Abstract: The present disclosure relates to a diagnostic method and a device performing the same. According to an aspect of the present disclosure, a diagnostic device is a diagnostic device that uses a test kit including a specimen plate having a specimen region in which a specimen is smeared and a patch plate configured to store a contact-type patch, which comes into contact with the specimen to stain the specimen, and the diagnostic device includes a body having a loading region in which the test kit is placed, a moving unit configured to move the patch plate and the specimen plate of the test kit relative to each other so that the specimen placed in the test kit is smeared in the specimen region, and a contact unit configured to move a structure of the test kit such that the contact-type patch comes into contact with the smeared specimen so that the smeared specimen is stained.

Abstract: An embodiment relates to a dual lens driving apparatus including: a housing; a first bobbin disposed inside the housing; a second bobbin disposed inside the housing and positioned away from the first bobbin; a first coil disposed on the first bobbin; a second coil disposed on the second bobbin; a magnet disposed in the housing and positioned opposite from the first coil and second coil; a base disposed below the housing; a board disposed between the housing and the base and opposite from the magnet and including a circuit member having a third coil; and a supporting member movably supporting the housing with respect to the board. The third coil includes a first axial coil which is disposed in a first direction and a second axial coil which is disposed in a second direction different from the first direction. The first axial coil includes four first axial coil units which are positioned away from one another. The four first axial coil units are connected to one another.

Abstract: The present invention provides a polishing pad, a process for preparing the same, and a process for preparing a semiconductor device using the same. In the polishing pad, the surface zeta potential and its ratio of the polishing surface are controlled to specific ranges according to the type of polishing slurry, whereby it is possible to improve the characteristics of scratches and surface defects appearing on the surface of the semiconductor substrate and to further enhance the polishing rate.

Abstract: A touch sensing device that compensates for a phase error of a downlink signal transmitted/received between a display device and an active pen. The touch sensing device includes a differential amplifier configured to amplify a difference between a first accumulated capacitance value for a first touch group and a second accumulated capacitance value for a second touch group, based on a first downlink signal generated during a pre-driving section, an ADC configured to convert an output signal of the differential amplifier into digital data, and a phase error compensator configured to detect an edge of the first downlink signal based on a difference value between current and previous values of the digital data and compensate for a phase error of the first downlink signal using the edge of the first downlink signal and an edge of an internal timing signal.

Abstract: An embodiment relates to a dual lens driving apparatus including: a housing; a first bobbin disposed inside the housing; a second bobbin disposed inside the housing and positioned away from the first bobbin; a first coil disposed on the first bobbin; a second coil disposed on the second bobbin; a magnet disposed in the housing and positioned opposite from the first coil and second coil; a base disposed below the housing; a board disposed between the housing and the base and opposite from the magnet and including a circuit member having a third coil; and a supporting member movably supporting the housing with respect to the board. The third coil includes a first axial coil which is disposed in a first direction and a second axial coil which is disposed in a second direction different from the first direction. The first axial coil includes four first axial coil units which are positioned away from one another. The four first axial coil units are connected to one another.

Abstract: The present disclosure relates to a diagnostic method and a device performing the same. According to an aspect of the present disclosure, a diagnostic device is a diagnostic device that uses a test kit including a specimen plate having a specimen region in which a specimen is smeared and a patch plate configured to store a contact-type patch, which comes into contact with the specimen to stain the specimen, and the diagnostic device includes a body having a loading region in which the test kit is placed, a moving unit configured to move the patch plate and the specimen plate of the test kit relative to each other so that the specimen placed in the test kit is smeared in the specimen region, and a contact unit configured to move a structure of the test kit such that the contact-type patch comes into contact with the smeared specimen so that the smeared specimen is stained.

Abstract: The embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, to a process for preparing the same, and to a process for preparing a semiconductor device using the same. The polishing pad according to the embodiment adjusts the surface roughness characteristics of the polishing pad after polishing, whereby the polishing rate can be enhanced, and the surface residues, surface scratches, and chatter marks of the wafer can be remarkably reduced.

Abstract: The embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, to a process for preparing the same, and to a process for preparing a semiconductor device using the same. The polishing pad according to the embodiment adjusts the surface roughness characteristics of the polishing pad after polishing, whereby the polishing rate can be enhanced, and the surface residues, surface scratches, and chatter marks of the wafer can be remarkably reduced.

