Patents by Inventor Kuo-Yao Chou

Kuo-Yao Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9184059
    Abstract: A method of fabricating a semiconductor device includes the steps of providing a hard mask cover using a patterned photoresist layer, wherein the patterned photoresist layer comprises at least four first holes arranged in two rows and two columns. Part of the hard mask is removed to form at least four second holes by taking the pattered photoresist layer as a mask. Next, each of the first holes is widened, and the widened first holes and the second holes are filled up by a filler. Later, the patterned photoresist layer is removed entirely. Part of the hard mask is removed to form at least a fourth hole by taking the filler as a mask. Finally, the filler is removed entirely.
    Type: Grant
    Filed: March 21, 2014
    Date of Patent: November 10, 2015
    Assignee: INOTERA MEMORIES, INC.
    Inventor: Kuo-Yao Chou
  • Publication number: 20150270141
    Abstract: A method of fabricating a semiconductor device includes the steps of providing a hard mask cover using a patterned photoresist layer, wherein the patterned photoresist layer comprises at least four first holes arranged in two rows and two columns. Part of the hard mask is removed to form at least four second holes by taking the pattered photoresist layer as a mask. Next, each of the first holes is widened, and the widened first holes and the second holes are filled up by a filler. Later, the patterned photoresist layer is removed entirely. Part of the hard mask is removed to form at least a fourth hole by taking the filler as a mask. Finally, the filler is removed entirely.
    Type: Application
    Filed: March 21, 2014
    Publication date: September 24, 2015
    Applicant: INOTERA MEMORIES, INC.
    Inventor: Kuo-Yao Chou