Patents by Inventor Kouzou Nakamura

Kouzou Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10526728
    Abstract: A manufacturing method of this invention includes: a step of slicing a silicon single crystal containing boron as an acceptor and obtaining a non-heat-treated silicon wafer, a step of determining a boron concentration with respect to the non-heat-treated silicon wafer, and a step of determining an oxygen donor concentration with respect to the non-heat-treated silicon wafer, in which a determination as to whether or not to perform a heat treatment at a temperature of 300° C. or more on the non-heat-treated silicon wafer is made based on a boron concentration determined in the step of determining a boron concentration, and an oxygen donor concentration determined in the step of determining an oxygen donor concentration. By this means, a wafer in which unevenly distributed LPDs that are present on the wafer are reduced is obtained.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: January 7, 2020
    Assignee: SUMCO CORPORATION
    Inventors: Satoshi Kudo, Kouzou Nakamura, Toshiyuki Muranaka, Shuhei Matsuda, Tegi Kim, Keiichiro Hiraki
  • Publication number: 20170044688
    Abstract: A manufacturing method of this invention includes: a step of slicing a silicon single crystal containing boron as an acceptor and obtaining a non-heat-treated silicon wafer, a step of determining a boron concentration with respect to the non-heat-treated silicon wafer, and a step of determining an oxygen donor concentration with respect to the non-heat-treated silicon wafer, in which a determination as to whether or not to perform a heat treatment at a temperature of 300° C. or more on the non-heat-treated silicon wafer is made based on a boron concentration determined in the step of determining a boron concentration, and an oxygen donor concentration determined in the step of determining an oxygen donor concentration. By this means, a wafer in which unevenly distributed LPDs that are present on the wafer are reduced is obtained.
    Type: Application
    Filed: April 10, 2015
    Publication date: February 16, 2017
    Applicant: SUMCO CORPORATION
    Inventors: Satoshi KUDO, Kouzou NAKAMURA, Toshiyuki MURANAKA, Shuhei MATSUDA, Tegi KIM, Keiichiro HIRAKI
  • Publication number: 20170040478
    Abstract: There is provided a sheet-shaped sealing material that has excellent shock absorbency, sealing properties, cold and heat resistance, and light resistance even if the thickness is small. The sheet-shaped sealing material according to the present invention comprises: a silicone resin (A); and a plurality of particles (B) dispersed in the silicone resin and each having a cavity portion therein. The thickness of the sheet-shaped sealing material is, for example, 0.05 to 4 mm. The plurality of particles (B) comprise, for example, foamed particles that is thermally expanded.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Inventors: Masahiko GOTOH, Kouzou NAKAMURA, Yasushi NAKATA
  • Publication number: 20160053069
    Abstract: A silicone resin foamed body according to the present invention comprises: a silicone resin cured product (A); and a plurality of particles (B) dispersed in the silicone resin cured product (A) and each having a cavity portion (b1) therein, wherein the silicone resin foamed body has a cavity portion (C) surrounded with the silicone resin cured product (A) or with the silicone resin cured product (A) and the particles (B) in the silicone resin cured product (A).
    Type: Application
    Filed: March 26, 2014
    Publication date: February 25, 2016
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Masahiko GOTOH, Kouzou NAKAMURA
  • Publication number: 20150107669
    Abstract: There is provided a sheet-shaped sealing material that has excellent shock absorbency, sealing properties, cold and heat resistance, and light resistance even if the thickness is small. The sheet-shaped sealing material according to the present invention comprises: a silicone resin (A); and a plurality of particles (B) dispersed in the silicone resin and each having a cavity portion therein. The thickness of the sheet-shaped sealing material is, for example, 0.05 to 4 mm. The plurality of particles (B) comprise, for example, foamed particles that is thermally expanded.
    Type: Application
    Filed: May 22, 2013
    Publication date: April 23, 2015
    Inventors: Masahiko Gotoh, Kouzou Nakamura, Yasushi Nakata
  • Patent number: 8828139
    Abstract: Methods of manufacturing a sapphire seed for growing a crystal having reduced dislocation density. The present invention provides a method of manufacturing a sapphire seed formed by a sapphire single crystal and used for growing another sapphire single crystal on a (0001) face as a crystal growing surface, the method comprising: preparing a sapphire seed whose side face forms a crystal face within a {1-100} face±10 °, and whose shape is processed so as to include a hexagonal prism or a triangle prism; and applying a predetermined thermal treatment to said sapphire seed.
