Patents by Inventor Makoto Muramatsu

Makoto Muramatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200211838
    Abstract: A technique for obtaining good film quality in forming a silicon-oxide-containing insulating film as a coating film on a substrate. A coating liquid containing polysilazane is applied to a wafer, a solvent in the coating liquid is volatilized, and then the coating film is irradiated with ultraviolet rays under a nitrogen atmosphere before performing a curing process. Thus, dangling bonds are likely to be formed at hydrolyzed portions in polysilazane. Since dangling bonds are formed in advance at portions in silicon to be hydrolyzed, productivity of hydroxyl groups is enhanced. That is, since an energy required for hydrolysis is reduced, the number of the portions remaining without being hydrolyzed is reduced even when the curing process is performed at a low temperature. Therefore, dehydration synthesis occurs efficiently, which increases a crosslinking rate and makes it possible to form a dense (good film quality) insulating film.
    Type: Application
    Filed: March 13, 2018
    Publication date: July 2, 2020
    Inventors: Makoto MURAMATSU, Yusuke SAITO, Hisashi GENJIMA, Hiroyuki FUJII
  • Patent number: 10622267
    Abstract: Described herein are technologies to facilitate device fabrication, especially those that involve spin-on coatings of a substrate (e.g., wafer). More particularly, technologies described herein facilitate the planarization (i.e., flatness) of spin-on coatings during the device fabrication to form a uniformly planar film or layer on the substrate. This abstract itself is not intended to limit the scope of this patent. The scope of the present invention is pointed out in the appending claims.
    Type: Grant
    Filed: October 4, 2017
    Date of Patent: April 14, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Ryan L. Burns, Benjamen M. Rathsack, Mark H. Somervell, Makoto Muramatsu
  • Patent number: 10586711
    Abstract: A substrate processing method of processing a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate processing method includes: a block copolymer coating step of applying the block copolymer onto the substrate on which a predetermined projecting and recessed pattern is formed, to form a coating film of the block copolymer; a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer; and after the block copolymer coating step and before the polymer removal step, a film thickness reduction step of reducing a film thickness of the coating film of the block copolymer.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: March 10, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Takahiro Kitano
  • Publication number: 20190341255
    Abstract: A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Application
    Filed: July 19, 2019
    Publication date: November 7, 2019
    Inventors: Makoto MURAMATSU, Tadatoshi TOMITA, Hisashi GENJIMA, Gen YOU, Takahiro KITANO
  • Patent number: 10418242
    Abstract: A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: September 17, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Gen You, Takahiro Kitano
  • Patent number: 10329144
    Abstract: A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: June 25, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Gen You, Takahiro Kitano, Takanori Nishi
  • Patent number: 10121659
    Abstract: The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation, and removes one of the polymers in the film of the phase-separated block copolymer, thereby accelerating fluidization of the polymers of the block copolymer to enable acceleration of the phase separation.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: November 6, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Keiji Tanouchi
  • Patent number: 10086815
    Abstract: An electric brake device includes an electric motor; a braking force application mechanism configured to apply a braking force on a vehicle wheel; a lock mechanism configured to assume one of a locked condition; a temperature sensor configured to measure an ambient temperature of a vehicle; and a freezing preventive power supply unit configured to initiate supply of an electric power to the electric motor or a drive source of the lock mechanism. The freezing preventive power supply unit interrupts the supply of the electric power to the electric motor or the drive source of the lock mechanism when the temperature detected by the temperature sensor exceeds a second preset temperature T2 that is higher than a first preset temperature T1.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 2, 2018
    Assignee: NTN CORPORATION
    Inventors: Makoto Muramatsu, Yuuki Saoyama, Tatsuya Yamasaki, Masaaki Eguchi, Yui Masuda
  • Publication number: 20180269072
    Abstract: A substrate processing method of processing a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, the substrate processing method includes: a block copolymer coating step of applying the block copolymer onto the substrate on which a predetermined projecting and recessed pattern is formed, to form a coating film of the block copolymer; a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer; a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer; and after the block copolymer coating step and before the polymer removal step, a film thickness reduction step of reducing a film thickness of the coating film of the block copolymer.
