Patents by Inventor Laura S. Casas

Laura S. Casas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITE ARRAYS UTILIZING MICROSPHERES WITH A HYBRIDIZATION CHAMBER
    Publication number: 20170144126
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: November 17, 2016
    Publication date: May 25, 2017
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G, Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • Array kits and processing systems
    Patent number: 8628952
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: January 14, 2014
    Assignee: Illumina, Inc.
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • Methods of making arrays
    Patent number: 7901897
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: March 8, 2011
    Assignee: Illumina, Inc.
    Inventors: John R Stuelpnagel, Mark S Chee, Steven R Auger, Gan G Wang, Laura S Casas, Shawn Christopher Baker, Robert C Kain
  • COMPOSITE ARRAYS UTILIZING MICROSPHERES WITH A HYBRIDIZATION CHAMBER
    Publication number: 20090298716
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: April 6, 2009
    Publication date: December 3, 2009
    Applicant: Illumina, Inc.
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • ARRAY SYSTEMS AND COMPONENTS
    Publication number: 20090227472
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: March 16, 2009
    Publication date: September 10, 2009
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • METHODS OF MAKING ARRAYS
    Publication number: 20090221450
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: March 16, 2009
    Publication date: September 3, 2009
    Inventors: John R Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • ARRAY KITS AND PROCESSING SYSTEMS
    Publication number: 20090215649
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: March 16, 2009
    Publication date: August 27, 2009
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • Composite arrays utilizing microspheres with a hybridization chamber
    Publication number: 20040185482
    Abstract: The invention relates to sensor compositions comprising a composite array of individual arrays, to allow for simultaneous processing of a number of samples. The invention further provides methods of making and using the composite arrays. The invention further provides a hybridization chamber for use with a composite array.
    Type: Application
    Filed: January 28, 2004
    Publication date: September 23, 2004
    Applicant: Illumina, Inc.
    Inventors: John R. Stuelpnagel, Mark S. Chee, Steven R. Auger, Gan G. Wang, Laura S. Casas, Shawn Christopher Baker, Robert C. Kain
  • Lithography laser system with in-place alignment tool
    Patent number: 6704340
    Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with optical components adjustable from outside of the enclosure without the need to open it. Targets and beam directors are included within the beam path enclosure and are used to judge the quality of alignment. These target and beam directors are located on a moveable mount which is insertable in the beam path for alignment and are removed out of the beam path for normal operation. The positions of the targets and beam directors are controlled from outside the beam path enclosure. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.
    Type: Grant
    Filed: September 25, 2002
    Date of Patent: March 9, 2004
    Assignee: Cymer, Inc.
    Inventors: Alexander I. Ershov, William N. Partlo, Palash P. Das, Laura S. Casas, Daniel J. W. Brown
  • Lithography laser system with in-place alignment tool
    Publication number: 20030091087
    Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with optical components adjustable from outside of the enclosure without the need to open it. Targets and beam directors are included within the beam path enclosure and are used to judge the quality of alignment. These target and beam directors are located on a moveable mount which is insertable in the beam path for alignment and are removed out of the beam path for normal operation. The positions of the targets and beam directors are controlled from outside the beam path enclosure. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.
    Type: Application
    Filed: September 25, 2002
    Publication date: May 15, 2003
    Inventors: Alexander I. Ershov, William N. Partlo, Palash P. Das, Laura S. Casas, Daniel J.W. Brown