Patents by Inventor Kunihiko Akai

Kunihiko Akai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210229222
    Abstract: A method for producing solder particles, which includes: a preparation step wherein a base material that has a plurality of recesses and solder fine particles are prepared; an accommodation step wherein at least some of the solder fine particles are accommodated in the recesses; and a fusing step wherein the solder fine particles accommodated in the recesses are fused, thereby forming solder particles within the recesses. With respect to this method for producing solder particles, the average particle diameter of the solder particles is from 1 ?m to 30 ?m; and the C.V. value of the solder particles is 20% or less.
    Type: Application
    Filed: June 26, 2019
    Publication date: July 29, 2021
    Applicant: Showa Denko Materials Co., Ltd.
    Inventors: Kunihiko AKAI, Yoshinori EJIRI, Yuuhei OKADA, Toshimitsu MORIYA, Shinichirou SUKATA, Masayuki MIYAJI
  • Publication number: 20210114145
    Abstract: The present invention relates to solder particles, each of which partially has a flat portion in the surface. By using these solder particles, electrodes facing each other are able to be appropriately connected, thereby achieving an anisotropic conductive material that exhibits excellent conduction reliability and excellent insulation reliability.
    Type: Application
    Filed: June 26, 2019
    Publication date: April 22, 2021
    Applicant: Showa Denko Materials Co., Ltd.
    Inventors: Kunihiko AKAI, Yoshinori EJIRI, Yuuhei OKADA, Toshimitsu MORIYA, Shinichirou SUKATA, Masayuki MIYAJI
  • Publication number: 20210114147
    Abstract: A method for producing an anisotropic conductive film, which includes: a preparation step wherein a base material that has a plurality of recesses and solder fine particles are prepared; an accommodation step wherein at least some of the solder fine particles are accommodated in the recesses; a fusing step wherein the solder fine particles accommodated in the recesses are fused, thereby forming solder particles within the recesses; a transfer step wherein an insulating resin material is brought into contact with the recess opening side of the base material that includes the solder particles in the recesses, thereby obtaining a first resin layer on which the solder particles have been transferred; and a layering step wherein a second resin layer that is configured from an insulating resin material is formed on the surface of the first resin layer, on which the solder particles have been transferred, thereby obtaining an anisotropic conductive film.
    Type: Application
    Filed: June 26, 2019
    Publication date: April 22, 2021
    Applicant: Showa Denko Materials Co., Ltd.
    Inventors: Kunihiko AKAI, Yoshinori EJIRI, Yuuhei OKADA, Toshimitsu MORIYA, Shinichirou SUKATA, Masayuki MIYAJI
  • Publication number: 20190195686
    Abstract: The disclosure provides a detecting composition or layer; a film, a device, a tape and a detecting system having the detecting layer; and methods of use thereof.
    Type: Application
    Filed: November 29, 2018
    Publication date: June 27, 2019
    Inventors: Kunihiko Akai, Shingo Kobayashi, Nobuyuki Ogawa
  • Patent number: 8480971
    Abstract: The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
    Type: Grant
    Filed: April 15, 2011
    Date of Patent: July 9, 2013
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroshi Kawazoe, Kunihiko Akai, Kiyoshi Yasue
  • Patent number: 8480970
    Abstract: The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: July 9, 2013
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Hiroshi Kawazoe, Kunihiko Akai, Kiyoshi Yasue
  • Patent number: 8383016
    Abstract: Conductive fine particles have core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface. The phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A. The phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.1-3 wt % of the entire region B, and the phosphorus content of the entire metal-plated coating film layer is 7 wt % or greater.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: February 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Nana Enomoto, Kunihiko Akai
  • Publication number: 20120228559
    Abstract: Conductive fine particles have core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface. The phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A. The phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.1-3 wt % of the entire region B, and the phosphorus content of the entire metal-plated coating film layer is 7 wt % or greater.
    Type: Application
    Filed: March 9, 2012
    Publication date: September 13, 2012
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Nana Enomoto, Kunihiko Akai
  • Publication number: 20110206558
    Abstract: The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
    Type: Application
    Filed: April 15, 2011
    Publication date: August 25, 2011
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Hiroshi KAWAZOE, Kunihiko AKAI, Kiyoshi YASUE
  • Publication number: 20110140300
    Abstract: The present invention relates to a microfluid-system-supporting unit, comprising a fixing layer formed on a substrate, a protective layer or a fixing layer, wherein part of at least one hollow filament in any shape is placed and fixed in the fixing layer. Thus, it provides a microfluid-system-supporting unit lower in surface irregularity even when there are multiple hollow filaments different in external diameter or the hollow filaments crosses each other and resistant to positional deviation of the hollow filament in the crossing regions, and a production method thereof.
    Type: Application
    Filed: February 14, 2011
    Publication date: June 16, 2011
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Kunihiko AKAI, Hiroshi KAWAZOE
  • Publication number: 20110132535
    Abstract: The present invention relates to a microfluid-system-supporting unit, comprising a fixing layer formed on a substrate, a protective layer or a fixing layer, wherein part of at least one hollow filament in any shape is placed and fixed in the fixing layer. Thus, it provides a microfluid-system-supporting unit lower in surface irregularity even when there are multiple hollow filaments different in external diameter or the hollow filaments crosses each other and resistant to positional deviation of the hollow filament in the crossing regions, and a production method thereof.
    Type: Application
    Filed: February 14, 2011
    Publication date: June 9, 2011
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Kunihiko AKAI, Hiroshi KAWAZOE
  • Publication number: 20110135817
    Abstract: The present invention relates to a microfluid-system-supporting unit, comprising a fixing layer formed on a substrate, a protective layer or a fixing layer, wherein part of at least one hollow filament in any shape is placed and fixed in the fixing layer. Thus, it provides a microfluid-system-supporting unit lower in surface irregularity even when there are multiple hollow filaments different in external diameter or the hollow filaments crosses each other and resistant to positional deviation of the hollow filament in the crossing regions, and a production method thereof.
    Type: Application
    Filed: February 14, 2011
    Publication date: June 9, 2011
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Kunihiko AKAI, Hiroshi KAWAZOE
  • Publication number: 20110044864
    Abstract: The present invention provides a supporting unit of microfluid system having a smaller restriction on the number of the steps and capacity of the reaction and analysis that can be produced easily, and a microfluid-system supporting unit allowing mounting of complicated fluid circuits densely. The present invention relates to a microfluid-system supporting unit, comprising a first supporting plate and at least one hollow filament constituting the channel of the microfluid system, wherein the hollow filament is placed on the first supporting plate in any shape and a particular internal region of the hollow filament has a function.
    Type: Application
    Filed: November 3, 2010
    Publication date: February 24, 2011
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Hiroshi Kawazoe, Kiyoshi Yasue, Kunihiko Akai, Yoshinori Inoue
  • Publication number: 20110031449
    Abstract: The invention provides conductive fine particles with a satisfactory monodisperse property, low cost, resistance to migration and excellent conductivity. Conductive fine particles having core particle surfaces coated with a metal-plated coating film layer containing nickel and phosphorus and a multilayer conductive layer comprising a palladium layer as the outer surface, wherein the phosphorus content in region A of the metal-plated coating film layer, at a distance of no greater than 20% of the thickness of the entire metal-plated coating film layer from the surface of the core particle, is 7-15 wt % of the entire region A, the phosphorus content in region B of the metal-plated coating film layer, at a distance of no greater than 10% of the thickness of the entire metal-plated coating film layer from the surface of the metal-plated coating film layer on the palladium layer side, is 0.
    Type: Application
    Filed: August 6, 2010
    Publication date: February 10, 2011
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Nana Enomoto, Kunihiko Akai
  • Publication number: 20100327237
    Abstract: A conductive particle 8a comprising a core particle 11, a palladium layer 12 coating the core particle 11 and having a thickness of 200 ? or larger, and an insulating particle 1 arranged on the surface of the palladium layer 12 and having a particle diameter larger than the thickness of the palladium layer 12.
    Type: Application
    Filed: February 2, 2009
    Publication date: December 30, 2010
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Kenji Takai, Mitsuharu Matsuzawa, Yuuko Nagahara, Kunihiko Akai
  • Publication number: 20090291264
    Abstract: The present invention relates to a microfluid-system-supporting unit, comprising a fixing layer formed on a substrate, a protective layer or a fixing layer, wherein part of at least one hollow filament in any shape is placed and fixed in the fixing layer. Thus, it provides a microfluid-system-supporting unit lower in surface irregularity even when there are multiple hollow filaments different in external diameter or the hollow filaments crosses each other and resistant to positional deviation of the hollow filament in the crossing regions, and a production method thereof.
    Type: Application
    Filed: December 9, 2005
    Publication date: November 26, 2009
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Kunihiko Akai, Hiroshi Kawazoe
  • Publication number: 20080124242
    Abstract: The present invention relates to an analytical pretreatment device, comprising a supporting material 1, m inlet ports 3 as fluid injection ports, n outlet ports 4 as fluid outlet port, m×n hollow filament 5 communicating between the inlet ports and the outlet ports, and n filler cartridges 6 connected to the outlet ports (wherein, m is a natural number; and n is a natural number) that provides an analytical pretreatment device allowing easier automation of the analytical pretreatment step for improvement in operational accuracy and saving in labor.
    Type: Application
    Filed: November 30, 2005
    Publication date: May 29, 2008
    Applicant: HITACHI CHEMICAL CO., LTD
    Inventors: Hiroshi Kawazoe, Kunihiko Akai, Kiyoshi Yasue
  • Publication number: 20070183933
    Abstract: The present invention provides a supporting unit of microfluid system having a smaller restriction on the number of the steps and capacity of the reaction and analysis that can be produced easily, and a microfluid-system supporting unit allowing mounting of complicated fluid circuits densely. The present invention relates to a microfluid-system supporting unit, comprising a first supporting plate and at least one hollow filament constituting the channel of the microfluid system, wherein the hollow filament is placed on the first supporting plate in any shape and a particular internal region of the hollow filament has a function.
    Type: Application
    Filed: February 17, 2005
    Publication date: August 9, 2007
    Applicant: HITACHI CHEMICAL CO., LTD
    Inventors: Hiroshi Kawazoe, Kiyoshi Yasue, Kunihiko Akai, Yoshinori Inoue