Abstract: A fingerprint recognition sensor includes a plurality of fingerprint recognition units arranged in an array. Each of the fingerprint recognition units includes a base substrate, an image capturing device disposed on one side of the substrate, and a first grating structure and a second grating structure sequentially disposed on the other side of the base substrate, the first grating structure has a first imaging hole at a position opposite to the image capturing device and the second grating structure has a second imaging hole at a position opposite to the image capturing device, and an extending direction of a slit of the first grating structure is perpendicular to an extending direction of a slit of the second grating structure.

Abstract: A display substrate, a manufacturing method thereof, and a display device are provided, in the field of display technology. The display substrate includes a base substrate, and a thin-film transistor, a light-emitting device, an encapsulation structure, and a conductive film layer sequentially disposed on the base substrate in a direction away from the base substrate. Since the display substrate includes a conductive film layer on a side of the encapsulation structure away from the base substrate, when the protective film layer on the side of the conductive film layer away from the base substrate is peeled off, static electricity generated by the separation of the film layer can be released to the conductive film layer, avoiding electron transition to the active layer of the thin-film transistor in the display substrate to cause offset of the threshold voltage of the thin-film transistor. The display brightness uniformity of the display substrate can be ensured.

Abstract: Embodiments of the present invention provide a substrate and a fabrication method thereof, and a display device. The substrate includes a base and a pixel defining layer in which a plurality of openings are formed, the pixel defining layer includes a first defining layer, a second defining layer and a third defining layer sequentially stacked on the base, wherein, the second defining layer is configured as a conductive layer, and an orthogonal projection of the second defining layer on the base is at least partially located outside an orthogonal projection of a side of the third defining layer close to the base on the base.

Abstract: A pixel structure, a display substrate, a display device and a display method are provided. The pixel structure includes multiple pixel units. Each pixel unit includes one rhombus sub-pixel and four congruent regular hexagon sub-pixels. The four congruent regular hexagon sub-pixels are arranged around the rhombus sub-pixel.

Abstract: Embodiments of the present disclosure provide a display panel and a display device. The display panel includes an array substrate, a color filter substrate opposite to the array substrate and assembled with the array substrate, and a liquid crystal layer between the array substrate and the color filter substrate. The array substrate includes: a base; and a data line, a gate line, and at least one electrode layer on the base. A protrusion is provided on a side of the array substrate adjacent to the color filter substrate, and the protrusion has a thickness smaller than a distance between the array substrate and the color filter substrate, and an orthographic projection of the protrusion on the base covers an orthographic projection of the data line or the gate line on the base.

Abstract: The present invention provides a method for manufacturing an array substrate, including; a step of providing a substrate; a step of making an electrode layer on the substrate; and a step of making a spacer layer and a spacer column on the electrode layer; wherein the spacer column is made by heat-treatment while the spacer layer is being formed, and a method for manufacturing an array substrate. The method for manufacturing an array substrate provided by the present invention can not only shorten the production cycle, lower the production cost, but also avoid the threshold voltage drift of the TFT due to the irradiation of a large area of ultraviolet rays.

Abstract: The present disclosure provides in some embodiments a method for manufacturing an OLED display substrate, including a step of forming a PS on a substrate with an anode and a step of forming a pattern of a pixel definition layer. The step of forming the PS is performed no later than the step of forming the pattern of the pixel definition layer. According to the present disclosure, the PS is able to be formed prior to the formation of the pattern of the pixel definition layer, or the PS and the pattern of the pixel definition layer are formed simultaneously through one single patterning process.

Abstract: A method of manufacturing an array substrate includes: providing a base substrate; forming a pixel defining layer including a plurality of barrier walls on one side of the base substrate; and modifying a surface to be modified of each of at least one barrier wall of the plurality of barrier walls, so that a surface of a corresponding one of the at least one barrier wall used for forming a pixel region includes a lyophilic surface and a lyophobic surface.

Abstract: Embodiments of the present invention provide a substrate and a fabrication method thereof, and a display device. The substrate includes a base and a pixel defining layer in which a plurality of openings are formed, the pixel defining layer includes a first defining layer, a second defining layer and a third defining layer sequentially stacked on the base, wherein, the second defining layer is configured as a conductive layer, and an orthogonal projection of the second defining layer on the base is at least partially located outside an orthogonal projection of a side of the third defining layer close to the base on the base.

Abstract: The present disclosure provides an OLED substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, and belongs to the technical field of display technology. A manufacturing method for an OLED substrate of the present disclosure includes: forming, by a patterning process, a pattern including first electrodes of OLED devices and a pixel defining layer provided above the first electrodes above the base substrate, wherein the pixel defining layer includes a plurality of pixel partition walls spaced apart from each other, each of the pixel partition walls defines one of the first electrodes.

