Patents by Inventor Laurentius Cornelius De Winter
Laurentius Cornelius De Winter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230305407Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.Type: ApplicationFiled: July 6, 2021Publication date: September 28, 2023Applicant: ASML Netherlands B.V.Inventors: Fei LIU, Jin LIAN, Zhuangxiong HUANG, Laurentius Cornelius DE WINTER, Frank STAALS
-
Patent number: 11314174Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.Type: GrantFiled: August 3, 2018Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Laurentius Cornelius De Winter, Roland Pieter Stolk, Frank Staals, Anton Bernhard Van Oosten, Paul Christiaan Hinnen, Marinus Jochemsen, Thomas Theeuwes, Eelco Van Setten
-
Publication number: 20210382209Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.Type: ApplicationFiled: September 13, 2019Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Marcus Adrianus VAN DE KERKHOF, Pieter-Jan VAN ZWOL, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Alexey Olegovich POLYAKOV
-
Patent number: 10928735Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.Type: GrantFiled: November 27, 2019Date of Patent: February 23, 2021Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Laurentius Cornelius De Winter, Eelco Van Setten
-
Publication number: 20200264522Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.Type: ApplicationFiled: August 3, 2018Publication date: August 20, 2020Applicant: ASML Netherlands B.V.Inventors: Laurentius Cornelius DE WINTER, Roland Pieter STOLK, Frank STAALS, Anton Bernhard VAN OOSTEN, Paul Christiaan HINNEN, Marinus JOCHEMSEN, Thomas THEEUWES, Eelco VAN SETTEN
-
Patent number: 10732498Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.Type: GrantFiled: July 3, 2019Date of Patent: August 4, 2020Assignee: ASML Netherlands B.V.Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
-
Publication number: 20190324365Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.Type: ApplicationFiled: July 3, 2019Publication date: October 24, 2019Applicant: ASML Netherlands B.V.Inventors: Pieter Cristiaan DE GROOT, Gerard Frans Jozef SCHASFOORT, Maksym Yuriiovych SLADKOV, Manfred Petrus Johannes M DIKKERS, Jozef Maria FINDERS, Pieter-Jan VAN ZWOL, Johannes Jacobus Matheus BASELMANS, Stefan Michael Bruno BAUMER, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF, Robbert Jan VOOGD
-
Patent number: 10401723Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.Type: GrantFiled: May 30, 2017Date of Patent: September 3, 2019Assignee: ASML Netherlands B.V.Inventors: Pieter Cristiaan De Groot, Gerard Frans Jozef Schasfoort, Maksym Yuriiovych Sladkov, Manfred Petrus Johannes Maria Dikkers, Jozef Maria Finders, Pieter-Jan Van Zwol, Johannes Jacobus Matheus Baselmans, Stefan Michael Bruno Baumer, Laurentius Cornelius De Winter, Wouter Joep Engelen, Marcus Adrianus Van De Kerkhof, Robbert Jan Voogd
-
Patent number: 10331042Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featurType: GrantFiled: September 21, 2016Date of Patent: June 25, 2019Assignee: ASML Netherlands B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
-
Publication number: 20190137861Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.Type: ApplicationFiled: May 30, 2017Publication date: May 9, 2019Applicant: ASML Netherlands B.V.Inventors: Pieter Cristiaan DE GROOT, Gerard Frans Jozef SCHASFOORT, Maksym Yuriiovych SLADKOV, Manfred Petrus Johannes Maria DIKKERS, Jozef Maria FINDERS, Pieter-Jan VAN ZWOL, Johannes Jacobus Matheus BASELMANS, Stefan Michael Bruno BAUMER, Laurentius Cornelius DE WINTER, Wouter Joep ENGELEN, Marcus Adrianus VAN DE KERKHOF, Robbert Jan VOOGD
-
Patent number: 10139725Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.Type: GrantFiled: March 4, 2014Date of Patent: November 27, 2018Assignee: ASML Netherlands B.V.Inventors: James Norman Wiley, Juan Diego Arias Espinoza, Derk Servatius Gertruda Brouns, Laurentius Cornelius De Winter, Florian Didier Albin Dhalluin, Pedro Julian Rizo Diago, Luigi Scaccabarozzi
-
Patent number: 9690210Abstract: A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.Type: GrantFiled: July 20, 2012Date of Patent: June 27, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Arno Jan Bleeker, Laurentius Cornelius De Winter
-
Publication number: 20170010542Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featurType: ApplicationFiled: September 21, 2016Publication date: January 12, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
-
Patent number: 9535341Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featurType: GrantFiled: November 13, 2009Date of Patent: January 3, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Laurentius Cornelius De Winter, Jozef Maria Finders
-
Patent number: 9280064Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: GrantFiled: November 26, 2012Date of Patent: March 8, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Peter David Engblom, Carsten Andreas Köhler, Frank Staals, Laurentius Cornelius De Winter
-
Publication number: 20160033860Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.Type: ApplicationFiled: March 4, 2014Publication date: February 4, 2016Applicant: ASML Netherlands B.V.Inventors: James Norman WILEY, Juan Diego ARIAS ESPINOZA, Derk Servatius Gertruda BROUNS, Laurentius Cornelius DE WINTER, Florian Didier Albin DHALLUIN, Pedro Julian RIZO DIAGO, Luigi SCACCABAROZZI
-
Patent number: 8780325Abstract: In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property. The determination of the desired phase change includes determining a desired configuration of a phase modulation element. The method further includes implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate, the implementation of the desired phase change comprising illuminating the phase modulation element with the portion of the radiation beam when the phase modulation element is in the desired configuration.Type: GrantFiled: December 11, 2009Date of Patent: July 15, 2014Assignee: ASML Netherlands B.V.Inventors: Luis Alberto Colina Santamaria, Jozef Maria Finders, Laurentius Cornelius De Winter
-
Publication number: 20140152969Abstract: A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.Type: ApplicationFiled: July 20, 2012Publication date: June 5, 2014Applicant: ASML, Netherland B.V.Inventors: Arno Jan Bleeker, Laurentius Cornelius De Winter
-
Patent number: 8717540Abstract: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.Type: GrantFiled: February 2, 2011Date of Patent: May 6, 2014Assignee: ASML Netherlands B.V.Inventors: Carsten Andreas Köhler, Hans Van Der Laan, Frank Staals, Laurentius Cornelius De Winter, Herman Philip Godfried
-
Publication number: 20130141706Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.Type: ApplicationFiled: November 26, 2012Publication date: June 6, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Peter David ENGBLOM, Carsten Andreas KÖHLER, Frank STAALS, Laurentius Cornelius DE WINTER