Abstract: In the present invention, a spin chuck which horizontally holds a substrate by vacuum suction is provided inside a treatment container of a coating treatment apparatus. Above the spin chuck, a coating nozzle is located for applying a coating solution containing a coating film forming component in the liquid state onto the central portion of the surface of the substrate. In an upper portion of the treatment container, an irradiation unit is provided which applies ultraviolet rays to the substrate on the spin chuck. After applying the coating solution onto the pattern on the substrate from the coating nozzle, ultraviolet rays are applied from the irradiation unit to the applied coating solution to form a coating film.

Abstract: A production method of an insulating film includes (1) a process of applying, onto a substrate, a film forming composition comprising a compound having a cage structure to form a film and then drying the film; and (2) a process of irradiating the film with an electron beam or an electromagnetic wave having a wavelength greater than 200 nm.

Abstract: A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.

Abstract: A sealed rolling bearing has sealing devices with both the functions of high sealing ability and small sliding resistance, which are antipodal to each other. The sealed rolling bearing has an outer member (1, 30) formed with an outer raceway surface (8, 29) on its inner circumferential surface. An inner member (4, 5, 32) is formed with an inner raceway surface (9a, 9b, 31) on its outer circumferential surface. The inner raceway surface (9a, 9b, 31) is arranged opposite to the outer raceway surface (8, 29). Rolling elements (10, 34) are freely rollably contained between the outer and inner raceway surfaces. Sealing devices (12, 13, 35) are arranged in an annular space formed between the outer and inner members (1, 30 and 4, 5, 32). Each of the sealing devices (12, 13; 35) has elastic sealing lips (27a˜27c, 23˜25, 37a, 37b).

Abstract: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: A rotation speed sensor can be detachably mounted to an outer member of a wheel bearing assembly. A sensor holder is a leaf spring folded in two and has upper and lower portions having windows aligned with each other and a downwardly protruding rib and an upwardly protruding rib, respectively, and a connecting portion. The sensor is inserted through these windows until a rib formed on the connecting portion engages in a groove formed in the back of the sensor. The holder is mounted on the outer member until the downwardly protruding rib and upwardly protruding rib engage in grooves formed in a ledge axially protruding from one end of the outer ring and the sensor is received in a cutout formed in the ledge. In this state, the holder is strained, thereby elastically holding the sensor in the cutout formed in the ledge.

Abstract: A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: An arrangement is provided which a rotation speed sensor can be easily, directly, stably and detachably mounted to an outer member of the wheel bearing assembly. A sensor holder used for this purpose is a leaf spring folded in two and has upper and lower portions having windows aligned with each other and a downwardly protruding rib and an upwardly protruding rib, respectively, and a connecting portion. The sensor is inserted through these windows until a rib formed on the connecting portion engages in a groove formed in the back of the sensor. In this state, the holder is mounted on the outer member until the downwardly protruding rib and upwardly protruding rib engage in grooves formed in the ledge axially protruding from one end of the outer ring and the sensor is received in a cutout formed in the ledge. In this state, the holder is strained. Thus, the sensor is pressed against a deep end of the cutout formed in the ledge under an elastic restoring force produced in the holder.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: An execution control section specifies a function object to next be executed on the basis of icon layout information. When there is a second icon is adjoining or adjacent to the right side or the lower side of a first icon, the execution control section applies an output of the function corresponding to the first icon to the function of the second icon, to trigger the function of the second icon. Icon layout information can be formed by merely juxtaposing icons. The execution control section successively executes the functions of the icons in an order in which the icons are juxtaposed. Also, when an icon is operated, a window management system generates an event. In accordance with the event, an operation environment control portion executes and displays an object corresponding to the icon. A program is composed from function objects corresponding to icons laid out.

Abstract: Endo-(8-methyl-8-azabicyclo?3.2.1!oct-3-yl) 1-isopropyl-2(1H)-quinolone-3-carboxylate represented by Formula (I): ##STR1## or an acid addition salt thereof acts on a serotonin 4 receptor thereby to have a serotonin-like receptor stimulating activity, therefore has an action on activating gastrointestinal motor functions and thus is effective for the improvement of gastrointestinal conditions such as heartburn, anorexia, bowel pain or abdominal distension accompanied by chronic gastritis or postoperative gastroparesis, and further for the treatment of gastro-esophagal reflux, intestinal pseudo-obstruction or constipation.

Abstract: Endo-N-(8-methyl-8-azabicyclo[3.2.1]oct-3-yl)-1 -isopropyl-2(1H)-quinolone-3-carboxamide shown by formula (I): ##STR1## or an acid addition salt thereof exhibits a potent action for stimulating a serotonin 4 receptor and is effective for the treatment of diseases and for the improvement of conditions, caused by a reduced motility in the gastrointestinal tract.