Publication number: 20170219935
Abstract: In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (600a, 600b, 600c, 600d, 600e, 600f), so that each of the alignment sensors (500a, 500b, 500c, 500d, 500e, 500f) is arranged on the same straight line as a respective one of the focusing sensors (600a, 600b, 600c, 600d, 600e, 600f). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.
Type:
Application
Filed:
July 13, 2015
Publication date:
August 3, 2017
Applicant:
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
Inventors:
Feibiao CHEN, Chang ZHOU, Yuefei CHEN, Qi CHENG, Lei DIAO, Jingchao QI