Patents by Inventor Makoto NAKAZUMI

Makoto NAKAZUMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10438814
    Abstract: An object is to provide a novel method in place of the above-described conventional technology, as a technique for obtaining a thin film with a wiring pattern applied. A method for manufacturing a wiring pattern according to the present invention is characterized in that the method includes: a laminate forming step of forming a laminate by bringing a first member that has a resist layer and a metal layer formed on the resist layer into contact with a second member that includes a substrate; a resist layer patterning step of subjecting the resist layer to patterning; and an etching step of selectively removing the metal layer.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: October 8, 2019
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi, Kei Nara
  • Publication number: 20190262858
    Abstract: A thin film forming apparatus including: a first chamber configured to generate a mist of a dispersion liquid, and including an outlet; a second chamber configured to receive the generated mist from the first chamber and collect particles of the generated mist having a size greater than a predetermined value, and including an inlet provided on a top of the second chamber and connected to the outlet of the first chamber, and an outlet provided on the top of the second chamber and configured to transfer, as homogenized mist, particles of the generated mist having a size less than or equal to the predetermined value due to the effect of gravity on the particles of the mist; and a third chamber configured to receive the homogenized mist from the second chamber, and including an inlet connected to the outlet of the second chamber.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Patent number: 10328453
    Abstract: In order to provide a novel method of obtaining a thin film to replace the related art, provided is a method of manufacturing a thin film, including: generating mist of a dispersion liquid containing fine particles; supplying the generated mist of the dispersion liquid onto a substrate; and drying the dispersion liquid supplied onto the substrate.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: June 25, 2019
    Assignee: NIKON CORPORATION
    Inventors: Yasutaka Nishi, Makoto Nakazumi
  • Publication number: 20190181268
    Abstract: There is provided a semiconductor device including: a first electrode; a second electrode; and a semiconductor layer in contact with the first electrode and the second electrode, in which the semiconductor layer is a spinel-type oxide containing zinc (Zn) and gallium (Ga).
    Type: Application
    Filed: January 18, 2019
    Publication date: June 13, 2019
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI
  • Publication number: 20190165190
    Abstract: The nanoparticle assembly includes nanoparticles having an average primary particle size of 60 nm or less, and the nanoparticle assembly has a diameter of more than 500 nm and 5 ?m or less.
    Type: Application
    Filed: January 31, 2019
    Publication date: May 30, 2019
    Applicants: National University Corporation Kumamoto University, NIKON CORPORATION
    Inventors: Takao NAMIHIRA, Yasutaka NISHI, Makoto NAKAZUMI, Koichiro IWAHORI
  • Publication number: 20180108539
    Abstract: An object is to provide a novel method in place of the above-described conventional technology, as a technique for obtaining a thin film with a wiring pattern applied. A method for manufacturing a wiring pattern according to the present invention is characterized in that the method includes: a laminate forming step of forming a laminate by bringing a first member that has a resist layer and a metal layer formed on the resist layer into contact with a second member that includes a substrate; a resist layer patterning step of subjecting the resist layer to patterning; and an etching step of selectively removing the metal layer.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 19, 2018
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI, Kei NARA
  • Publication number: 20180066361
    Abstract: An object of the invention is to provide a thin film manufacturing device which further reduces a load on a substrate. Provided is a thin film manufacturing device for forming a thin film on a substrate by supplying a mist of a solution including a thin-film forming material to the substrate, characterized in that the device includes: a plasma generation unit including a first electrode and a second electrode disposed closer to one surface of the substrate, which generates plasma between the first electrode and the second electrode; and a mist supply unit which passes the mist between the first electrode and the second electrode and supplies the mist to the substrate.
    Type: Application
    Filed: August 18, 2017
    Publication date: March 8, 2018
    Applicants: NIKON CORPORATION, NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY
    Inventors: Kei NARA, Makoto NAKAZUMI, Yasutaka NISHI, Yusui NAKAMURA, Takao NAMIHIRA, Norimitsu TAKAMURA
  • Patent number: 9799510
    Abstract: Provided is a technology for efficiently obtaining a metal oxide film having good adhesiveness. A method of producing a metal oxide film includes: an application step of applying a solution containing an organic metal complex onto a substrate; an ozone exposure step of exposing the resultant coating film to ozone; and a heating step of heating the coating film.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: October 24, 2017
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Patent number: 9577550
    Abstract: Provided is a vibration actuator including: an electromechanical transduction member that transduces electric power to a mechanical vibration; a transmission member that transmits the vibration from the electromechanical transduction member as a driving force; and an abutting portion that abuts on the transmission member and moves relative to the transmission member in response to the driving force. One of the transmission member and the abutting portion includes pores in its surface contacting the abutting portion or the transmission member at an area occupancy of 2% or higher. In this vibration actuator, the average area of the pores may be 3 ?m2 or larger. The other of the transmission member and the abutting portion may include iron in its surface contacting the one.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: February 21, 2017
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Masaaki Tanabe
  • Publication number: 20170025644
    Abstract: A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.