    Type: Grant
    Filed: June 15, 2011
    Date of Patent: September 9, 2014
    Assignee: Sumco Corporation
    Inventors: Masato Imai, Kouzou Nakamura
  • Publication number: 20110308447
    Abstract: Methods of manufacturing a sapphire seed for growing a crystal having reduced dislocation density. The present invention provides a method of manufacturing a sapphire seed formed by a sapphire single crystal and used for growing another sapphire single crystal on a (0001) face as a crystal growing surface, the method comprising: preparing a sapphire seed whose side face forms a crystal face within a {1-100} face±10°, and whose shape is processed so as to include a hexagonal prism or a triangle prism; and applying a predetermined thermal treatment to said sapphire seed.
    Type: Application
    Filed: June 15, 2011
    Publication date: December 22, 2011
    Applicant: SUMCO CORPORATION
    Inventors: Masato Imai, Kouzou Nakamura
  • Publication number: 20110043733
    Abstract: Provided is a pressure-sensitive adhesive polarizing plate, including: a polarizer (P); a transparent protective film (E) provided on only one side of the polarizer (P) with an adhesive layer (G) interposed therebetween; a pressure-sensitive adhesive layer (B) provided on another side of the polarizer (P) with a protective layer (H) having a tensile modulus of 100 MPa or more interposed therebetween. The pressure-sensitive adhesive polarizing plate satisfies durability even under harsh environments at a low temperature and a high temperature.
    Type: Application
    Filed: May 25, 2009
    Publication date: February 24, 2011
    Applicant: NITTO DENKO CORPORATION
    Inventors: Mitsuru Suzuki, Shouji Yamamoto, Kentarou Takeda, Kouzou Nakamura, Yuu Sugimoto
  • Publication number: 20040203741
    Abstract: A communication system, usable as a radio facsimile system, can transmit/receive information using a dedicated protocol independently of the radio wave status, as well as improve the transmission efficiency by restarting the subject communication even when it is interrupted and restarting the communication beginning with the data immediately following the normally transmitted data. A communication controller relays the communications between radio facsimile and general facsimile, and changes protocols appropriate to the subject communication to reduce interruptions. In addition, when the subject communication is interrupted, the communication system can cope with it to continue the communication by re-dialing automatically at fixed intervals, adding the communication discrimination information for each communication, and sending communication discrimination information and position information concerning the data received immediately prior to the interruption.
    Type: Application
    Filed: April 4, 2003
    Publication date: October 14, 2004
    Inventors: Yasuro Hori, Kouzou Nakamura, Soshiro Kuzunuki, Toshiaki Nakamura
  • Patent number: 6411394
    Abstract: An information transmission/reception apparatus having a reader for reading an image and outputting an image signal of the image, an encoder having a plurality of line memories for storing the image signal for encoding the image signal into a code signal while always confirming that the image signal of at least one line is stored in the line memories, a transceiver for transmitting and receiving the code signal, a decoder having a plurality of line memories for storing the image signal represented by the code signal, the decoder decoding an input code signal from one of a page top position and a page intermediate position, and a recorder for recording the image signal decoded by the decoder, thereby while an image signal is being decoded without using a page memory, a split or overlapping recording of pages can be carried out.
    Type: Grant
    Filed: October 6, 1998
    Date of Patent: June 25, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Kouzou Nakamura, Yasushi Yokosuka
  • Patent number: 6404930
    Abstract: An apparatus is provided for expanding, decompressing and editing signals, and particularly a signal processing equipment for printing or displaying images. The apparatus includes compression device for image data, storing device for storing the compression data, decompression device, and editing device for editing, using only signals for editing, wherein the transfer of the data between the device is executed using the compression data.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: June 11, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Tatsuki Inuzuka, Toshiaki Nakamura, Kouzou Nakamura, Keisuke Nakashima
  • Publication number: 20010043747
    Abstract: There is disclosed an apparatus for expanding, decompressing and editing signals, and particularly disclosed is a signal processing equipment for printing or displaying images. The apparatus comprises compression means for image data, storing means for storing the compression data, decompression means, and editing means for editing, using only signals for edition, wherein the transfer of the data between the means is executed by the compression data.
    Type: Application
    Filed: October 7, 1997
    Publication date: November 22, 2001
    Inventors: TATSUKI INUZUKA, TOSHIAKI NAKAMURA, KOUZOU NAKAMURA, KEISUKE NAKASHIMA
  • Patent number: 6030450
    Abstract: The cooling speed of the portion near the rear part of a single-crystal body and passing through the defect-forming temperature zone is kept the same as that of the front portion of the single-crystal body. Namely, the heater is kept in operation while pulling the single crystal silicon subsequent to forming the tail of the single crystal silicon and the cooling speed throughout the whole single-crystal body in the defect-forming temperature zone is kept below 15.degree. C./min (levels A and B). Furthermore, the length of the tail is preset in the process of pulling the single crystal silicon so that the single-crystal body cools down slowly while passing through the defect-forming temperature zone (level C).
