Patents by Inventor Kyle TANTIWONG
Kyle TANTIWONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11728141Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.Type: GrantFiled: February 1, 2022Date of Patent: August 15, 2023Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Publication number: 20220157562Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages.Type: ApplicationFiled: February 1, 2022Publication date: May 19, 2022Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 11244811Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: GrantFiled: December 19, 2018Date of Patent: February 8, 2022Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 11139150Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: August 29, 2019Date of Patent: October 5, 2021Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 11119051Abstract: A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.Type: GrantFiled: October 2, 2020Date of Patent: September 14, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Todd Egan, Mehdi Vaez-Iravani, Samer Banna, Kyle Tantiwong, Gregory Kirk, Abraham Ravid, Yaoming Shen
-
Patent number: 10923371Abstract: Embodiments of the disclosure provide methods and system for inspecting and treating a substrate. In one embodiment, a method is provided including transmitting a first plurality of beams from a diffractive beam splitter to a first surface of a substrate to generate a reflection of a second plurality of beams, wherein the first plurality of beams are spaced apart from each other upon arriving at the first surface of the substrate; receiving the second plurality of beams on a recording surface of an optical device, wherein the second plurality of beams are spaced apart from each other upon arriving at the recording surface; measuring positional information of the second plurality of beams on the recording surface; comparing the positional information of the second plurality of beams to positional information stored in a memory; and storing a result of the comparison in the memory.Type: GrantFiled: March 30, 2017Date of Patent: February 16, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Mehdi Vaez-Iravani, Todd Egan, Samer Banna, Kyle Tantiwong
-
Publication number: 20210018449Abstract: A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.Type: ApplicationFiled: October 2, 2020Publication date: January 21, 2021Inventors: Todd EGAN, Mehdi VAEZ-IRAVANI, Samer BANNA, Kyle TANTIWONG, Gregory KIRK, Abraham RAVID, Yaoming SHEN
-
Patent number: 10845317Abstract: A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.Type: GrantFiled: May 23, 2017Date of Patent: November 24, 2020Assignee: Applied Materials, Inc.Inventors: Todd Egan, Mehdi Vaez-Iravani, Samer Banna, Kyle Tantiwong, Gregory Kirk, Abraham Ravid, Yaoming Shen
-
Patent number: 10553398Abstract: Embodiments of inductively coupled plasma (ICP) reactors are provided herein. In some embodiments, a dielectric window for an inductively coupled plasma reactor includes: a body including a first side, a second side opposite the first side, an edge, and a center, wherein the dielectric window has a dielectric coefficient that varies spatially. In some embodiments, an apparatus for processing a substrate includes: a process chamber having a processing volume disposed beneath a lid of the process chamber; and one or more inductive coils disposed above the lid to inductively couple RF energy into and to form a plasma in the processing volume above a substrate support disposed within the processing volume; wherein the lid is a dielectric window comprising a first side and an opposing second side that faces the processing volume, and wherein the lid has a dielectric coefficient that spatially varies to provide a varied power coupling of RF energy from the one or more inductive coils to the processing volume.Type: GrantFiled: August 19, 2014Date of Patent: February 4, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Samer Banna, Tza-Jing Gung, Vladimir Knyazik, Kyle Tantiwong, Dan A. Marohl, Valentin N. Todorow, Stephen Yuen
-
Publication number: 20190385824Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: ApplicationFiled: August 29, 2019Publication date: December 19, 2019Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 10510624Abstract: Embodiments of the disclosure provide a metrology system. In one example, a metrology system includes a laser source adapted to transmit a light beam, a lens adapted to receive at least a portion of the light beam from the laser source, a first beam splitter positioned to receive at least the portion of the light beam passing through the lens, a first beam displacing device adapted to cause a portion of the light beam received from the beam splitter to be split into two or more sub-light beams a first recording device having a detection surface, and a first polarizer that is positioned between the first displacing device and the first recording device, wherein the first polarizer is configured to cause the two or more sub-light beams provided from the first displacing device to form an interference pattern on the detection surface of the first recording device.Type: GrantFiled: March 9, 2017Date of Patent: December 17, 2019Assignee: Applied Materials, Inc.Inventors: Mehdi Vaez-Iravani, Todd Egan, Samer Banna, Kyle Tantiwong
