Patents by Inventor Kunal Shrotri

Kunal Shrotri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10388665
    Abstract: An array of elevationally-extending strings of memory cells comprises a vertical stack of alternating insulative tiers and wordline tiers. The wordline tiers have terminal ends corresponding to control-gate regions of individual memory cells. The control-gate regions individually comprise part of a wordline in individual of the wordline tiers. A charge-blocking region of the individual memory cells extends elevationally along the individual control-gate regions. Charge-storage material of the individual memory cells extends elevationally along individual of the charge-blocking regions. Channel material extends elevationally along the vertical stack. Insulative charge-passage material is laterally between the channel material and the charge-storage material. Elevationally-extending walls laterally separate immediately-laterally-adjacent of the wordlines. The walls comprise laterally-outer insulative material and silicon-containing material spanning laterally between the laterally-outer insulative material.
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: August 20, 2019
    Assignee: Micron Technology, Inc.
    Inventors: Zhiqiang Xie, Chris M. Carlson, Justin B. Dorhout, Anish A. Khandekar, Greg Light, Ryan Meyer, Kunal R. Parekh, Dimitrios Pavlopoulos, Kunal Shrotri
  • Patent number: 10381367
    Abstract: A method of forming polysilicon comprises forming a first polysilicon-comprising material over a substrate, with the first polysilicon-comprising material comprising at least one of elemental carbon and elemental nitrogen at a total of 0.1 to 20 atomic percent. A second polysilicon-comprising material is formed over the first polysilicon-comprising material. The second polysilicon-comprising material comprises less, if any, total elemental carbon and elemental nitrogen than the first polysilicon-comprising material. Other aspects and embodiments, including structure independent of method of manufacture, are disclosed.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: August 13, 2019
    Assignee: Micron Technology, Inc.
    Inventors: Dimitrios Pavlopoulos, Kunal Shrotri, Anish A. Khandekar
  • Patent number: 10381377
    Abstract: A method comprises forming material to be etched over a substrate. An etch mask comprising a silicon nitride-comprising region is formed elevationally over the material. The etch mask comprises an elevationally-extending mask opening in the silicon nitride-comprising region that has a minimum horizontal open dimension that is greater in an elevationally-innermost portion of the region than in an elevationally-outermost portion of the region. The elevationally-outermost portion has a greater etch rate in at least one of HF and H3PO4 than does the elevationally-innermost portion. The etch mask is used as a mask while etching an elevationally-extending mask opening into the material. The silicon nitride-comprising region is exposed to at least one of HF and H3PO4 to increase the minimum horizontal open dimension in the elevationally-outermost portion to a greater degree than increase, if any, in the minimum horizontal open dimension in the elevationally-innermost portion.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: August 13, 2019
    Assignee: Micron Technology, Inc.
    Inventors: Fei Wang, Tom J. John, Kunal Shrotri, Anish A. Khandekar, Aaron R. Wilson, John D. Hopkins, Derek F. Lundberg
  • Publication number: 20190206727
    Abstract: A method of forming a semiconductor structure includes forming a sacrificial material over a stack comprising alternating levels of a dielectric material and another material, forming an opening through the sacrificial material and at least some of the alternating levels of the dielectric material and the another material, forming at least one oxide material in the opening and overlying surfaces of the sacrificial material, an uppermost surface of the at least one oxide material extending more distal from a surface of a substrate than an uppermost level of the dielectric material and the another material, planarizing at least a portion of the at least one oxide material to expose a portion of the sacrificial material, and removing the sacrificial material while the uppermost surface of the at least one oxide material remains more distal from the surface of the substrate than the uppermost level of the alternating levels of the dielectric material and the another material.
    Type: Application
    Filed: October 26, 2018
    Publication date: July 4, 2019
    Inventors: John B. Matovu, David S. Meyaard, Gowrisankar Damarla, Sri Sai Sivakumar Vegunta, Kunal Shrotri, Shashank Saraf, Kevin R. Gast, Jivaan Kishore Jhothiraman, Suresh Ramarajan, Lifang Xu, Rithu K. Bhonsle, Rutuparna Narulkar, Matthew J. King
  • Publication number: 20190198320
    Abstract: A transistor comprises channel material having first and second opposing sides. A gate is on the first side of the channel material and a gate insulator is between the gate and the channel material. A first insulating material has first and second opposing sides, with the first side being adjacent the second side of the channel material. A second insulating material of different composition from that of the first insulating material is adjacent the second side of the first insulating material. The second insulating material has at least one of (a), (b), and (c), where, (a): lower oxygen diffusivity than the first material, (b): net positive charge, and (c): at least two times greater shear strength than the first material. In some embodiments, an array of elevationally-extending strings of memory cells comprises such transistors. Other embodiments, including method, are disclosed.
    Type: Application
    Filed: February 23, 2018
    Publication date: June 27, 2019
    Applicant: Micron Technology, Inc.
    Inventors: David H. Wells, Anish A. Khandekar, Kunal Shrotri, Jie Li
  • Patent number: 10297611
    Abstract: A transistor comprises channel material having first and second opposing sides. A gate is on the first side of the channel material and a gate insulator is between the gate and the channel material. A first insulating material has first and second opposing sides, with the first side being adjacent the second side of the channel material. A second insulating material of different composition from that of the first insulating material is adjacent the second side of the first insulating material. The second insulating material has at least one of (a), (b), and (c), where, (a): lower oxygen diffusivity than the first material, (b): net positive charge, and (c): at least two times greater shear strength than the first material. In some embodiments, an array of elevationally-extending strings of memory cells comprises such transistors. Other embodiments, including method, are disclosed.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: May 21, 2019
    Assignee: Micron Technology, Inc.
    Inventors: David H. Wells, Luan C. Tran, Jie Li, Anish A. Khandekar, Kunal Shrotri
  • Patent number: 10269625
    Abstract: A method of forming a semiconductor structure includes forming a sacrificial material over a stack comprising alternating levels of a dielectric material and another material, forming an opening through the sacrificial material and at least some of the alternating levels of the dielectric material and the another material, forming at least one oxide material in the opening and overlying surfaces of the sacrificial material, an uppermost surface of the at least one oxide material extending more distal from a surface of a substrate than an uppermost level of the dielectric material and the another material, planarizing at least a portion of the at least one oxide material to expose a portion of the sacrificial material, and removing the sacrificial material while the uppermost surface of the at least one oxide material remains more distal from the surface of the substrate than the uppermost level of the alternating levels of the dielectric material and the another material.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: April 23, 2019
    Assignee: Micron Technology, Inc.
    Inventors: John B. Matovu, David S. Meyaard, Gowrisankar Damarla, Sri Sai Sivakumar Vegunta, Kunal Shrotri, Shashank Saraf, Kevin R. Gast, Jivaan Kishore Jhothiraman, Suresh Ramarajan, Lifang Xu, Rithu K. Bhonsle, Rutuparna Narulkar, Matthew J. King
  • Patent number: 10217755
    Abstract: Flash memory technology is disclosed. In one example, a flash memory component can include a plurality of insulative layers vertically spaced apart from one another. The memory component can also include a vertically oriented conductive channel extending through the plurality of insulative layers. In addition, the memory component can include a charge storage structure disposed between adjacent insulative layers. The charge storage structure can have a vertical cross section with a first side oriented toward the conductive channel and a second side opposite the first side. A length of the first side can be greater than a length of the second side. In another example, the vertical cross-section of the charge storage structure comprises a non-rectangular shape, such as a trapezoid shape. Associated systems and methods are also disclosed.