    Type: Application
    Filed: October 20, 2016
    Publication date: September 20, 2018
    Inventors: Makoto MURAMATSU, Tadatoshi TOMITA, Hisashi GENJIMA, Takahiro KITANO
  • Patent number: 9970499
    Abstract: The electric linear motion actuator includes an electric motor, a drive shaft configured to be rotated by the electric motor, a rotation-to-linear motion converting mechanism configured to convert the rotational motion of the drive shaft to the axial linear motion of an axially movably supported outer ring member, and an electric locking mechanism incorporated in a reduction gear mechanism in which the rotation of a rotor shaft of the electric motor is reduced in speed and transmitted to the drive shaft. When the electric locking mechanism is energized, the power transmission path shifts to the locked state in which power cannot be transmitted, and when the electric locking mechanism is de-energized thereafter, the power transmission path is kept in the locked state. The electric locking mechanism is built in a motor case of the electric motor so that the electric motor and the electric locking mechanism are unitized.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: May 15, 2018
    Assignee: NTN CORPORATION
    Inventors: Tatsuya Yamasaki, Makoto Muramatsu, Yui Masuda
  • Publication number: 20180096905
    Abstract: Described herein are technologies to facilitate device fabrication, especially those that involve spin-on coatings of a substrate (e.g., wafer). More particularly, technologies described herein facilitate the planarization (i.e., flatness) of spin-on coatings during the device fabrication to form a uniformly planar film or layer on the substrate. This abstract itself is not intended to limit the scope of this patent. The scope of the present invention is pointed out in the appending claims.
    Type: Application
    Filed: October 4, 2017
    Publication date: April 5, 2018
    Inventors: Ryan L. Burns, Benjamen M. Rathsack, Mark H. Somervell, Makoto Muramatsu
  • Publication number: 20180065843
    Abstract: A substrate treatment method using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer includes a polymer separating step, wherein a ratio of a molecular weight of the hydrophilic polymer in the block copolymer is adjusted to 20% to 40% so that the hydrophilic polymers align at positions corresponding to a hexagonal close-packed structure in a plan view after the polymer separating step, and at the polymer separating step, a columnar first hydrophilic polymer is phase-separated on each of circular patterns of hydrophobic coating films and a columnar second hydrophilic polymer is phase-separated between the first hydrophilic polymers, and a diameter of the circular pattern is set so that the first hydrophilic polymers and the second hydrophilic polymers align at positions corresponding to the hexagonal close-packed structure in a plan view.
    Type: Application
    Filed: February 10, 2016
    Publication date: March 8, 2018
    Inventors: Makoto MURAMATSU, Tadatoshi TOMITA, Hisashi GENJIMA, Gen YOU, Takahiro KITANO, Takanori NISHI
  • Publication number: 20180019118
    Abstract: The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation, and removes one of the polymers in the film of the phase-separated block copolymer, thereby accelerating fluidization of the polymers of the block copolymer to enable acceleration of the phase separation.
