Abstract: A lithium borosilicate composition, consisting essentially of a system of lithium oxide in combination with silicon oxide and boron oxide, wherein said lithium borosilicate comprises between 70-83 atomic % lithium based on the combined atomic percentages of lithium, boron and silicon, and wherein said lithium borosilicate is a glass, is disclosed.

Abstract: A vapour deposition method for preparing an amorphous lithium-containing oxide or oxynitride compound not containing phosphorous comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, a source of nitrogen in the case of an oxynitride compound, and a source or sources of one or more glass-forming elements; heating a substrate to substantially 180° C. or above; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the amorphous compound.

Abstract: A vapor deposition method for preparing a multi-layered thin film structure comprises providing a vapor source of each component element of a compound intended for a first layer and a compound intended for a second layer, wherein the vapor sources comprise at least a source of lithium, a source of oxygen, a source or sources of one or more glass-forming elements, and a source or sources of one or more transition metals; heating a substrate to a first temperature; co-depositing component elements from at least the vapor sources of lithium, oxygen and the one or more transition metals onto the heated substrate wherein the component elements react on the substrate to form a layer of a crystalline lithium-containing transition metal oxide compound; heating the substrate to a second temperature within a temperature range of substantially 170° C.

Abstract: A lithium borosilicate composition, consisting essentially of a system of lithium oxide in combination with silicon oxide and boron oxide, wherein said lithium borosilicate comprises between 70-83 atomic % lithium based on the combined atomic percentages of lithium, boron and silicon, and wherein said lithium borosilicate is a glass, is disclosed.

Abstract: A vapour deposition method for preparing a crystalline lithium-containing transition metal oxide compound comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, and a source or sources of one or more transition metals; heating a substrate to between substantially 150° C. and substantially 450° C.; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the crystalline compound.

Abstract: A vapour deposition method for preparing an amorphous lithium-containing oxide or oxynitride compound not containing phosphorous comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, a source of nitrogen in the case of an oxynitride compound, and a source or sources of one or more glass-forming elements; heating a substrate to substantially 180° C. or above; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the amorphous compound.

Abstract: A vapour deposition method for preparing a multi-layered thin film structure comprises providing a vapour source of each component element of a compound intended for a first layer and a compound intended for a second layer, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source or sources of one or more glass-forming elements, and a source or sources of one or more transition metals; heating a substrate to a first temperature; co-depositing component elements from at least the vapour sources of lithium, oxygen and the one or more transition metals onto the heated substrate wherein the component elements react on the substrate to form a layer of a crystalline lithium-containing transition metal oxide compound; heating the substrate to a second temperature within a temperature range of substantially 170° C.