Abstract: A substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material to hold the substrate, and a second holding portion formed on the base material to hold a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged to absorb the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

Abstract: An exposure apparatus exposes a substrate to light passing through liquid, and includes a stage that holds the substrate. The stage includes a substrate holder including a support member that supports a rear surface of the substrate and a first circumferential wall surrounding the support member. A second circumferential wall surrounds the substrate holder and forms a first groove between the second circumferential wall and the substrate holder, and a second groove on an outer side thereof. A plate member surrounds the substrate on the support member, and a recovery passage recovers liquid flowing from a liquid supply system to a gap between the plate member and the substrate. The second circumferential wall is under the gap so that part of an upper surface of the second circumferential wall faces the substrate rear surface and another part of the upper surface faces a rear surface of the plate member.

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

Abstract: An exposure apparatus exposes a substrate to light passing through liquid, and includes a stage that holds the substrate. The stage includes a substrate holder including a support member that supports a rear surface of the substrate and a first circumferential wall surrounding the support member. A second circumferential wall surrounds the substrate holder and forms a first groove between the second circumferential wall and the substrate holder, and a second groove on an outer side thereof. A plate member surrounds the substrate on the support member, and a recovery passage recovers liquid flowing from a liquid supply system to a gap between the plate member and the substrate. The second circumferential wall is under the gap so that part of an upper surface of the second circumferential wall faces the substrate rear surface and another part of the upper surface faces a rear surface of the plate member.

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

Abstract: An exposure apparatus exposes a substrate to light passing through liquid, and includes a stage that holds the substrate. The stage includes a substrate holder including a support member that supports a rear surface of the substrate and a first circumferential wall surrounding the support member. A second circumferential wall surrounds the substrate holder and forms a first groove between the second circumferential wall and the substrate holder, and a second groove on an outer side thereof. A plate member surrounds the substrate on the support member, and a recovery passage recovers liquid flowing from a liquid supply system to a gap between the plate member and the substrate. The second circumferential wall is under the gap so that part of an upper surface of the second circumferential wall faces the substrate rear surface and another part of the upper surface faces a rear surface of the plate member.

Abstract: An exposure apparatus exposes a substrate to light passing through liquid, and includes a stage that holds the substrate. The stage includes a substrate holder including a support member that supports a rear surface of the substrate and a first circumferential wall surrounding the support member. A second circumferential wall surrounds the substrate holder and forms a first groove between the second circumferential wall and the substrate holder, and a second groove on an outer side thereof. A plate member surrounds the substrate on the support member, and a recovery passage recovers liquid flowing from a liquid supply system to a gap between the plate member and the substrate. The second circumferential wall is under the gap so that part of an upper surface of the second circumferential wall faces the substrate rear surface and another part of the upper surface faces a rear surface of the plate member.

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

Abstract: An exposure apparatus exposes a substrate to light passing through liquid, and includes a stage that holds the substrate. The stage includes a substrate holder including a support member that supports a rear surface of the substrate and a first circumferential wall surrounding the support member. A second circumferential wall surrounds the substrate holder and forms a first groove between the second circumferential wall and the substrate holder, and a second groove on an outer side thereof. A plate member surrounds the substrate on the support member, and a recovery passage recovers liquid flowing from a liquid supply system to a gap between the plate member and the substrate. The second circumferential wall is under the gap so that part of an upper surface of the second circumferential wall faces the substrate rear surface and another part of the upper surface faces a rear surface of the plate member.

Abstract: An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).

Abstract: An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).

Abstract: To provide a substrate holding apparatus that can rapidly recover liquid that has infiltrated the rear surface side of a substrate. A substrate holding apparatus comprises: a base; a first support part, which is formed on the base and supports a rear surface of a substrate to be processed; a first circumferential wall part, which is formed on the base and is provided so that it opposes the rear surface of the substrate to be processed and surrounds the first support part; and a first recovery port, which is provided on the outer side of the first circumferential wall part; wherein, the flow of a gas along the first circumferential wall part moves the liquid on the outer side of the first circumferential wall part to the first recovery port, where the liquid is recovered.

Abstract: An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and a liquid immersion system that is capable of forming a liquid immersion region of a liquid under the projection optical system. The first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.

Abstract: An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).

Abstract: An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes: a substrate holder (PH) that includes a peripheral wall portion (33) and supporting portions (34) located on an inside of the peripheral wall portion (33) and that supports a substrate (P) with the supporting portions (34) by negatively pressurizing a space (31) surrounded by the peripheral wall portion (33); and a recovery mechanism that includes a collection inlets (61) provided on the inside of the peripheral wall portion (33) and a vacuum system (63) connected to the collection inlets (61), in which a liquid penetrated from an outer periphery of the substrate (P) is sucked and recovered, in the state with an upper surface (33A) of the peripheral wall portion (33) and a back surface (Pb) of the substrate (P) being spaced at a first distance.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PH1) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PH2).