Abstract: An ultra high-speed DDP-SRAM (Dual Dual-Port Static Random Access Memory) cache having a cache speed in approximately the GHz range. This is accomplished by (1) a specially designed dual-port SRAM whose size is slightly larger than that of a conventional single port SRAM, and (2) the use of a dual dual-port SRAM architecture which doubles its speed by interleaved read and write operations. A first embodiment provides a 6-T (transistor) all nMOS dual-port SRAM cell. A second embodiment provides a dual port 7T-SRAM cell which has only one port for write, and both ports for read.

Abstract: A method and structure of forming a vertical polymer transistor structure is disclosed having a first conductive layer, filler structures co-planar with the first conductive layer, a semiconductor body layer above the first conductive layer, a second conductive layer above the semiconductor body layer, and an etch stop strip positioned between a portion of the first conductive layer and the semiconductor body layer.

Abstract: A vertical ferroelectric gate field-effect transistor (FeGFET) device comprises a substrate and a first drain/source electrode formed on an upper surface of the substrate. An electrically conductive channel region is formed on an upper surface of the first drain/source electrode and electrically contacting the first drain/source electrode. The FeGFET device further comprises a ferroelectric gate region formed on at least one side wall of the channel region, at least one gate electrode electrically contacting the ferroelectric gate region, and a second drain/source electrode formed on an upper surface of the channel region and electrically contacting the channel region. The ferroelectric gate region is selectively polarizable in response to a potential applied between the gate electrode and at least one of the first and second drain/source electrodes. A non-volatile memory array can be formed comprising a plurality of FeGFET devices.

Abstract: A digitally programmable DC voltage generator system having a programming circuit for controlling a control circuit of a voltage generator system. The programming circuit receives an input control signal, processes the input control signal, and generates an output control signal to the control circuit of the voltage generator system for controlling the control circuit in accordance with the input control signal. The control circuit includes a limiter circuit and an oscillator circuit. The output control signal controls at least one of the limiter circuit for disabling the oscillator circuit upon reaching a target output voltage, and the oscillator circuit for controlling the pumping speed of the oscillator circuit.

Abstract: Hierarchical built-in self-test methods and arrangement for verifying system functionality. As a result, an effective built-in self-test methodology is provided for conducting complete system-on-chip testing, to ensure both the circuit reliability and performance of system-on-chip design. As an added advantage, development costs are reduced for system-on-chip applications.

Abstract: A method and structure for a photodiode array comprising a plurality of photodiode cores, light sensing sidewalls along an exterior of the cores, logic circuitry above the cores, trenches separating the cores, and a transparent material in the trenches is disclosed. With the invention, the sidewalls are perpendicular to the surface of the photodiode that receives incident light. The light sensing sidewalls comprise a junction region that causes electron transfer when struck with light. The sidewalls comprise four vertical sidewalls around each island core. The logic circuitry blocks light from the core so light is primarily only sensed by the sidewalls.

Abstract: An improved non-volatile memory array comprises a plurality of memory cells, at least one of the memory cells comprising a three-terminal non-volatile storage element for storing a logical state of the at least one memory cell. The memory array further comprises a plurality of write lines operatively coupled to the memory cells for selectively writing the logical state of one or more memory cells in the memory array, and a plurality of bit lines and word lines operatively coupled to the memory cells for selectively reading and writing the logical state of one or more memory cells in the memory array. The memory array is advantageously configured so as to eliminate the need for a pass gate being operatively coupled to a corresponding non-volatile storage element in the at least one memory cell.

Abstract: A vertical ferroelectric gate field-effect transistor (FeGFET) device comprises a substrate and a first drain/source electrode formed on an upper surface of the substrate. An electrically conductive channel region is formed on an upper surface of the first drain/source electrode and electrically contacting the first drain/source electrode. The FeGFET device further comprises a ferroelectric gate region formed on at least one side wall of the channel region, at least one gate electrode electrically contacting the ferroelectric gate region, and a second drain/source electrode formed on an upper surface of the channel region and electrically contacting the channel region. The ferroelectric gate region is selectively polarizable in response to a potential applied between the gate electrode and at least one of the first and second drain/source electrodes. A non-volatile memory array can be formed comprising a plurality of FeGFET devices.

Abstract: A memory system having a plurality of T-RAM cells arranged in an array is presented where each T-RAM cell has dual vertical devices and is fabricated over a SiC substrate. Each T-RAM cell has a vertical thyristor and a vertical transfer gate. The top surface of each thyristor is coplanar with the top surface of each transfer gate within the T-RAM array to provide a planar cell structure for the T-RAM array. A method is also presented for fabricating the T-RAM array having the vertical thyristors, the vertical transfer gates and the planar cell structure over the SiC substrate.

Abstract: A method and apparatus for refreshing data in a dynamic random access memory (DRAM) cache memory in a computer system are provided to perform a data refresh operation without refresh penalty (e.g., delay in a processor). A data refresh operation is performed with respect to a DRAM cache memory by detecting a request address from a processor, stopping a normal refresh operation when the request address is detected, comparing the request address with TAG addresses stored in a TAG memory, generating refresh addresses to refresh data stored in the cache memory, each of which is generated based on an age of data corresponding to the refresh address, and performing a read/write operation on a wordline accessed by the request addresses and refreshing data on wordlines accessed by the refresh addresses, wherein the read/write operation and the refreshing of data are performed simultaneously.