Abstract: The present disclosure discloses a method for fabricating a display substrate, belonging to the technical field of displaying. The method includes: providing a base substrate having an array of Thin Film Transistors; forming a photoresist pattern on the base substrate, the photoresist pattern including a hollow region for forming a spacer pattern; forming a spacer material in the hollow region; and peeling the photoresist pattern so that the spacer material in the hollow region forms the spacer pattern.

Abstract: Embodiments of the present disclosure provide a flexible display panel, a method of manufacturing the flexible display panel, and a flexible display apparatus. The flexible display panel comprises: a reinforced insulating layer of an inorganic material, wherein the reinforced insulating layer comprises a reinforced region, and is formed with a reinforcing hole in the reinforced region; an organic material filled in the reinforcing hole; and at least one insulating film which is disposed on at least one of both sides of the reinforced insulating layer and which is in contact with the reinforced insulating layer at least in the reinforced region.

Abstract: An OLED display panel and a method for manufacturing the same are provided. By successively forming a first organic film layer, a metal film layer, and a second organic film layer on a substrate layer, a width of the metal film layer is greater than a width of the first organic film layer in a peripheral region of the OLED display panel, to form an inverted trapezoid-shaped bottom-cut structure. An included angle between an edge of the first organic film layer and the metal film layer is relatively large, and if an inorganic film layer is further formed subsequently, the inorganic film layer may have a relatively small thickness at this position, which makes it easier for a crack to occur and a fracture to appear, as such, when cutting is performed using a laser, splitting of the inorganic film layer will be terminated at this position.

Abstract: A fingerprint recognition sensor includes a plurality of fingerprint recognition units arranged in an array. Each of the fingerprint recognition units includes a base substrate, an image capturing device disposed on one side of the substrate, and a first grating structure and a second grating structure sequentially disposed on the other side of the base substrate, the first grating structure has a first imaging hole at a position opposite to the image capturing device and the second grating structure has a second imaging hole at a position opposite to the image capturing device, and an extending direction of a slit of the first grating structure is perpendicular to an extending direction of a slit of the second grating structure.

Abstract: The present disclosure provides a method for manufacturing an OLED display substrate, including a step of forming a pattern of a pixel definition layer on a substrate through a patterning process. A bottom wall of the pixel definition layer is formed on the substrate, a top wall of the pixel definition layer is arranged parallel to the bottom wall, and a side wall of the pixel definition layer is angled relative to the top wall at an acute angle.

Abstract: The present disclosure discloses a method for fabricating a display substrate, belonging to the technical field of displaying. The method includes: providing a base substrate having an array of Thin Film Transistors; forming a photoresist pattern on the base substrate, the photoresist pattern including a hollow region for forming a spacer pattern; forming a spacer material in the hollow region; and peeling the photoresist pattern so that the spacer material in the hollow region forms the spacer pattern.

Abstract: The present disclosure provides in some embodiments a method for manufacturing an OLED display substrate, including a step of forming a PS on a substrate with an anode and a step of forming a pattern of a pixel definition layer. The step of forming the PS is performed no later than the step of forming the pattern of the pixel definition layer. According to the present disclosure, the PS is able to be formed prior to the formation of the pattern of the pixel definition layer, or the PS and the pattern of the pixel definition layer are formed simultaneously through one single patterning process.

Abstract: The present invention provides a method for manufacturing an array substrate, including; a step of providing a substrate; a step of making an electrode layer on the substrate; and a step of making a spacer layer and a spacer column on the electrode layer; wherein the spacer column is made by heat-treatment while the spacer layer is being formed, and a method for manufacturing an array substrate. The method for manufacturing an array substrate provided by the present invention can not only shorten the production cycle, lower the production cost, but also avoid the threshold voltage drift of the TFT due to the irradiation of a large area of ultraviolet rays.

Abstract: Embodiments of the present disclosure provide a reflective array substrate, a manufacturing method thereof, and a display device. The reflective array substrate includes a support substrate, an array structure layer and a light reflection layer, wherein the array structure layer is arranged on a first surface of the support substrate, the light reflection layer is arranged on a second surface of the support substrate, and the first surface and the second surface face away from each other.

Abstract: Graphitic nanotubes, which include tubular fullerenes (commonly called “buckytubes”) and fibrils, which are functionalized by chemical substitution, are used as solid supports in electrogenerated chemiluminescence assays. The graphitic nanotubes are chemically modified with functional group biomolecules prior to use in an assay. Association of electrochemiluminescent ruthenium complexes with the functional group biomolecule-modified nanotubes permits detection of molecules including nucleic acids, antigens, enzymes, and enzyme substrates by multiple formats.