-
Patent number: 10410841Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: May 24, 2018Date of Patent: September 10, 2019Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 10332772Abstract: An electrostatic chuck (ESC) with a cooling base for plasma processing chambers, such as a plasma etch chamber. In embodiments, a plasma processing chuck includes a plurality of independent edge zones. In embodiments, the edge zones are segments spanning different azimuth angles of the chuck to permit independent edge temperature tuning, which may be used to compensate for other chamber related non-uniformities or incoming wafer non-uniformities. In embodiments, the chuck includes a center zone having a first heat transfer fluid supply and control loop, and a plurality of edge zones, together covering the remainder of the chuck area, and each having separate heat transfer fluid supply and control loops. In embodiments, the base includes a diffuser, which may have hundreds of small holes over the chuck area to provide a uniform distribution of heat transfer fluid.Type: GrantFiled: March 10, 2014Date of Patent: June 25, 2019Assignee: Applied Materials, Inc.Inventors: Kyle Tantiwong, Vladimir Knyazik, Samer Banna
-
Publication number: 20190122861Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: ApplicationFiled: December 19, 2018Publication date: April 25, 2019Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Publication number: 20190072497Abstract: A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.Type: ApplicationFiled: May 23, 2017Publication date: March 7, 2019Applicant: Applied Materials, Inc.Inventors: Todd EGAN, Mehdi VAEZ-IRAVANI, Samer BANNA, Kyle TANTIWONG, Gregory KIRK, Abraham RAVID, Yaoming SHEN
-
Publication number: 20190074201Abstract: Embodiments of the disclosure provide methods and system for inspecting and treating a substrate. In one embodiment, a method is provided including transmitting a first plurality of beams from a diffractive beam splitter to a first surface of a substrate to generate a reflection of a second plurality of beams, wherein the first plurality of beams are spaced apart from each other upon arriving at the first surface of the substrate; receiving the second plurality of beams on a recording surface of an optical device, wherein the second plurality of beams are spaced apart from each other upon arriving at the recording surface; measuring positional information of the second plurality of beams on the recording surface; comparing the positional information of the second plurality of beams to positional information stored in a memory; and storing a result of the comparison in the memory.Type: ApplicationFiled: March 30, 2017Publication date: March 7, 2019Inventors: Mehdi VAEZ-IRAVANI, Todd EGAN, Samer BANNA, Kyle TANTIWONG
-
Publication number: 20190057910Abstract: Embodiments of the disclosure provide a metrology system. In one example, a metrology system includes a laser source adapted to transmit a light beam, a lens adapted to receive at least a portion of the light beam from the laser source, a first beam splitter positioned to receive at least the portion of the light beam passing through the lens, a first beam displacing device adapted to cause a portion of the light beam received from the beam splitter to be split into two or more sub-light beams a first recording device having a detection surface, and a first polarizer that is positioned between the first displacing device and the first recording device, wherein the first polarizer is configured to cause the two or more sub-light beams provided from the first displacing device to form an interference pattern on the detection surface of the first recording device.Type: ApplicationFiled: March 9, 2017Publication date: February 21, 2019Inventors: Mehdi VAEZ-IRAVANI, Todd EGAN, Samer BANNA, Kyle TANTIWONG
-
Patent number: 10163606Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: GrantFiled: February 3, 2014Date of Patent: December 25, 2018Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Publication number: 20180269038Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: ApplicationFiled: May 24, 2018Publication date: September 20, 2018Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
-
Patent number: 10008368Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: February 3, 2014Date of Patent: June 26, 2018Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna