Patents by Inventor Layton Hale
Layton Hale has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11878185Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: GrantFiled: December 30, 2021Date of Patent: January 23, 2024Assignee: RefleXion Medical, Inc.Inventors: Eugene Duval, David Meer, Layton Hale, David Larkin
-
Publication number: 20220193451Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: ApplicationFiled: December 30, 2021Publication date: June 23, 2022Inventors: Eugene DUVAL, Layton HALE, David LARKIN
-
Patent number: 11343899Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.Type: GrantFiled: November 23, 2020Date of Patent: May 24, 2022Assignee: KLA CorporationInventors: Brian Ahr, Alexander Bykanov, Rudy F. Garcia, Layton Hale, Oleg Khodykin
-
Patent number: 11285340Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: GrantFiled: November 7, 2019Date of Patent: March 29, 2022Assignee: RefleXion Medical, Inc.Inventors: David Larkin, William Knapp, Layton Hale
-
Publication number: 20210105886Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.Type: ApplicationFiled: November 23, 2020Publication date: April 8, 2021Inventors: Brian Ahr, Alexander Bykanov, Rudy F. Garcia, Layton Hale, Oleg Khodykin
-
Patent number: 10880979Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.Type: GrantFiled: September 9, 2016Date of Patent: December 29, 2020Assignee: KLA CorporationInventors: Brian Ahr, Alexander Bykanov, Rudy F. Garcia, Layton Hale, Oleg Khodykin
-
Publication number: 20200164230Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: ApplicationFiled: November 7, 2019Publication date: May 28, 2020Inventors: David LARKIN, William KNAPP, Layton HALE
-
Patent number: 10500416Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: GrantFiled: June 10, 2016Date of Patent: December 10, 2019Assignee: RefleXion Medical, Inc.Inventors: David Larkin, William Knapp, Layton Hale, David Meer
-
Patent number: 9690213Abstract: A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.Type: GrantFiled: September 6, 2012Date of Patent: June 27, 2017Assignee: KLA-Tencor CorporationInventors: Upendra Ummethala, Layton Hale, Joshua Clyne, Samir Nayfeh, Mark Williams, Joseph A. Di Regolo, Andrew Wilson
-
Publication number: 20170131129Abstract: The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.Type: ApplicationFiled: September 9, 2016Publication date: May 11, 2017Inventors: Brian Ahr, Alexander Bykanov, Rudy F. Garcia, Layton Hale, Oleg Khodykin
-
Patent number: 9544984Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.Type: GrantFiled: July 18, 2014Date of Patent: January 10, 2017Assignee: KLA-Tencor CorporationInventors: Alexander Bykanov, Oleg Khodykin, Daniel C. Wack, Konstantin Tsigutkin, Layton Hale, Joseph Walsh, Frank Chilese, Rudy F. Garcia, Brian Ahr
-
Publication number: 20160361566Abstract: Described herein are multi-leaf collimators that comprise leaf drive mechanisms. The leaf drive mechanisms can be used in binary multi-leaf collimators used in emission-guided radiation therapy. One variation of a multi-leaf collimator comprises a pneumatics-based leaf drive mechanism. Another variation of a multi-leaf collimator comprises a spring-based leaf drive mechanism having a spring resonator.Type: ApplicationFiled: June 10, 2016Publication date: December 15, 2016Inventors: David LARKIN, William KNAPP, Eugene DUVAL, Layton HALE, David MEER, Matthew DIGGS
-
Patent number: 9298106Abstract: A wafer stage system with reciprocating wafer stage actuation control may include a wafer stage, a motor configured to actuate the wafer stage in a first and/or second direction along an axis, a first reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the first direction, the first reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the first direction, the first reciprocating mechanism configured to accelerate the wafer stage in the second direction, and a second reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the second direction, the second reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the second direction, the second reciprocating mechanism further configured to accelerate the wafer stage in the first direction.Type: GrantFiled: September 7, 2012Date of Patent: March 29, 2016Assignee: KLA-Tencor CorporationInventors: Upendra Ummethala, Marek Zywno, Layton Hale
-
Publication number: 20150076359Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.Type: ApplicationFiled: July 18, 2014Publication date: March 19, 2015Inventors: Alexander Bykanov, Oleg Khodykin, Daniel C. Wack, Konstantin Tsigutkin, Layton Hale, Joseph Walsh, Frank Chilese
-
Patent number: 8963110Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.Type: GrantFiled: June 19, 2014Date of Patent: February 24, 2015Assignee: KLA-Tencor CorporationInventors: Layton Hale, Francis Chilese, Qiang Q. Zhang
-
Publication number: 20140374611Abstract: The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.Type: ApplicationFiled: June 19, 2014Publication date: December 25, 2014Inventors: Layton Hale, Francis Chilese, Qiang Q. Zhang
-
Patent number: 8724115Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.Type: GrantFiled: June 10, 2013Date of Patent: May 13, 2014Assignee: KLA-Tencor CorporationInventors: Upendra Ummethala, Layton Hale, Josh Clyne, Samir Nayfeh, Mark Williams, Joseph A. DiRegolo, Andrew Wilson
-
Publication number: 20130342827Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.Type: ApplicationFiled: June 10, 2013Publication date: December 26, 2013Applicant: KLA-Tencor CorporationInventors: Upendra Ummethala, Layton Hale, Josh Clyne, Samir Nayfeh, Mark Williams, Joseph A. DiRegolo, Andrew Wilson
-
Publication number: 20130293865Abstract: A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis.Type: ApplicationFiled: September 6, 2012Publication date: November 7, 2013Applicant: KLA-TENCOR CORPORATIONInventors: Upendra Ummethala, Layton Hale, Joshua Clyne, Samir Nayfeh, Mark Williams, Joseph A. Di Regolo, Andrew Wilson