Patents by Inventor Manabu Takakuwa

Manabu Takakuwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170345727
    Abstract: According to one embodiment, deposition supporting system, depositing apparatus and manufacturing method of a semiconductor device includes a depositing apparatus that deposits stacked bodies on wafers allocated to stations and a host computer. The host computer evaluates feature amounts convertible to misalignments at predetermined points on the stacked bodies of the respective wafers, and specifies the stations to which the wafers are to be allocated based on the feature amounts of the stacked bodies in the respective stations. The depositing apparatus allocates the wafers to the stations based on the specification from the host computer.
    Type: Application
    Filed: August 31, 2016
    Publication date: November 30, 2017
    Applicant: Toshiba Memory Corporation
    Inventor: Manabu TAKAKUWA
  • Patent number: 9784573
    Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: October 10, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hidenori Sato, Yosuke Okamoto, Nobuhiro Komine, Manabu Takakuwa
  • Publication number: 20170271214
    Abstract: A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.
    Type: Application
    Filed: August 31, 2016
    Publication date: September 21, 2017
    Inventors: Kentaro KASA, Kazuya FUKUHARA, Kazutaka ISHIGO, Manabu TAKAKUWA, Yoshinori HAGIO, Kazuhiro SEGAWA, Yuki MURASAKA, Tetsuya KUGIMIYA, Yuu YAMAYOSE, Yosuke OKAMOTO
  • Publication number: 20170235232
    Abstract: According to one embodiment, a value of a film thickness of a processing object disposed above a substrate is obtained. Then, a wavelength that provides a highest degree of intensity of signal light reflected when the signal light is incident onto the processing object having the value of the film thickness, based on wavelength selection reference information is selected. Then, a first instruction performing an alignment process to the substrate by use of signal light having a wavelength thus selected is generated. The wavelength selection reference information is information that includes a correlation between values of the film thickness of the processing object and degrees of intensity of the signal light, with respect to a plurality of wavelengths.
    Type: Application
    Filed: June 1, 2016
    Publication date: August 17, 2017
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Miki TOSHIMA, Satoshi USUI, Manabu TAKAKUWA, Nobuhiro KOMINE, Takaki HASHIMOTO
  • Publication number: 20170148656
    Abstract: According to one embodiment, an alignment method includes calculating a position gap of a predetermined point in a device area of a wafer based on a stress applied to the device area, and correcting an exposure condition in a lithography process of the device area based on the position gap of the predetermined point.
    Type: Application
    Filed: February 4, 2016
    Publication date: May 25, 2017
    Applicant: Kabushiki Kaisha Toshiba
    Inventor: Manabu TAKAKUWA
  • Patent number: 9632407
    Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: April 25, 2017
    Assignee: Kabushiki Kaisha Yoshiba
    Inventors: Hidenori Sato, Manabu Takakuwa, Nobuhiro Komine, Taketo Kuriyama
  • Publication number: 20170050351
    Abstract: In an imprinting apparatus according to one embodiment, rear surfaces of first and second templates are suctioned. A correction information calculating device calculates a second response coefficient of the second template out of first response coefficients based on a flatness relational expression and flatness of the second template. The first response coefficients are actual amounts of positional slippage of the first template from a first input adjustment value. The flatness relational expression indicates a relationship between flatness of the first template and the first response coefficients. A shape and a size of the second template are adjusted using the second response coefficient.
    Type: Application
    Filed: November 20, 2015
    Publication date: February 23, 2017
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yoshio MIZUTA, Manabu TAKAKUWA, Masato SUZUKI
  • Publication number: 20170040196
    Abstract: According to the embodiments, a template in which a main pattern is placed on a pattern-formed surface of a template substrate, the main pattern being formed by a concave and convex pattern, the template substrate being transparent to an electromagnetic wave with a predetermined wavelength is provided. The template includes a first mark in which line-shaped first concave patterns and first convex patterns are alternately placed in a width direction on the pattern-formed surface. The first convex pattern includes a first light-blocking portion and a first translucent portion. The first light-blocking portion is a region including a first side surface in the width direction and being covered with a metal film. The first translucent portion is a region including a second side surface in the width direction and being not covered with the metal film.
    Type: Application
    Filed: October 30, 2015
    Publication date: February 9, 2017
    Applicant: Kabushiki Kaisha Toshiba
    Inventor: Manabu TAKAKUWA
  • Patent number: 9541847
    Abstract: According to one embodiment, an imprint method comprises coating a photo-curable organic material on a film to be processed, bringing a concave-convex pattern of a template into contact with the photo-curable organic material, applying a force to the template in such a state that the template is brought into contact with the photo-curable organic material, curing the photo-curable organic material by irradiating light onto the photo-curable organic material, in such a state that the template is brought into contact with the photo-curable organic material, and releasing the template from the photo-curable organic material after the light irradiation. The force applied to the template corresponds to a gap between a surface of the film to be processed and the template.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: January 10, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masato Suzuki, Takuya Kono, Manabu Takakuwa, Kazuya Fukuhara
  • Publication number: 20160245645
    Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.