    Type: Grant
    Filed: April 1, 2017
    Date of Patent: February 26, 2019
    Assignee: Intel Corporation
    Inventors: Changhan Kim, Kunal Shrotri, John Hopkins, Darwin Franseda Fan
  • Publication number: 20190043890
    Abstract: Some embodiments include an integrated structure having vertically-stacked conductive levels alternating with dielectric levels. A layer over the conductive levels includes silicon, nitrogen, and one or more of carbon, oxygen, boron and phosphorus. In some embodiments the vertically-stacked conductive levels are wordline levels within a NAND memory array. Some embodiments include an integrated structure having vertically-stacked conductive levels alternating with dielectric levels. Vertically-stacked NAND memory cells are along the conductive levels within a memory array region. A staircase region is proximate the memory array region. The staircase region has electrical contacts in one-to-one correspondence with the conductive levels. A layer is over the memory array region and over the staircase region. The layer includes silicon, nitrogen, and one or more of carbon, oxygen, boron and phosphorus.
    Type: Application
    Filed: October 11, 2018
    Publication date: February 7, 2019
    Applicant: Micron Technology, Inc.
    Inventors: Justin B. Dorhout, Fei Wang, Chet E. Carter, Ian Laboriante, John D. Hopkins, Kunal Shrotri, Ryan Meyer, Vinayak Shamanna, Kunal R. Parekh, Martin C. Roberts, Matthew Park
  • Patent number: 10157933
    Abstract: Some embodiments include an integrated structure having vertically-stacked conductive levels alternating with dielectric levels. A layer over the conductive levels includes silicon, nitrogen, and one or more of carbon, oxygen, boron and phosphorus. In some embodiments the vertically-stacked conductive levels are wordline levels within a NAND memory array. Some embodiments include an integrated structure having vertically-stacked conductive levels alternating with dielectric levels. Vertically-stacked NAND memory cells are along the conductive levels within a memory array region. A staircase region is proximate the memory array region. The staircase region has electrical contacts in one-to-one correspondence with the conductive levels. A layer is over the memory array region and over the staircase region. The layer includes silicon, nitrogen, and one or more of carbon, oxygen, boron and phosphorus.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: December 18, 2018
    Assignee: Micron Technology, Inc.
    Inventors: Justin B. Dorhout, Fei Wang, Chet E. Carter, Ian Laboriante, John D. Hopkins, Kunal Shrotri, Ryan Meyer, Vinayak Shamanna, Kunal R. Parekh, Martin C. Roberts, Matthew Park
  • Publication number: 20180358378
    Abstract: Some embodiments include an integrated structure having a first opening extending through a stack of alternating insulative levels and conductive levels. A nitride structure is within the first opening and narrows the first opening to form a second opening. Detectable oxide is between the nitride structure and one or more of the conductive levels. Some embodiments include an integrated structure having a conductive material, a select device gate material over the conductive material, and vertically-stacked conductive levels over the select device gate material. A first opening extends through the vertically-stacked levels to the conductive material and has opposing sidewalls along a cross-section. Nitride liners are along the sidewalls of the first opening. Detectable oxide is between at least one of the nitride liners and one or more of the vertically-stacked conductive levels. Some embodiments include methods for forming integrated structures.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 13, 2018
    Applicant: Micron Technology, Inc.
    Inventors: Jie Li, James Mathew, Kunal Shrotri, Luan C. Tran, Gordon A. Haller, Yangda Zhang, Hongpeng Yu, Minsoo Lee
  • Publication number: 20180331120
    Abstract: A method comprises forming material to be etched over a substrate. An etch mask comprising a silicon nitride-comprising region is formed elevationally over the material. The etch mask comprises an elevationally-extending mask opening in the silicon nitride-comprising region that has a minimum horizontal open dimension that is greater in an elevationally-innermost portion of the region than in an elevationally-outermost portion of the region. The elevationally-outermost portion has a greater etch rate in at least one of HF and H3PO4 than does the elevationally-innermost portion. The etch mask is used as a mask while etching an elevationally-extending mask opening into the material. The silicon nitride-comprising region is exposed to at least one of HF and H3PO4 to increase the minimum horizontal open dimension in the elevationally-outermost portion to a greater degree than increase, if any, in the minimum horizontal open dimension in the elevationally-innermost portion.
