on a second side in the longitudinal direction” and “a plurality of second flow channels each having open ends on both the first side and the second side in the longitudinal direction.” The heat storage material is contained in only the first flow channels.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: July 23, 2019
    Assignee: NGK Insulators, Ltd.
    Inventors: Shigeru Hanzawa, Kouji Ogura
  • Publication number: 20180032092
    Abstract: A liquid processing apparatus includes: a substrate processing unit; a supply line that supplies the fluid to the substrate processing unit; a flow meter that measures a flow rate of the fluid flowing through the supply line; a flow rate adjustment mechanism that adjusts the flow rate of the fluid flowing through the supply line; and a controller that control the flow rate adjustment mechanism based on a measurement result of the flow meter. The controller receives the measurement result at a first cycle. When the measurement result of the flow meter indicates that the flow rate of the fluid flowing through the supply line is included in a preset range, the controller causes the flow rate adjustment mechanism to adjust the flow rate of the fluid flowing through the supply line at a cycle having a time interval longer than a time interval of the first cycle.
    Type: Application
    Filed: July 26, 2017
    Publication date: February 1, 2018
    Inventors: Keigo Satake, Hiroshi Komiya, Kouji Ogura
  • Patent number: 9873826
    Abstract: This chemical heat pump includes two reaction sections R1 and R2 containing a thermal storage medium; an evaporation-condensation section D containing water or steam; and two fluid channels individually disposed so as to correspond to the reaction sections. A “first state in which R1 is set to a heat-storing state and R2 is set to a heat-release state” and a “second state in which R1 is set to a heat-release state and R2 is set to a heat-storing state” are alternately applied every time after a first period elapses. For each reaction section, in the heat-release state, a fluid is caused to flow from a first side to a second side of the corresponding fluid channel over a first period; and, in the heat-storing state, a fluid is caused to flow from the second side to the first side of the corresponding fluid channel over a second period.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: January 23, 2018
    Assignee: NGK Insulators, Ltd.
    Inventors: Shigeru Hanzawa, Kouji Ogura
  • Publication number: 20170219258
    Abstract: A chemical heat pump includes a reaction section containing a heat storage material, a condensing section enabling a phase transition between water vapor and water, a connecting section connecting the reaction section and the condensing section, a valve adapted to open or close the connecting section, and a first fluid passage. The reaction section contains a plurality of heat storage materials having respective different conversion temperatures at which the heat storage material and the hydrate thereof are converted into each other. The plurality of heat storage materials and the first fluid passage are arranged so that the fluid flowing in the first fluid passage can perform heat exchanges with the heat storage materials in such a manner that the higher the conversion temperature of the heat storage material, the closer the position of the heat exchange to “the first side” of the first fluid passage.
    Type: Application
    Filed: April 12, 2017
    Publication date: August 3, 2017
    Applicant: NGK INSULATORS, LTD.
    Inventors: Shigeru HANZAWA, Kouji OGURA
  • Publication number: 20160282056
    Abstract: The “heat storage material storage container” comprises “a main body having a longitudinal direction and including a plurality of flow channels therein, the flow channels extending parallel to each other in the longitudinal direction and separated from each other by porous walls” and “a heat storage material contained in only one or some of the plurality of flow channels.” The plurality of flow channels include “a plurality of first flow channels each having an open end on a first side in the longitudinal direction and a closed end on a second side in the longitudinal direction” and “a plurality of second flow channels each having open ends on both the first side and the second side in the longitudinal direction.” The heat storage material is contained in only the first flow channels.
    Type: Application
    Filed: June 10, 2016
    Publication date: September 29, 2016
    Applicant: NGK INSULATORS, LTD.
    Inventors: Shigeru HANZAWA, Kouji OGURA
  • Publication number: 20160177161
    Abstract: This chemical heat pump includes two reaction sections R1 and R2 containing a thermal storage medium; an evaporation-condensation section D containing water or steam; and two fluid channels individually disposed so as to correspond to the reaction sections. A “first state in which R1 is set to a heat-storing state and R2 is set to a heat-release state” and a “second state in which R1 is set to a heat-release state and R2 is set to a heat-storing state” are alternately applied every time after a first period elapses. For each reaction section, in the heat-release state, a fluid is caused to flew from a first side to a second side of the corresponding fluid channel over a first period; and, in the beat-storing state, a fluid is caused to flew from the second side to the first side of the corresponding fluid channel over a second period.
    Type: Application
    Filed: December 14, 2015
    Publication date: June 23, 2016
    Inventors: Shigeru HANZAWA, Kouji OGURA
  • Publication number: 20150169826
    Abstract: To provide an information processing apparatus, an information processing method, and an information processing program that allow a user to easily adequately move a display area by guiding a browsed part when a needle biopsy image is browsed. [Solving Means] An information processing apparatus includes: a storage unit to store a pathological image of a specimen and guide information along the center line of a shape of the specimen in the pathological image; a display control unit to display at least a part of the stored pathological image, as an observation image, on a screen; an input unit to receive an instruction for changing a range on the pathological image of the observation image displayed on the screen, from a user; and a control unit to calculate the range on the pathological image of the observation image based on the instruction and the stored guide information.
    Type: Application
    Filed: May 21, 2013
    Publication date: June 18, 2015
    Applicant: Sony Corporation
    Inventors: Yutaka Hasegawa, Hidaka Uchida, Yoichi Mizutani, Shigeatsu Yoshioka, Masato Kajimoto, Kouji Ogura, Masashi Kimoto, Naoki Tagami, Toru Mitome
  • Publication number: 20140295367
    Abstract: Provided is a technology for uniformly increasing atmosphere temperature while rapidly achieving a desired uniform atmosphere composition. A combustion apparatus is provided with: a combustion part including a combustion space with a combustible gas inlet which is opened toward the combustion space for allowing the entry of a combustible gas, an air inlet which is opened toward the combustion space for allowing the entry of air, and a combustion gas outlet for discharging a combustible gas to the outside; and a regulated gas through channel part including a regulated gas outlet for discharging the gas prepared into a desired composition to the outside, the regulated gas outlet located adjacent to the combustion gas outlet and having an opening facing the combustion gas immediately after being discharged from the combustion gas outlet.
    Type: Application
    Filed: June 13, 2014
    Publication date: October 2, 2014
    Inventors: Shigeru HANZAWA, Kouji OGURA, Hitoshi MORI