    Type: Grant
    Filed: December 29, 1997
    Date of Patent: February 29, 2000
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Toshiaki Saishouji, Takashi Yokoyama, Hirotaka Nakajima, Toshimichi Kubota, Kouzou Nakamura
  • Patent number: 6026200
    Abstract: An image restoring apparatus is provided that can restore an image disturbed by transmission error to a natural image in real time even if the transmission error occurs frequently. The image restoring apparatus has refresh control means for updating all the image data of a frame, inframe correcting means for effecting correction processing in the frame, and selecting means for selecting either of the refresh control means or the in-frame correcting means by detecting of number or positions of blocks having an error in the pixel data of the frame.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: February 15, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Mariko Okude, Norifumi Yanai, Kouzou Nakamura
  • Patent number: 5968260
    Abstract: A method for fabricating a single-crystal semiconductor by means of CZ method is disclosed. The method separates the single-crystal semiconductor from the melt by increasing the lift rate when the growth of a crystal body is finished. By controlling the lift rate, the single-crystal semiconductor is then gradually cooled within a range of an arbitrary crystal temperature, thereby forming a concave separated surface. The single-crystal semiconductor is cooled at a rate of lower than 35.degree. C./min when the temperature of the separated surface is within a range between the melting point and 1000.degree. C., or by keeping the temperature of the separated surface within a range between 1250.degree. C. and 1000.degree. C. for more than 30 minutes. Therefore, no dislocation is introduced in the crystal body, and productivity is improved.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: October 19, 1999
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Toshiaki Saishouji, Tetsuhiro Iida, Kouzou Nakamura, Toshimichi Kubota, Junsuke Tomioka
  • Patent number: 5968262
    Abstract: When the pulling speed is V(mm/min), the temperature gradient along the crystal axis within the temperature range from the melting point of silicon to 1300.degree. C. is G1 (.degree. C./mm), the temperature gradient along the crystal axis within the temperature range from 1150.degree. to 1080.degree. C. is G2 (.degree. C./mm), and the octahedral-shaped void density is d (pieces/cm.sup.3), crystals are grown under a condition satisfying:V/G1>0.581.times.V.times.G2-(d-4.3.times.10.sup.3)/2.65.times.10.sup.6 and V/G1>0.25.In this way, the defect density is reduced to less than 1.times.106 pieces/cm.sup.3 and silicon single crystals having superior gate oxide integrity and semiconductor device yield are obtained.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: October 19, 1999
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventors: Toshiaki Saishouji, Kouzou Nakamura, Toshimichi Kubota, Junsuke Tomioka
  • Patent number: 5818607
    Abstract: An information transmission/reception apparatus having a reader for reading an image and outputting an image signal of the image, an encoder having a plurality of line memories for storing the image signal for encoding the image signal into a code signal while always confirming that the image signal of at least one line is stored in the line memories, a transceiver for transmitting and receiving the code signal, a decoder having a plurality of line memories for storing the image signal represented by the code signal, the decoder decoding an input code signal from one of a page top position and a page intermediate position, and a recorder for recording the image signal decoded by the decoder, thereby while an image signal is being decoded without using a page memory, a split or overlapping recording of pages can be carried out.
    Type: Grant
    Filed: February 21, 1996
    Date of Patent: October 6, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Kouzou Nakamura, Yasushi Yokosuka
  • Patent number: 5666210
    Abstract: A document communication apparatus includes an input unit for giving various indications such as document processing; a communication unit for transmitting and receiving information and rules of document processing in communication with another document communication apparatus, and an information processing unit for processing document information based on the received rules of document process Further, a communication apparatus for transmitting or receiving information among plural communication apparatuses makes it possible to transmit and receive a document with the rules of document processing corresponding to the content of at least a request for document processing.
    Type: Grant
    Filed: June 2, 1994
    Date of Patent: September 9, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Norifumi Yanai, Kouzou Nakamura, Mariko Okude, Shigemasa Shiota
  • Patent number: 5649031
    Abstract: An image information processor for producing a high-quality output image by emphasizing the contour portions of a character, a photograph and others and by preventing the generation of a Moire patterns in a dot region, for preventing an increase in the amount of codes, and for making it unnecessary to set desired binarization processing for each original, is provided. The processor includes a unit for scanning the original to convert each pixel data into an electric signal, a unit for controlling the start of image processing, a filter for carrying out enhancement processing among a plurality of pixels arranged in oblique directions after smoothing processing has been carried out among a plurality of contiguous pixels arranged in scanning and traverse directions, and a unit for carrying out at least one of binarization and binarization capable of realizing pseudo tone expression.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: July 15, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Toshiaki Nakamura, Keisuke Nakashima, Kouzou Nakamura, Shinichi Shinoda, Tatsuki Inuzuka