    Type: Application
    Filed: July 20, 2018
    Publication date: November 15, 2018
    Applicant: Micron Technology, Inc.
    Inventors: Fei Wang, Tom J. John, Kunal Shrotri, Anish A. Khandekar, Aaron R. Wilson, John D. Hopkins, Derek F. Lundberg
  • Patent number: 10121799
    Abstract: A method comprises forming material to be etched over a substrate. An etch mask comprising a silicon nitride-comprising region is formed elevationally over the material. The etch mask comprises an elevationally-extending mask opening in the silicon nitride-comprising region that has a minimum horizontal open dimension that is greater in an elevationally-innermost portion of the region than in an elevationally-outermost portion of the region. The elevationally-outermost portion has a greater etch rate in at least one of HF and H3PO4 than does the elevationally-innermost portion. The etch mask is used as a mask while etching an elevationally-extending mask opening into the material. The silicon nitride-comprising region is exposed to at least one of HF and H3PO4 to increase the minimum horizontal open dimension in the elevationally-outermost portion to a greater degree than increase, if any, in the minimum horizontal open dimension in the elevationally-innermost portion.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: November 6, 2018
    Assignee: Micron Technology, Inc.
    Inventors: Fei Wang, Tom J. John, Kunal Shrotri, Anish A. Khandekar, Aaron R. Wilson, John D. Hopkins, Derek F. Lundberg
  • Publication number: 20180294275
    Abstract: A method of forming poly silicon comprises forming a first polysilicon-comprising material over a substrate, with the first polysilicon-comprising material comprising at least one of elemental carbon and elemental nitrogen at a total of 0.1 to 20 atomic percent. A second polysilicon-comprising material is formed over the first polysilicon-comprising material. The second polysilicon-comprising material comprises less, if any, total elemental carbon and elemental nitrogen than the first polysilicon-comprising material. Other aspects and embodiments, including structure independent of method of manufacture, are disclosed.
    Type: Application
    Filed: June 7, 2018
    Publication date: October 11, 2018
    Applicant: Micron Technology, Inc.
    Inventors: Dimitrios Pavlopoulos, Kunal Shrotri, Anish A. Khandekar
  • Patent number: 10096610
    Abstract: A 3D NAND storage device includes a plurality of layers containing doped semiconductor material interleaved with a plurality of layers of dielectric material. A first portion of the plurality of doped semiconductor material layers may be doped with a first dopant having a first dopant parameter. A second portion of the plurality of doped semiconductor material layers may be doped with a second dopant having a second dopant parameter. In embodiments, the first portion of the plurality of doped semiconductor layers may include a dopant at a concentration less than a defined threshold. In embodiments, the second portion of the plurality of doped semiconductor layers may include a dopant at a concentration less than the defined threshold. The differing dopant concentrations have been found to beneficially and advantageously affect the etch rate in the respective semiconductor layers when forming control gate recesses in the semiconductor layers.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: October 9, 2018
    Assignee: Intel Corporation
    Inventors: John Hopkins, Younghee Kim, Jie Li, Yu Yuwen, Ramey Abdelrahaman, Kunal Shrotri
  • Publication number: 20180286876
    Abstract: Flash memory technology is disclosed. In one example, a flash memory component can include a plurality of insulative layers vertically spaced apart from one another. The memory component can also include a vertically oriented conductive channel extending through the plurality of insulative layers. In addition, the memory component can include a charge storage structure disposed between adjacent insulative layers. The charge storage structure can have a vertical cross section with a first side oriented toward the conductive channel and a second side opposite the first side. A length of the first side can be greater than a length of the second side. In another example, the vertical cross-section of the charge storage structure comprises a non-rectangular shape, such as a trapezoid shape. Associated systems and methods are also disclosed.
