Abstract: The invention relates to an emission control system for removing environmentally harmful and/or toxic gases or vapors, comprising a reaction chamber which is connected to a plasma source, whereby plasma is formed in said reaction chamber by injecting excitation energy, and the reaction chamber and/or the plasma source has at least one inlet for the introduction of gases or vapors and one outlet for the gases or vapors which are treated in the plasma source and/or reaction chamber. According to the invention, the outlet of the reaction chamber is connected to a liquid jet pump which produces a low pressure in the reaction chamber and in the plasma source. The waste gases with the plasma or the waste gases which are treated by excited particles are jointly conducted along with the liquid which is circulated through the liquid jet pump, mixed therewith and discharged from said reaction chamber.

Abstract: The present invention relates to a method for purifying process waste gases by introducing them into a waste gas purification system that includes a reaction chamber and by post-treating the reaction products that leave the reaction chamber in a washing or sorbtion chamber with an associated washing agent circuit. The type and amount of harmful substances in the process waste gas are continuously measured before the waste gases enter the waste gas purification system. In addition, the type and amount of harmful substances in the reaction products that leave the waste gas purification system are simultaneously determined directly at the exit of the system and the measuring signals are used to regulate the operating parameters of the waste gas purification system.

Abstract: The present invention relates to a method for purifying process waste gases by introducing them into a waste gas purification system that includes a reaction chamber and by post-treating the reaction products that leave the reaction chamber in a washing or sorbtion chamber with an associated washing agent circuit. The type and amount of harmful substances in the process waste gas are continuously measured before the waste gases enter the waste gas purification system. In addition, the type and amount of harmful substances in the reaction products that leave the waste gas purification system are simultaneously determined directly at the exit of the system and the measuring signals are used to regulate the operating parameters of the waste gas purification system.

Abstract: An apparatus for purifying waste gases, particularly waste gases from CVD (chemical vapor deposition), plasma etching or similar processes, with at least one combustion space, which is in a vertical arrangement within an outer pipe and is limited at the top by an umbrella-like cover, and an internally or externally mixing burner, the combustion gas nozzles of which protrude into the combustion space, combustion gas, oxygen or air and waste gas being supplied to the burner, as well as to means for supplying and discharging oxidizing agents and/or absorbents to a scrubbing space above the combustion space. By means of the invention, an apparatus is to be provided for purifying waste gases, which can be manufactured cost-effectively and by means of which the disadvantages of the state of the art are avoided.

Abstract: A method for cleaning reactors for the gas-phase processing of workpieces, particularly in the field of semiconductor technology and more particularly in the field of coating semiconductor substrates by means of chemical deposition processes, with less effort entails providing the reactor with a gas permeable inner wall within the usual gas impermeable outer wall, the inner wall surrounding a chamber for coating a workpiece by means of a chemical deposition process, plenums being formed between the inner and outer walls, and further with conduit means communicating between the exterior of the reactor and the plenums and conduit means communicating between the exterior of the reactor and the inner chamber, and effecting a cleaning cycle in which an etching gas is conducted through the inner chamber by being introduced into the reactor through one of the aforementioned conduit means and withdrawn from the reactor through another of the aforementioned conduit means.

Abstract: An apparatus for the gas-phase processing of disk-shaped workpieces serves for maintaining cleanliness of the processing space and the workpiece or for avoiding deposits on parts of the workpiece which are not inteded to be coated. In particular a second inner wall system, which is permeable to gas, is provided for the aforementioned purposes. This second inner wall system is associated with a flushing gas system.