Patents by Inventor Kunio Watanabe

Kunio Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10589689
    Abstract: An interior member for attachment to a car body configuring member includes a fixing tool to fix the interior member to the car body configuring member, a base portion with a through-hole which allows the fixing tool to pass therethrough, and a movement restricting portion that protrudes from an outer surface of the base portion. The fixing tool has a head disposed on the outer surface, and a shaft extending from the head and fixed to the car body configuring member through the through-hole. The interior member is displaceable in a direction along the outer surface of the base portion within a predetermined area in a state where part of the car body configuring member or the fixing tool is inserted. The movement restricting portion has an abutting portion which restricts movement of the head in the direction along the outer surface.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: March 17, 2020
    Assignee: Kumi Kasei Co., Ltd.
    Inventors: Hirokazu Sekozawa, Kunio Watanabe, Hiroyuki Okonogi
  • Patent number: 10446600
    Abstract: An imaging system serving as an image generation device is provided with: a random color filter array that has a plurality of concave lenses and a plurality of color filters having different transmission characteristics; a photodiode that receives light that has passed through the random color filter array; an AD converter that converts the light received by the photodiode into digital data; and a color image generation circuit that generates an image using the digital data and modulation information of the random color filter array, in which the plurality of concave lenses are located between the plurality of color filters and the photodiode, or the plurality of color filters are located between the plurality of concave lenses and the photodiode.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: October 15, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Satoshi Sato, Hisashi Watanabe, Takeo Azuma, Kunio Nobori, Nobuhiko Wakai, Takamasa Ando
  • Publication number: 20190299868
    Abstract: An interior member for attachment to a car body configuring member includes a fixing tool to fix the interior member to the car body configuring member, a base portion with a through-hole which allows the fixing tool to pass therethrough, and a movement restricting portion that protrudes from an outer surface of the base portion. The fixing tool has a head disposed on the outer surface, and a shaft extending from the head and fixed to the car body configuring member through the through-hole. The interior member is displaceable in a direction along the outer surface of the base portion within a predetermined area in a state where part of the car body configuring member or the fixing tool is inserted. The movement restricting portion has an abutting portion which restricts movement of the head in the direction along the outer surface.
    Type: Application
    Filed: March 17, 2017
    Publication date: October 3, 2019
    Applicant: Kumi Kasei Co., Ltd.
    Inventors: Hirokazu Sekozawa, Kunio Watanabe, Hiroyuki Okonogi
  • Publication number: 20190240799
    Abstract: A local polishing system comprises: a particle estimation unit (30) for estimating the film thickness distribution of a wafer; a local polishing region setting unit (11) for setting a local polishing region on the wafer based on the film thickness distribution; a polishing head selection unit (12) for selecting a polishing head based on the size of the local polishing region; a model storage (20) holding a recipe generating model that defines the relation between an input node and an output node, the input node being an attribute of the local polishing region, the output node comprising a recipe for a polishing process; a polishing recipe generator (13) that puts an attribute of the local polishing region set by the local polishing region setting unit (11) into the input node of the recipe generating model and determines a polishing recipe for polishing the local polishing region; and a polishing recipe transmitter (15) for transmitting data of the polishing recipe to a local polishing module (200) that perfo
    Type: Application
    Filed: September 7, 2017
    Publication date: August 8, 2019
    Applicant: Ebara Corporation
    Inventors: Koichi TAKEDA, Tsuneo TORIKOSHI, Kunio OISHI, Katsuhide WATANABE, Hozumi YASUDA, Yu ISHII
  • Patent number: 10350701
    Abstract: A spot welding method able to simply prevent liquid metal embrittlement cracks in spot welding of plated steel sheets, comprising, before spot welding, removing the plating at least in a zone including the inside of a circle centered at a scheduled location where the center of the nugget is formed and having an outer circumference of the inside of the outer edge of a weld affected zone or a zone at the mated surfaces of the steel sheets to be welded at the inside of a circle sharing a center of a scheduled location becoming the center of the nugget formed at the mated surfaces of the steel sheets and having an outer circumference of the inside of the outer edge of a weld affected zone.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: July 16, 2019
    Assignee: NIPPON STEEL CORPORATION
    Inventors: Yasunobu Miyazaki, Fuminori Watanabe, Chisato Wakabayashi, Kunio Hayashi, Hiroyuki Kawata, Seiji Furusako, Sho Matsui
  • Patent number: 10236248
    Abstract: The manufacturing method of a semiconductor device can improve the mechanical strength of a pad more than before, and suppress the occurrence of a crack. The manufacturing method of a semiconductor device includes: forming a first pad constituted by a first metal layer; forming an insulating layer on the first pad; providing an opening portion in the insulating layer by removing the insulating layer on at least a partial region of the first pad; forming a second pad constituted by a second metal layer in the opening portion of the insulating layer so as to have a film thickness that is smaller than the film thickness of the insulating layer; and forming a third pad constituted by a third metal layer on the second pad.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: March 19, 2019
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Takahiko Yoshizawa, Kunio Watanabe, Tatsuki Shirasawa, Takashi Sakuda
  • Patent number: 10157932
    Abstract: A semiconductor device includes: a memory transistor including a first silicon oxide film, a first silicon nitride film, a second silicon oxide film, and a first gate electrode that are disposed in sequence on a substrate; and a MOS transistor including a third silicon oxide film and a second gate electrode that are disposed in sequence on the substrate. The memory transistor has a side wall including an extending portion of the first silicon oxide film, a second silicon nitride film that is in contact with the first silicon nitride film, and a fourth silicon oxide film that are disposed in sequence on the substrate, and the MOS transistor has a side wall including a fifth silicon oxide film that is disposed on the substrate.