    Type: Application
    Filed: April 1, 2017
    Publication date: October 4, 2018
    Applicant: Intel Corporation
    Inventors: Changhan Kim, Kunal Shrotri, John Hopkins, Darwin Franseda Fan
  • Patent number: 10083984
    Abstract: Some embodiments include an integrated structure having a first opening extending through a stack of alternating insulative levels and conductive levels. A nitride structure is within the first opening and narrows the first opening to form a second opening. Detectable oxide is between the nitride structure and one or more of the conductive levels. Some embodiments include an integrated structure having a conductive material, a select device gate material over the conductive material, and vertically-stacked conductive levels over the select device gate material. A first opening extends through the vertically-stacked levels to the conductive material and has opposing sidewalls along a cross-section. Nitride liners are along the sidewalls of the first opening. Detectable oxide is between at least one of the nitride liners and one or more of the vertically-stacked conductive levels. Some embodiments include methods for forming integrated structures.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: September 25, 2018
    Assignee: Micron Technology, Inc.
    Inventors: Jie Li, James Mathew, Kunal Shrotri, Luan C. Tran, Gordon A. Haller, Yangda Zhang, Hongpeng Yu, Minsoo Lee
  • Patent number: 10014311
    Abstract: A method of forming poly silicon comprises forming a first polysilicon-comprising material over a substrate, with the first polysilicon-comprising material comprising at least one of elemental carbon and elemental nitrogen at a total of 0.1 to 20 atomic percent. A second polysilicon-comprising material is formed over the first poly silicon-comprising material. The second polysilicon-comprising material comprises less, if any, total elemental carbon and elemental nitrogen than the first polysilicon-comprising material. Other aspects and embodiments, including structure independent of method of manufacture, are disclosed.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: July 3, 2018
    Assignee: Micron Technology, Inc.
    Inventors: Dimitrios Pavlopoulos, Kunal Shrotri, Anish A. Khandekar
  • Publication number: 20180114795
    Abstract: A method comprises forming material to be etched over a substrate. An etch mask comprising a silicon nitride-comprising region is formed elevationally over the material. The etch mask comprises an elevationally-extending mask opening in the silicon nitride-comprising region that has a minimum horizontal open dimension that is greater in an elevationally-innermost portion of the region than in an elevationally-outermost portion of the region. The elevationally-outermost portion has a greater etch rate in at least one of HF and H3PO4 than does the elevationally-innermost portion. The etch mask is used as a mask while etching an elevationally-extending mask opening into the material. The silicon nitride-comprising region is exposed to at least one of HF and H3PO4 to increase the minimum horizontal open dimension in the elevationally-outermost portion to a greater degree than increase, if any, in the minimum horizontal open dimension in the elevationally-innermost portion.
    Type: Application
    Filed: December 21, 2017
    Publication date: April 26, 2018
    Inventors: Fei Wang, Tom J. John, Kunal Shrotri, Anish A. Khandekar, Aaron R. Wilson, John D. Hopkins, Derek F. Lundberg
  • Publication number: 20180108670
    Abstract: A method of forming poly silicon comprises forming a first polysilicon-comprising material over a substrate, with the first polysilicon-comprising material comprising at least one of elemental carbon and elemental nitrogen at a total of 0.1 to 20 atomic percent. A second polysilicon-comprising material is formed over the first poly silicon-comprising material. The second polysilicon-comprising material comprises less, if any, total elemental carbon and elemental nitrogen than the first polysilicon-comprising material. Other aspects and embodiments, including structure independent of method of manufacture, are disclosed.
    Type: Application
    Filed: October 17, 2016
    Publication date: April 19, 2018
    Inventors: Dimitrios Pavlopoulos, Kunal Shrotri, Anish A. Khandekar