    Type: Application
    Filed: September 27, 2017
    Publication date: January 18, 2018
    Inventors: Makoto MURAMATSU, Takahiro KITANO, Tadatoshi TOMITA, Keiji TANOUCHI
  • Patent number: 9859118
    Abstract: The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation, and removes one of the polymers in the film of the phase-separated block copolymer, thereby accelerating fluidization of the polymers of the block copolymer to enable acceleration of the phase separation.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: January 2, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Keiji Tanouchi
  • Patent number: 9810987
    Abstract: A substrate treatment method includes: a polymer separation step of phase-separating a block copolymer into a hydrophilic polymer and a hydrophobic polymer; and a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein in the polymer removal step, the hydrophilic polymer is removed by: irradiating the phase-separated block copolymer with an energy ray; then supplying a first polar organic solvent having a first degree of dissolving the hydrophilic polymer, being lower in boiling point than water and capable of dissolving water, and not dissolving the hydrophobic polymer, to the block copolymer; and then supplying a second polar organic solvent having a second dissolving degree lower than the first dissolving degree, being higher in boiling point than water, and not dissolving the hydrophobic polymer, to the block copolymer.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: November 7, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Takanori Nishi, Shinichiro Kawakami, Takashi Yamauchi
  • Publication number: 20170287749
    Abstract: A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Application
    Filed: September 15, 2015
    Publication date: October 5, 2017
    Inventors: Makoto MURAMATSU, Tadatoshi TOMITA, Hisashi GENJIMA, Gen YOU, Takahiro KITANO
  • Patent number: 9748101
    Abstract: The present invention is configured to: form, on a substrate, a neutral layer having an intermediate affinity to a hydrophilic polymer and a hydrophobic polymer; form a resist pattern by performing exposure processing on a resist film formed on the neutral layer and then developing the resist film after the exposure processing; perform a surface treatment on the resist pattern by supplying an organic solvent having a polarity to the resist pattern; apply the block copolymer onto the neutral layer; and phase-separate the block copolymer on the neutral layer into the hydrophilic polymer and the hydrophobic polymer.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: August 29, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Keiji Tanouchi, Soichiro Okada
  • Patent number: 9741583
    Abstract: A substrate treatment method includes: forming a plurality of circular patterns of a resist film on a substrate; thereafter applying a first block copolymer; then phase-separating the first block copolymer into a hydrophilic polymer and a hydrophobic polymer; thereafter selectively removing the hydrophilic polymer; then selectively removing the resist film from a top of the substrate; thereafter applying a second block copolymer to the substrate; then phase-separating the second block copolymer into a hydrophilic polymer and a hydrophobic polymer; and thereafter selectively removing the hydrophilic polymer from the phase-separated second block copolymer. A ratio of a molecular weight of the hydrophilic polymer in the first block copolymer and the second block copolymer is 20% to 40%.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: August 22, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Gen You, Takanori Nishi
  • Publication number: 20170133235
    Abstract: A substrate treatment method includes: forming a plurality of circular patterns of a resist film on a substrate; thereafter applying a first block copolymer; then phase-separating the first block copolymer into a hydrophilic polymer and a hydrophobic polymer; thereafter selectively removing the hydrophilic polymer; then selectively removing the resist film from a top of the substrate; thereafter applying a second block copolymer to the substrate; then phase-separating the second block copolymer into a hydrophilic polymer and a hydrophobic polymer; and thereafter selectively removing the hydrophilic polymer from the phase-separated second block copolymer. A ratio of a molecular weight of the hydrophilic polymer in the first block copolymer and the second block copolymer is 20% to 40%.
    Type: Application
    Filed: April 16, 2015
    Publication date: May 11, 2017
    Inventors: Makoto MURAMATSU, Takahiro KITANO, Tadatoshi TOMITA, Gen YOU, Takanori NISHI
  • Patent number: 9624994
    Abstract: An electric linear motion actuator includes a locking mechanism for locking and unlocking the rotor shaft of an electric motor. The locking mechanism includes circumferentially arranged locking holes provided in a gear of a reduction gear mechanism, a locking pin moved toward and away from the locking holes, and engaged in one locking hole to lock the gear when the locking pin is moved toward the gear, and a linear solenoid for moving the locking pin toward and away from the gear. The plunger of the linear solenoid and the locking pin are formed as separate parts, and disposed coaxial with each other with their end faces axially facing each other. This prevents the moment load applied from the gear to the locking pin from acting on the plunger, thereby preventing damage to a bobbin slidably supporting the radially inner surface of the plunger.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 18, 2017
    Assignee: NTN CORPORATION
    Inventors: Makoto Yasui, Makoto Muramatsu, Yuki Saoyama