    Type: Grant
    Filed: August 3, 2017
    Date of Patent: December 18, 2018
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Kunio Watanabe, Masaki Okuyama
  • Publication number: 20180047745
    Abstract: A semiconductor device includes: a memory transistor including a first silicon oxide film, a first silicon nitride film, a second silicon oxide film, and a first gate electrode that are disposed in sequence on a substrate; and a MOS transistor including a third silicon oxide film and a second gate electrode that are disposed in sequence on the substrate. The memory transistor has a side wall including an extending portion of the first silicon oxide film, a second silicon nitride film that is in contact with the first silicon nitride film, and a fourth silicon oxide film that are disposed in sequence on the substrate, and the MOS transistor has a side wall including a fifth silicon oxide film that is disposed on the substrate.
    Type: Application
    Filed: August 3, 2017
    Publication date: February 15, 2018
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Kunio WATANABE, Masaki OKUYAMA
  • Publication number: 20170365549
    Abstract: The manufacturing method of a semiconductor device can improve the mechanical strength of a pad more than before, and suppress the occurrence of a crack. The manufacturing method of a semiconductor device includes: forming a first pad constituted by a first metal layer; forming an insulating layer on the first pad; providing an opening portion in the insulating layer by removing the insulating layer on at least a partial region of the first pad; forming a second pad constituted by a second metal layer in the opening portion of the insulating layer so as to have a film thickness that is smaller than the film thickness of the insulating layer; and forming a third pad constituted by a third metal layer on the second pad.
    Type: Application
    Filed: May 24, 2017
    Publication date: December 21, 2017
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Takahiko YOSHIZAWA, Kunio WATANABE, Tatsuki SHIRASAWA, Takashi SAKUDA
  • Patent number: 9663396
    Abstract: A glass sheet has one surface and the other surface facing the one surface in a thickness direction, wherein a fluorine concentration (average fluorine concentration by SIMS at a depth of 1 to 24 ?m) in the one surface is higher than that in the other surface. The following expression is satisfied: 0.07??F/?H2O. ?F (mol %) is a value obtained by subtracting an average fluorine concentration in the surface having the lower fluorine concentration from that in the surface having the higher fluorine concentration, and ?H2O (mol %) is an absolute value of a value obtained by subtracting an average H2O concentration in the surface having the higher fluorine concentration from that in the surface having the lower fluorine concentration.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: May 30, 2017
    Assignee: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi Miyasaka, Hideko Nakada, Yasuo Hayashi, Makoto Fukawa, Toshifumi Nihei, Masanobu Shirai, Naoki Okahata, Koji Nakagawa, Kazuhiko Yamanaka, Kunio Watanabe, Shiro Tanii, Nobuaki Ikawa, Daisuke Kobayashi, Junichi Miyashita, Ryosuke Kato
  • Patent number: 9126885
    Abstract: To provide a method for purifying R-1234yf, whereby it is possible to efficiently remove even impurities such as R-1243zf, etc. which are difficult to separate by distillation purification, from a mixture containing R-1234yf as the main component and various impurities, such as a gas formed by reacting R-1214ya with hydrogen. The method for purifying R-1234yf comprises a step of bringing a mixture which contains R-1234yf as the main component and also contains hydrohaloalkene impurities other than R-1234yf and hydrohaloalkane impurities, into contact with a solvent that has an extraction/removal index (r), as represented by the formula r=[4×(?D?17.2)2+(?P?8.3)2+(?H?2.6)2]1/2, of at most 6.5, so as to remove at least a part of the hydrohaloalkene impurities and hydrohaloalkane impurities.
    Type: Grant
    Filed: August 5, 2013
    Date of Patent: September 8, 2015
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuyoshi Kurashima, Kunio Watanabe, Hiroshi Yamamoto
  • Patent number: 9035950
    Abstract: A computer-readable recording medium storing an information display program for causing a computer to execute a process, the process includes: identifying a first component related to a first character string extracted, referring to a first storage unit that stores a plurality of components constituting the article and character strings that individually represent the plurality of components; obtaining first location information related to the first component from a second storage unit that stores pieces of location information corresponding to the plurality of components in the article; determining an eye direction when a shape of the article is displayed; determining second location information of the first component in the shape of the article related to the eye direction, based on the first location information and the eye direction; and displaying the first character string based on the second location information.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: May 19, 2015
    Assignee: Fujitsu Limited
    Inventors: Yuko Kawakita, Kunio Watanabe
  • Publication number: 20150079347
    Abstract: A glass sheet has one surface and the other surface facing the one surface in a thickness direction, wherein a fluorine concentration (average fluorine concentration by SIMS at a depth of 1 to 24 ?m) in the one surface is higher than that in the other surface. The following expression is satisfied: 0.07??F/?H2O. ?F (mol %) is a value obtained by subtracting an average fluorine concentration in the surface having the lower fluorine concentration from that in the surface having the higher fluorine concentration, and ?H2O (mol %) is an absolute value of a value obtained by subtracting an average H2O concentration in the surface having the higher fluorine concentration from that in the surface having the lower fluorine concentration.
