Patents by Inventor Makoto Akita
Makoto Akita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240100799Abstract: A printing device, a printing machine, and a box making machine are provided with printing cylinders on which printing plates can be mounted, ink supply rolls that are placed on the upstream or downstream sides of the printing cylinders in a sheet-conveying direction and that can be in contact with the printing cylinders, ink supply units that can supply ink to the ink supply rolls, first covers that cover the upper parts of the printing cylinders in the vertical direction and that can be opened and closed, and footholds that cover the vertically upper parts of the ink supply rolls and that can be operated by an operator.Type: ApplicationFiled: October 28, 2021Publication date: March 28, 2024Inventors: Mitsuhiro NADACHI, Kazuya AKITA, Makoto SHIMOHATSUBO
-
Patent number: 9946157Abstract: A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.Type: GrantFiled: March 30, 2016Date of Patent: April 17, 2018Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Maki Kawamura, Makoto Akita
-
Publication number: 20160291464Abstract: A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.Type: ApplicationFiled: March 30, 2016Publication date: October 6, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Maki KAWAMURA, Makoto AKITA
-
Patent number: 8808960Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.Type: GrantFiled: March 8, 2010Date of Patent: August 19, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
-
Patent number: 7972763Abstract: The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.Type: GrantFiled: November 13, 2007Date of Patent: July 5, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Masumi Suetsugu, Makoto Akita, Kazuhiko Hashimoto
-
Patent number: 7893293Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc.Type: GrantFiled: June 20, 2008Date of Patent: February 22, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
-
Patent number: 7861908Abstract: A component mounting apparatus includes a component feeder that feeds a component with its bump electrodes facing down, a mounting head that mounts the component onto a substrate, a supporting base that secures the substrate, and a positioning device that aligns the component with the substrate. The mounting head includes an ultrasonic vibration generator, an ultrasonic vibration propagation member that conveys the ultrasonic vibration provided by the ultrasonic vibration generator to a working face holding the component as vibration parallel thereto, a pressure loader that applies a pressure load to the working face from a position immediately thereabove in the direction perpendicular thereto, and a heater that heats the vicinity of the working face. Thereby, ultrasonic bonding is carried out with high reliability even if the component has a number of bump electrodes on its face.Type: GrantFiled: March 30, 2007Date of Patent: January 4, 2011Assignee: Panasonic CorporationInventors: Shozo Minamitani, Takaharu Mae, Yasuharu Ueno, Akira Yamada, Shinji Kanayama, Makoto Akita, Nobuhisa Watanabe, Akira Mori, Hiroyuki Naito, Shinya Marumo, Makoto Morikawa
-
Publication number: 20100233628Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.Type: ApplicationFiled: March 8, 2010Publication date: September 16, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Makoto AKITA, Isao Yoshida, Kazuhiko Hashimoto
-
Patent number: 7794913Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.Type: GrantFiled: May 15, 2008Date of Patent: September 14, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Masumi Suetsugu, Kazuhiko Hashimoto
-
Patent number: 7759045Abstract: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+?O3S—R??(I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.Type: GrantFiled: June 24, 2008Date of Patent: July 20, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Makoto Akita, Isao Yoshida, Yukako Harada
-
Publication number: 20100074738Abstract: A blower (1) has a blow fan (20) provided in a casing (10), a drive device (30) for rotating the blow fan (20), and a blow duct (40) for discharging airflow outside, which the air flow is generated by the rotating blow fan (20), wherein a dust proof cover (60) is attached to a suction inlet (11) formed in the casing (10), and openings (64a, 65a) for drawing outside air are formed in the left and right side faces (64, 65) of the dust proof cover (60), and the left and right side faces (64, 65) are inclined inward in the right-and-left width direction as they extend downward. According to such a configuration, the openings (64a, 65a) of the dust proof cover (60) are prevented from being clogged with dust such as dead leaves to prevent overheating of the drive device (30).Type: ApplicationFiled: September 7, 2007Publication date: March 25, 2010Applicant: SHINDAIWA CORPORATIONInventors: Toshinobu Yoshizaki, Makoto Akita
-
Publication number: 20090004601Abstract: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+?O3S—R??(I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.Type: ApplicationFiled: June 24, 2008Publication date: January 1, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Makoto Akita, Isao Yoshida, Yukako Harada
-
Publication number: 20090004600Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc.Type: ApplicationFiled: June 20, 2008Publication date: January 1, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
-
Publication number: 20080286691Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.Type: ApplicationFiled: May 15, 2008Publication date: November 20, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Makoto AKITA, Masumi Suetsugu, Kazuhiko Hashimoto
