Patents by Inventor Kyle Fondurulia

Kyle Fondurulia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100322604
    Abstract: A precursor source vessel for providing vaporized precursor to a reaction chamber is provided. The precursor source vessel includes a lid having a first port, a second port, and a third port. The precursor source vessel also includes a base removably attached to the lid. The base includes a recessed region formed therein. One of the first, second, and third ports is a burp port configured to relieve the head pressure within the source vessel after the source vessel is installed but prior to use of the source vessel in semiconductor processing.
    Type: Application
    Filed: April 19, 2010
    Publication date: December 23, 2010
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
  • Publication number: 20080085226
    Abstract: A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passage. The vessel has inlet and outlet valves, and optionally a vent valve for venting internal gas. An external gas panel can include at least one valve fluidly interposed between the outlet valve and a substrate reaction chamber. Gas panel valves can each be positioned along a plane that is generally parallel to, and no more than about 10.0 cm from, a flat surface of the vessel. Filters in a vessel lid or wall filter gas flow through the vessel's valves. A quick-connection assembly allows fast and easy connection of the vessel to a gas panel.
    Type: Application
    Filed: October 10, 2007
    Publication date: April 10, 2008
    Applicant: ASM AMERICA, INC.
    Inventors: Kyle Fondurulia, Eric Shero, Mohith E. Verghese, Carl L. White
  • Publication number: 20060266289
    Abstract: An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas to the gas inlet of the deposition chamber. At least a portion of the gas system is positioned above the deposition chamber. The gas system includes a mixer configured to mix a plurality of gas streams. A transfer member is in fluid communication with the mixer and the gas inlet. The transfer member comprising a pair of horizontally divergent walls configured to spread the gas in a horizontal direction before entering the gas inlet.
    Type: Application
    Filed: January 17, 2006
    Publication date: November 30, 2006
    Inventors: Mohith Verghese, Kyle Fondurulia, Carl White, Eric Shero, Darko Babic, Herbert Terhorst, Marko Peussa, Min Yan
  • Publication number: 20060156981
    Abstract: A semiconductor wafer support pin assembly. A susceptor has at least three support pins configured to raise a wafer above the top surface of the susceptor. Each support pin includes and upper pin and a lower pin, which lock together by means of a quick-release mechanism in the form of a bayonet mount. The upper pin is made of a non-metallic material, such as polybenzimidazole. The susceptor is driven up and down by a lifting mechanism, driven by an electric motor or pneumatic cylinder. The susceptor moves up and down, relative to the support pins.
    Type: Application
    Filed: January 17, 2006
    Publication date: July 20, 2006
    Inventors: Kyle Fondurulia, Carl White
  • Patent number: D614153
    Type: Grant
    Filed: April 6, 2009
    Date of Patent: April 20, 2010
    Assignee: ASM America, Inc.
    Inventors: Kyle Fondurulia, Eric J Shero, Mohith Verghese, Carl L White