Patents by Inventor Kyeong Bae Kim

Kyeong Bae Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230021395
    Abstract: The present invention relates to novel mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yl)pyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, a novel crystalline form thereof, and a process for preparing the same. More specifically, the present invention relates to mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yl)pyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, which is excellent in stability, solubility, and bioavailability when it is administered not only alone but also in combination with other drugs and which has a high purity, a crystalline form thereof, and a process for preparing the same.
    Type: Application
    Filed: March 17, 2022
    Publication date: January 26, 2023
    Inventors: Sang Ho OH, Jong Gyun KIM, Se-Woong OH, Tae Dong HAN, Soo Yong CHUNG, Seong Ran LEE, Kyeong Bae KIM, Young Sung LEE, Woo Seob SHIN, Hyun JU, Jeong Ki KANG, Su Min PARK, Dong Kyun KIM
  • Patent number: 11453656
    Abstract: The present invention relates to novel mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yppyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, a novel crystalline form thereof, and a process for preparing the same. More specifically, the present invention relates to mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yl)pyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, which is excellent in stability, solubility, and bioavailability when it is administered not only alone but also in combination with other drugs and which has a high purity, a crystalline form thereof, and a process for preparing the same.
    Type: Grant
    Filed: April 18, 2018
    Date of Patent: September 27, 2022
    Assignee: Yuhan Corporation
    Inventors: Sang Ho Oh, Jong Gyun Kim, Se-Woong Oh, Tae Dong Han, Soo Yong Chung, Seong Ran Lee, Kyeong Bae Kim, Young Sung Lee, Woo Seob Shin, Hyun Ju, Jeong Ki Kang, Su Min Park, Dong Kyun Kim
  • Publication number: 20210139461
    Abstract: The present invention relates to novel mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yppyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, a novel crystalline form thereof, and a process for preparing the same. More specifically, the present invention relates to mesylate salt of N-(5-(4-(4-((dimethylamino)methyl)-3-phenyl-1H-pyrazol-1-yl)pyrimidine-2-ylamino)-4-methoxy-2-morpholinophenyl)acrylamide, which is excellent in stability, solubility, and bioavailability when it is administered not only alone but also in combination with other drugs and which has a high purity, a crystalline form thereof, and a process for preparing the same.
    Type: Application
    Filed: April 18, 2018
    Publication date: May 13, 2021
    Inventors: Sang Ho OH, Jong Gyun KIM, Se-Woong OH, Tae Dong HAN, Soo Yong CHUNG, Seong Ran LEE, Kyeong Bae KIM, Young Sung LEE, Woo Seob SHIN, Hyun JU, Jeong Ki KANG, Su Min PARK, Dong Kyun KIM
  • Patent number: 10714499
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: July 14, 2020
    Assignee: SK hynix Inc.
    Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
  • Publication number: 20190319045
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Application
    Filed: June 25, 2019
    Publication date: October 17, 2019
    Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
  • Patent number: 10373973
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: August 6, 2019
    Assignee: SK hynix Inc.
    Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
  • Publication number: 20190081066
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Application
    Filed: April 24, 2018
    Publication date: March 14, 2019
    Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
  • Patent number: 8461146
    Abstract: The present invention provides an oral pharmaceutical composition for the treatment of premature ejaculation, and the composition provides the effective and excellent treatment of premature ejaculation as well as reduced side effects like nausea, vomiting, drowsiness, sedation effect, awakening effect, and weight-loss etc.
    Type: Grant
    Filed: May 19, 2009
    Date of Patent: June 11, 2013
    Assignees: Yuhan Corporation, Hyun Uk SEOL
    Inventors: Hyun Uk Seol, Young Sung Lee, Young Hun Kim, Kyeong Bae Kim, Jeong Min Seo, Kyoung Kyu Ahn
  • Publication number: 20110071138
    Abstract: The present invention provides an oral pharmaceutical composition for the treatment of premature ejaculation, and the composition provides the effective and excellent treatment of premature ejaculation as well as reduced side effects like nausea, vomiting, drowsiness, sedation effect, awakening effect, and weight-loss etc.
    Type: Application
    Filed: May 19, 2009
    Publication date: March 24, 2011
    Applicants: Yuhan Corporation
    Inventors: Hyun Uk Seol, Young Sung Lee, Young Hun Kim, Kyeong Bae Kim, Jeong Min Seo, Kyoung Kyu Ahn