    Type: Application
    Filed: October 3, 2016
    Publication date: January 26, 2017
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Patent number: 9536912
    Abstract: A method of transferring a thin film is a method of transferring a thin film formed on a first substrate to a second substrate, the method including: allowing the first substrate to come into contact with a liquid to swell the first substrate; allowing the second substrate and the thin film to come into contact with each other via the liquid; and drying the liquid to allow the thin film to adhere to the second substrate.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: January 3, 2017
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20160221031
    Abstract: In order to provide a novel method of obtaining a thin film to replace the related art, provided is a method of manufacturing a thin film, including: generating mist of a dispersion liquid containing fine particles; supplying the generated mist of the dispersion liquid onto a substrate; and drying the dispersion liquid supplied onto the substrate.
    Type: Application
    Filed: April 13, 2016
    Publication date: August 4, 2016
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka NISHI, Makoto NAKAZUMI
  • Publication number: 20160163538
    Abstract: Provided is a technology for efficiently obtaining a metal oxide film having good adhesiveness. A method of producing a metal oxide film includes: an application step of applying a solution containing an organic metal complex onto a substrate; an ozone exposure step of exposing the resultant coating film to ozone; and a heating step of heating the coating film.
    Type: Application
    Filed: January 28, 2016
    Publication date: June 9, 2016
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka Nishi
  • Patent number: 9337320
    Abstract: A method of manufacturing a zinc oxide thin film includes: immersing a base having a conductive portion in at least part of the base, in a solution containing zinc ions, hydroxide ions, and zinc complex ions; and by applying an alternating current to the conductive portion, forming a zinc oxide thin film on a region of the base, the region including the conductive portion.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: May 10, 2016
    Assignee: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20150318306
    Abstract: A method of transferring a thin film is a method of transferring a thin film formed on a first substrate to a second substrate, the method including: allowing the first substrate to come into contact with a liquid to swell the first substrate; allowing the second substrate and the thin film to come into contact with each other via the liquid; and drying the liquid to allow the thin film to adhere to the second substrate.
    Type: Application
    Filed: July 14, 2015
    Publication date: November 5, 2015
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, Yasutaka NISHI
  • Publication number: 20150187916
    Abstract: A method of manufacturing a zinc oxide thin film includes: immersing a base having a conductive portion in at least part of the base, in a solution containing zinc ions, hydroxide ions, and zinc complex ions; and by applying an alternating current to the conductive portion, forming a zinc oxide thin film on a region of the base, the region including the conductive portion.
    Type: Application
    Filed: December 15, 2014
    Publication date: July 2, 2015
    Applicant: NIKON CORPORATION
    Inventors: Makoto Nakazumi, Yasutaka Nishi
  • Publication number: 20140227169
    Abstract: A method of manufacturing a zinc oxide thin film includes: preparing a basic solution containing tetrahydroxozincate (II) ions and having a pH of 10 or more; diluting the basic solution such that the pH becomes 8.5 or less; applying the basic solution to a substrate; and heating the basic solution.
    Type: Application
    Filed: February 26, 2014
    Publication date: August 14, 2014
    Applicant: NIKON CORPORATION
    Inventors: Yasutaka Nishi, Makoto Nakazumi, Yusuke Taki
  • Publication number: 20140009667
    Abstract: Provided is a vibration actuator including: an electromechanical transduction member that transduces electric power to a mechanical vibration; a transmission member that transmits the vibration from the electromechanical transduction member as a driving force; and an abutting portion that abuts on the transmission member and moves relative to the transmission member in response to the driving force. One of the transmission member and the abutting portion includes pores in its surface contacting the abutting portion or the transmission member at an area occupancy of 2% or higher. In this vibration actuator, the average area of the pores may be 3 ?m2 or larger. The other of the transmission member and the abutting portion may include iron in its surface contacting the one.
    Type: Application
    Filed: September 9, 2013
    Publication date: January 9, 2014
    Applicant: NIKON CORPORATION
    Inventors: Makoto NAKAZUMI, MASAAKI TANABE
  • Publication number: 20120058366
    Abstract: Provided is a manufacturing method for manufacturing a film-formed article by using sputtering to form a film including a constituent element of a target on a substrate. The manufacturing method comprises setting a distance d between the target and the substrate in a range from 0.5 times to 1.5 times a mean free path of the constituent element in the sputtering gas.
    Type: Application
    Filed: November 15, 2011
    Publication date: March 8, 2012
    Applicant: NIKON CORPORATION
    Inventors: Koichiro IWAHORI, Makoto NAKAZUMI