    Type: Application
    Filed: June 11, 2015
    Publication date: August 25, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hidenori SATO, Yosuke OKAMOTO, Nobuhiro KOMINE, Manabu TAKAKUWA
  • Patent number: 9396299
    Abstract: Reticle marks are arranged at a plurality of places in a kerf region of a reticle, the area of a polygon with apexes at arrangement positions of the reticle marks is calculated, and the arrangement positions of the reticle marks are decided based on results of calculation of the area of the polygon.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: July 19, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Nakagawa, Nobuhiro Komine, Kazuhiro Segawa, Manabu Takakuwa, Motohiro Okada
  • Publication number: 20160018730
    Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.
    Type: Application
    Filed: September 11, 2014
    Publication date: January 21, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hidenori Sato, Manabu Takakuwa, Nobuhiro Komine, Taketo Kuriyama
  • Patent number: 9240336
    Abstract: According to one embodiment, an imprint method is provided. In the imprint method, minute objects adhering to a shot of a substrate, on which imprinting is next performed, are removed after delivering the substrate to the interior of an imprint apparatus and before dropping a resist onto the substrate. Thereafter, a resist is dropped onto the shot. Further, a template that is an original plate having a concave-convex pattern is brought into contact with the resist to form a resist pattern on the substrate according to the concave-convex pattern.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: January 19, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Manabu Takakuwa
  • Publication number: 20160009020
    Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.
    Type: Application
    Filed: September 4, 2014
    Publication date: January 14, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Manabu Takakuwa, Yoshihisa Kawamura, Ikuo Yoneda
  • Publication number: 20150339423
    Abstract: Reticle marks are arranged at a plurality of places in a kerf region of a reticle, the area of a polygon with apexes at arrangement positions of the reticle marks is calculated, and the arrangement positions of the reticle marks are decided based on results of calculation of the area of the polygon.
    Type: Application
    Filed: September 4, 2014
    Publication date: November 26, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Nakagawa, Nobuhiro Komine, Kazuhiro Segawa, Manabu Takakuwa, Motohiro Okada
  • Patent number: 9188879
    Abstract: According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: November 17, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Kasa, Manabu Takakuwa, Ryoichi Inanami, Kazuto Matsuki, Tetsuro Nakasugi, Hiroshi Koizumi, Minoru Inomoto
  • Publication number: 20150251350
    Abstract: According to one embodiment, an imprint device includes a holding unit, a mounting unit, a moving unit, a curing unit, a pressing portion, and a detecting portion. The holding unit holds template having a pattern portion pressed onto a transfer portion provided on a substrate. The mounting unit mounts the substrate. The moving unit is provided on at least either the holding unit or the mounting unit. The moving unit moves the holding unit and the mounting unit in directions approaching each other or directions away from each other. The curing unit cures the transfer portion onto which the pattern portion of the template is pressed. The pressing portion pushes the template pressed onto the transfer portion in a direction intersecting a pressing direction of the template. The detecting portion detects a position of the template pushed by the pressing portion.
    Type: Application
    Filed: September 9, 2014
    Publication date: September 10, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Nobuhiro KOMINE, Kazuhiro SEGAWA, Manabu TAKAKUWA, Kentaro KASA
  • Patent number: 9087875
    Abstract: According to one embodiment, a pattern formation method includes forming a first mask layer including a first and a second concave pattern on a first surface of a substrate. The method can include providing a protection film in the first concave pattern. The method can include providing a self-assembling material in the second concave pattern. The method can include forming a first and a second phase in the second concave pattern by phase-separating the self-assembling material. The method can include removing the protection film together with the first phase to form a second mask layer having the first concave pattern and a third concave pattern. The third concave pattern is provided in the second concave pattern, and has an opening width narrower than an opening width of the second concave pattern. The method can include processing the substrate using the second mask layer as a mask.
    Type: Grant
    Filed: August 27, 2013
    Date of Patent: July 21, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Manabu Takakuwa, Masaki Hirano
  • Publication number: 20150170922
    Abstract: According to one embodiment, an imprint method is provided. In the imprint method, minute objects adhering to a shot of a substrate, on which imprinting is next performed, are removed after delivering the substrate to the interior of an imprint apparatus and before dropping a resist onto the substrate. Thereafter, a resist is dropped onto the shot. Further, a template that is an original plate having a concave-convex pattern is brought into contact with the resist to form a resist pattern on the substrate according to the concave-convex pattern.
    Type: Application
    Filed: February 28, 2014
    Publication date: June 18, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventor: MANABU TAKAKUWA
  • Patent number: 8953163
    Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: February 10, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Kasa, Manabu Takakuwa, Yosuke Okamoto, Masamichi Kishimoto