Abstract: A semiconductor device is presented which includes a self-aligned, planarized thin-film transistor which can be used in various integrated circuit devices, such as static random access memory (SRAM) cells. The semiconductor device has a first field-effect transistor and a second field-effect transistor. The second field-effect transistor overlies the first field-effect transistor, and the first field-effect transistor and the second field-effect transistor share a common gate. The second field-effect transistor includes a source and a drain which are self-aligned to the shared gate in a layer of planarized semiconductor material above the first field-effect transistor. In one embodiment, the second field-effect transistor is a thin-film transistor, and the shared gate has a U-shape wrap-around configuration at a body of the thin-film transistor.

Abstract: A compact SRAM cell that incorporates refractory metal-silicon-nitrogen resistive elements as its pull-up transistors is described which includes a semi-conducting substrate, a pair of NMOS transfer devices formed vertically on the sidewalls of an etched substrate by a metal conductor providing electrical communication between an n+ region in the substrate and a bitline on top, a pair of pull-down nMOS devices on the substrate connected to ground interconnects, and a pair of vertical high-resistive elements formed of a refractory metal-silicon-nitrogen and function as a load for connecting to Vdd. The invention further describes a method for fabricating such compact SRAM cell.

Abstract: A method for fabricating DRAM and flash memory cells on a single chip includes providing a silicon substrate, forming a trench capacitor for each of the DRAM cells in the silicon substrate, forming isolation regions in the silicon substrate which are electrically isolated from each other, forming first type wells for DRAM and flash memory cells at first predetermined regions of the silicon substrate by implanting a first type impurity in the first predetermined regions, forming second type wells for DRAM and flash memory cells at second predetermined regions in the first type wells by implanting a second type impurity in the second predetermined regions, forming oxide layers for DRAM and flash memory cells on the second type wells, forming gate electrodes for DRAM and flash memory cells on the oxide layers for DRAM and flash memory cells, and forming source and drain regions for DRAM and flash memory cells in the respective second type wells for DRAM and flash memory cells, in which the source and drain regio

Abstract: A method and structure of forming a vertical polymer transistor structure is disclosed having a first conductive layer, filler structures co-planar with the first conductive layer, a semiconductor body layer above the first conductive layer, a second conductive layer above the semiconductor body layer, and an etch stop strip positioned between a portion of the first conductive layer and the semiconductor body layer.

Abstract: An electronically programmable mask for lithography comprises an array of individually controllable light sources aligned with an array of individually controllable liquid crystals, so that individual pixels may be turned on or off and phase-shifted to provide a desired light intensity distribution on a wafer. The mask may be used in a contact printing mode or in a reduction projection mode.

Abstract: A structure and method of forming a fully planarized polymer thin-film transistor by using a first planar carrier to process a first portion of the device including gate, source, drain and body elements. Preferably, the thin-film transistor is made with all organic materials. The gate dielectric can be a high-k polymer to boost the device performance. Then, the partially-finished device structures are flipped upside-down and transferred to a second planar carrier. A layer of wax or photo-sensitive organic material is then applied, and can be used as the temporary glue. The device, including its body area, is then defined by an etching process. Contacts to the devices are formed by conductive material deposition and chemical-mechanical polish.

Abstract: A content addressable memory (CAM). A data portion of the CAM array includes word data storage. Each word line includes CAM cells (dynamic or static) in the data portion and a common word match line. An error correction (e.g., parity) portion of the CAM array contains error correction cells for each word line. Error correction cells at each word line are connected to an error correction match line. A match on an error correction match line enables precharging a corresponding data match line. Only data on word lines with a corresponding match on an error correction match line are included in a data compare. Precharge power is required only for a fraction (inversely exponentially proportional to the bit length of error correction employed) of the full array.

Abstract: A semiconductor device is presented which includes a self-aligned, planarized thin-film transistor which can be used in various integrated circuit devices, such as static random access memory (SRAM) cells. The semiconductor device has a first field-effect transistor and a second field-effect transistor. The second field-effect transistor overlies the first field-effect transistor, and the first field-effect transistor and the second field-effect transistor share a common gate. The second field-effect transistor includes a source and a drain which are self-aligned to the shared gate in a layer of planarized seminconductor material above the first field-effect transistor. In one embodiment, the second field-effect transistor is a thin-film transistor, and the shared gate has a U-shape wrap-around configuration at a body of the thin-film transistor.

Abstract: A method of forming a semiconductor device, includes forming at least one conductive island having a predetermined sidewall angle in a conductive substrate, forming a dielectric material over the at least one island, forming a conductive material over the dielectric material, and forming a contact to the conductive material and the at least one island.

Abstract: A testing circuit in a serialization and deserialization (SerDes) core having a plurality of transmitter links and receiver links is provided for testing a series of at least three alternating transmitter and receiver links. The testing circuit includes a built-in-self-test (BIST) macro for generating test data and transmitting the test data to a first link of the series of transmitter and receiver links, and for receiving processed test data from a last link of the series of transmitter receiver links; and at least one test transmission line for transmitting test data received by a link of the series of transmitter and receiver links to a next link of the series of transmitter and receiver links, wherein the at least one test transmission line connects the at least three transmitter receiver links. Furthermore, a method is provided for testing a series of links having at least three alternating transmitter and receiver links of a plurality of transmitter and receiver links in a SerDes core.