Abstract: According to one embodiment, a vehicle frame, front wheel which is formed of a universal caster, a pair of rear wheels, and a lift-up wheel which is formed of a universal caster and is provided at a lower portion of the rear end part of the vehicle frame such that the lift-up wheel is capable of being elevated between a ground-contact position and a non-ground-contact position by an elevation mechanism, the lift-up wheel being configured such that the lift-up wheel, together with the front wheel, movably supports the vehicle frame in a lowered state of the lift-up wheel at the ground-contact position.

Abstract: According to one embodiment, a vehicle frame, front wheel which is formed of a universal caster, a pair of rear wheels, and a lift-up wheel which is formed of a universal caster and is provided at a lower portion of the rear end part of the vehicle frame such that the lift-up wheel is capable of being elevated between a ground-contact position and a non-ground-contact position by an elevation mechanism, the lift-up wheel being configured such that the lift-up wheel, together with the front wheel, movably supports the vehicle frame in a lowered state of the lift-up wheel at the ground-contact position.

Abstract: In order to provide a one-way clutch-containing rotation transmission apparatus of a high performance and an excellent durability, which shows a satisfactory lubricating property in a one-way clutch and a rolling bearing over a wide temperature range from a low temperature to a high temperature, in which an antirust agent for preventing a corrosion by rainwater or the like has little environmental burden and which does not cause an exfoliation of metal materials under a vibrating condition, a grease composition, employing a synthetic oil as a base oil, also employing at least either of an urea compound and a metal soap as a thickener and containing a non-barium type antirust agent in an amount of from 1.0 to 10 mass % with respect to the entire amount of the grease, is sealed in the rolling bearing and the one-way clutch.

Abstract: A method for forming a thin film on a substrate, which comprises aligning an evaporation means for an evaporating material to be deposited on the substrate, a plasma generating zone for dissociating an ion-forming gas into ions and electrons, an ion beam accelerating zone for accelerating the resulting ions and irradiating them onto the substrate, and said substrate on a substantially straight line in the order stated, and depositing a vapor of the evaporating material on the substrate through the plasma generating zone and the ion beam accelerating zone. According to this method, surface irradiation can be carried out uniformly because the ion species and the vapor atoms are irradiated in quite the same direction. Furthermore, the vapor atoms can be activated to a high degree, and the by-product electrons can be effectively utilized for the evaporation of the evaporant.

Abstract: A method for forming a thin film on a substrate, which comprises aligning an evaporation means for an evaporating material to be deposited on the substrate, a plasma generating zone for dissociating an ion-forming gas into ions and electrons, an ion beam accelerating zone for accelerating the resulting ions and irradiating them onto the substrate, and said substrate on a substantially straight line in the order stated, and depositing a vapor of the evaporating material on the substrate through the plasma generating zone and the ion beam accelerating zone. According to this method, surface irradiation can be carried out uniformly because the ion species and the vapor atoms are irradiated in quite the same direction. Furthermore, the vapor atoms can be activated to a high degree, and the by-product electrons can be effectively utilized for the evaporation of the evaporant.

Abstract: In a process for the production of a high-hardness boron nitride film by vacuum-depositing a boron component on a substrate from a boron-containing vacuum deposition source and simultaneously irradiating the substrate with an ion seed comprising at least nitrogen from an ion-generating source, if the atomic ratio (B/N) between boron and nitrogen supplied from the vacuum deposition source and the ion seed is adjusted within a range of from 4 to 25, the ion acceleration energy of the ion seed is adjusted to 5 to 100 KeV per atom of the ion seed and vacuum deposition and irradiation are carried out in an atmosphere of a nitrogen atom or nitrogen compound activated at an energy level lower than that of the ion seed, the hardness and quality of the film are highly improved. Furthermore, if a negative bias voltage is applied to the substrate at the vacuum deposition and irradiation with the seed ion, the film-forming speed can be increased and the hardness and quality of the film are further improved.