Abstract: An embodiment comprises: a housing comprising a first corner part and a second corner part opposite to the first corner part; a bobbin disposed in the housing; a magnet comprising a first magnet disposed in the first corner part of the housing and a second magnet disposed in the second corner part of the housing; a coil disposed on the bobbin and opposite to the magnet; a circuit board disposed on one surface of the housing and including a position sensor; and a sensing magnet disposed in the bobbin and opposite to the position sensor, wherein a protrusion part is formed to protrude from one surface of the bobbin, opposite to one surface of the housing, toward the one surface of the housing, and the sensing magnet is at least partially placed within the protrusion part of the bobbin.

Abstract: The present disclosure relates to a culturing patch, culturing method, culture test method, culture test device, drug test method, and drug test device, and the culturing patch according to an aspect of the present disclosure includes component required for growth of an object to be cultured, and a mesh structural body provided in a mesh structure forming micro-cavities in which the component required for growth are contained that is configured to come into contact with a reaction region in which the object to be cultured is placed and provide some of the contained component required for growth to the reaction region.

Abstract: The present embodiment relates to a lens driving device comprising: a housing; a bobbin disposed inside the housing; a coil disposed at the bobbin; a magnet disposed in the housing and facing the coil; an elastic member coupled to the housing and the bobbin; and a damper disposed at the elastic member, wherein the elastic member comprises an outer part coupled to the housing, an inner part coupled to the bobbin, and a connection part for connecting the outer part and the inner part; and the damper is disposed at the connection part.

Abstract: The present embodiment relates to a lens driving device comprising: a housing; a bobbin disposed inside the housing; a coil disposed at the bobbin; a magnet disposed in the housing and facing the coil; an elastic member coupled to the housing and the bobbin; and a damper disposed at the elastic member, wherein the elastic member comprises an outer part coupled to the housing, an inner part coupled to the bobbin, and a connection part for connecting the outer part and the inner part; and the damper is disposed at the connection part.

Abstract: Disclosed are a smart mask which performs various sensing of a breathing characteristic, etc. and a smart mask-based service system which implements a service through a communication network by using a smart mask. The smart mask includes a differential pressure unit configured to provide a differential pressure signal corresponding to a difference between an atmospheric pressure and an internal pressure; a characteristic extraction unit configured to extract breathing characteristic information, representing a breathing characteristic, from the differential pressure signal; an electric fan configured to be driven for intake; a communication module configured to perform communication with an outside; and a control unit configured to drive the electric fan and transmit the breathing characteristic information to the outside through the communication module.

Abstract: The present disclosure relates to a culturing patch, culturing method, culture test method, culture test device, drug test method, and drug test device, and the culturing patch according to an aspect of the present disclosure includes component required for growth of an object to be cultured, and a mesh structural body provided in a mesh structure forming micro-cavities in which the component required for growth are contained that is configured to come into contact with a reaction region in which the object to be cultured is placed and provide some of the contained component required for growth to the reaction region.

Abstract: Embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, a process for preparing the same, and a process for preparing a semiconductor device using the same. According to the embodiments, it is possible to provide a polishing pad in which the average diameter of the plurality of pores contained in the polishing pad, the sphericity of the plurality of pores, and the volume ratio thereof are adjusted, thereby enhancing the polishing speed and reducing surface such defects as scratches and chatter marks appearing on the surface of a semiconductor substrate.

Abstract: The present disclosure provides a display device configured to float a display electrode coupled to a touch sensor by a parasitic capacitance when a downlink signal is received from a touch pen to the touch sensor.

Abstract: A method for processing contents at an electronic device is provided. The method includes generating a first content corresponding to a user input applied to content via the electronic device, and displaying a floating user interface (UI), which displays first scrap information on the first content, on a screen of the electronic device.

Abstract: The present invention relates to a composition for surface modification. The composition for surface modification according to the present invention contains a particular carbodiimide-based compound, thus forms a covalent bond without damaging skin, hair, or fabric, and semipermanently provides desired skin or hair surface modification effects or fabric care effects.

Abstract: The present invention relates to a composition for surface modification. The composition for surface modification according to the present invention contains a particular carbodiimide-based compound, thus forms a covalent bond without damaging skin, hair, or fabric, and semipermanently provides desired skin or hair surface modification effects or fabric care effects.

Abstract: The present disclosure provides a smear plate, a smear method, and a smear device. According to an embodiment of the present disclosure, the smear plate is for smearing a biological sample on an external substrate, the smear plate including: a body having a plate shape with a length, a width, and a pair of main surfaces, the body having a predetermined angle with respect to the external substrate; a support portion located on a side of the body and spaced apart from the external substrate by a predetermined distance; and a contact portion located on an opposite side of the body and including a pattern surface which is recessed inward of the body to induce fine particles included in the biological sample to move toward a midpoint in a width direction of the body for preventing the fine particles from being relatively densely distributed in outer regions in a width direction of the external substrate.