    Type: Application
    Filed: September 26, 2014
    Publication date: March 19, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi MIYASAKA, Hideko NAKADA, Yasuo HAYASHI, Makoto FUKAWA, Toshifumi NIHEI, Masanobu SHIRAI, Naoki OKAHATA, Koji NAKAGAWA, Kazuhiko YAMANAKA, Kunio WATANABE, Shiro TANII, Nobuaki IKAWA, Daisuke KOBAYASHI, Junichi MIYASHITA, Ryosuke KATO
  • Publication number: 20150072129
    Abstract: A glass sheet includes 4 mol % or more of Al2O3. In the glass sheet, a surface Na2O amount in one surface of the glass sheet is lower than the surface Na2O amount in the other surface of the glass sheet by 0.2 mass % to 1.2 mass %.
    Type: Application
    Filed: September 26, 2014
    Publication date: March 12, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Naoki OKAHATA, Koji NAKAGAWA, Kazuhiko YAMANAKA, Kunio WATANABE, Shiro TANII, Nobuaki IKAWA, Daisuke KOBAYASHI, Junichi MIYASHITA, Ryosuke KATO, Toshifumi NIHEI, Yoichi SERA, Yasuo HAYASHI, Makoto FUKAWA
  • Patent number: 8877870
    Abstract: A fluorinated elastic copolymer which has iodine atoms, bromine atoms, or both iodine and bromine atoms, at its molecular terminals and which includes repeating units (a) based on tetrafluoroethylene, repeating units (b) based on a fluorinated monomer having one polymerizable unsaturated bond (provided that tetrafluoroethylene is excluded), and repeating units (c) based on a fluorinated monomer having at least two polymerizable unsaturated bonds, wherein the ratio (molar ratio) of the repeating units (a) to the repeating units (b) is (a)/(b)=40/60 to 90/10, and the proportion of the repeating units (c) based on the total amount of the repeating units (a) and the repeating units (b) is from 0.01 to 1 mol %.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: November 4, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Hiroshi Funaki, Kunio Watanabe, Keigo Matsuura, Ng Soon Yeng
  • Patent number: 8766021
    Abstract: In the production of 2,3,3,3-tetrafluoropropene (HFO-1234yf), formation of HFC-254eb as an excessively reduced product is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound gas composed of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen gas, in the presence of a catalyst, wherein the catalyst is a catalyst having palladium supported on active carbon, and the ratio of the number of moles of the hydrogen gas to the number of moles of chlorine atoms in the raw material compound gas (H2/Cl) is at most 0.7.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: July 1, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Satoshi Kawaguchi, Hidekazu Okamoto, Yu Takeuchi, Hirokazu Takagi, Kunio Watanabe, Koichi Yanase
  • Patent number: 8735308
    Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: May 27, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Akio Koike, Chikaya Tamitsuji, Kunio Watanabe, Tomonori Ogawa
  • Patent number: 8656735
    Abstract: To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness. A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: February 25, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Chikaya Tamitsuji, Kunio Watanabe
  • Publication number: 20130317262
    Abstract: To provide a method for purifying R-1234yf, whereby it is possible to efficiently remove even impurities such as R-1243zf, etc. which are difficult to separate by distillation purification, from a mixture containing R-1234yf as the main component and various impurities, such as a gas formed by reacting R-1214ya with hydrogen. The method for purifying R-1234yf comprises a step of bringing a mixture which contains R-1234yf as the main component and also contains hydrohaloalkene impurities other than R-1234yf and hydrohaloalkane impurities, into contact with a solvent that has an extraction/removal index (r), as represented by the formula r=[4×(?D?17.2)2+(?P?8.3)2+(?H?2.6)2]1/2, of at most 6.5, so as to remove at least a part of the hydrohaloalkene impurities and hydrohaloalkane impurities.
    Type: Application
    Filed: August 5, 2013
    Publication date: November 28, 2013
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuyoshi KURASHIMA, Kunio Watanabe, Hiroshi Yamamoto
  • Patent number: 8530710
    Abstract: The object is to provide a process whereby it is possible to produce 2,3,3,3-tetrafluoropropene at a high conversion ratio constantly for a long period of time. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in the presence of a noble metal catalyst supported on active carbon having an ash content of at most 3% as measured in accordance with ASTM D2866.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: September 10, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Hirokazu Takagi, Hidekazu Okamoto, Satoshi Kawaguchi, Yu Takeuchi, Kunio Watanabe, Koichi Yanase, Shingo Nomura