-
Publication number: 20080153036Abstract: The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.Type: ApplicationFiled: November 13, 2007Publication date: June 26, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masumi Suetsugu, Makoto Akita, Kazuhiko Hashimoto
-
Patent number: 7296727Abstract: After detection of contact between respective solder bumps of an electronic component, sucked and held by a suction nozzle of a head tool, and respective solder portions of a circuit board, the solder bumps and the solder portions are melted by heating. Releasing of the electronic component from suction and holding by the suction nozzle of the head tool is performed, not at a time during solder melting, but at a time after the solder is melted, cooled and solidified. Thus, an electronic component mounting method and apparatus capable of mounting high-end electronic components having narrow-pitched bumps are provided.Type: GrantFiled: December 20, 2002Date of Patent: November 20, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shunji Onobori, Shuichi Hirata, Masakazu Yamano, Kazuya Yamamoto, Satoshi Shida, Takaharu Mae, Makoto Akita, Shozo Minamitani
-
Publication number: 20070187457Abstract: A component mounting apparatus includes a component feeder that feeds a component with its bump electrodes facing down, a mounting head that mounts the component onto a substrate, a supporting base that secures the substrate, and a positioning device that aligns the component with the substrate. The mounting head includes an ultrasonic vibration generator, an ultrasonic vibration propagation member that conveys the ultrasonic vibration provided by the ultrasonic vibration generator to a working face holding the component as vibration parallel thereto, a pressure loader that applies a pressure load to the working face from a position immediately thereabove in the direction perpendicular thereto, and a heater that heats the vicinity of the working face. Thereby, ultrasonic bonding is carried out with high reliability even if the component has a number of bump electrodes on its face.Type: ApplicationFiled: March 30, 2007Publication date: August 16, 2007Applicant: Matsushita Electric Industrial Co., Ltd.Inventors: Shozo Minamitani, Takaharu Mae, Yasuharu Ueno, Akira Yamada, Shinji Kanayama, Makoto Akita, Nobuhisa Watanabe, Akira Mori, Hiroyuki Naito, Shinya Marumo, Makoto Morikawa
-
Patent number: 7229854Abstract: A component mounting apparatus includes a component feeder (20) that feeds a component (2) with its bump electrodes facing down, a mounting head (5) that mounts the component onto a substrate (3), a supporting base (8) that secures the substrate, and a positioning device (6, 7) that aligns the component with the substrate. The mounting head includes an ultrasonic vibration generator (24), an ultrasonic vibration propagation member (34, 38, 54) that conveys the ultrasonic vibration provided by the ultrasonic vibration generator to a working face (33, 41, 57) holding the component as vibration parallel thereto, a pressure loader (22, 23, 39, 55, 59) that applies a pressure load to the working face from a position immediately thereabove in the direction perpendicular thereto, and a heater (32, 47, 49, 50, 51, 52, 53) that heats the vicinity of the working face. Thereby, ultrasonic bonding is carried out with high reliability even if the component has a number of bump electrodes (2a) on its face.Type: GrantFiled: March 27, 2003Date of Patent: June 12, 2007Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Shozo Minamitani, Takaharu Mae, Yasuharu Ueno, Akira Yamada, Shinji Kanayama, Makoto Akita, Nobuhisa Watanabe, Akira Mori, Hiroyuki Naito, Shinya Marumo, Makoto Morikawa
-
Patent number: 7001706Abstract: A sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represents a certain substituent, and A+ represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 is a group of the formula (II) wherein R1 and R2 each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.Type: GrantFiled: July 16, 2004Date of Patent: February 21, 2006Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Yamaguchi, Makoto Akita, Isao Yoshida
-
Publication number: 20050227429Abstract: A component mounting apparatus includes a component feeder (20) that feeds a component (2) with its bump electrodes facing down, a mounting head (5) that mounts the component onto a substrate (3), a supporting base (8) that secures the substrate, and a positioning device (6, 7) that aligns the component with the substrate. The mounting head includes an ultrasonic vibration generator (24), an ultrasonic vibration propagation member (34, 38, 54) that conveys the ultrasonic vibration provided by the ultrasonic vibration generator to a working face (33, 41, 57) holding the component as vibration parallel thereto, a pressure loader (22, 23, 39, 55, 59) that applies a pressure load to the working face from a position immediately thereabove in the direction perpendicular thereto, and a heater (32, 47, 49, 50, 51, 52, 53) that heats the vicinity of the working face. Thereby, ultrasonic bonding is carried out with high reliability even if the component has a number of bump electrodes (2a) on its face.Type: ApplicationFiled: March 27, 2003Publication date: October 13, 2005Inventors: Shozo Minamitani, Takaharu Mae, Yasuharu Ueno, Akira Yamada, Shinji Kanayama, Makoto Akita, Nobuhisa Watanabe, Akira Mori, Hiroyuki Naito, Shinya Marumo, Makoto Morikawa