Patents by Inventor Marcel Koenraad Marie Baggen
Marcel Koenraad Marie Baggen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230152717Abstract: An interface plate for mounting an apparatus or an assembly of an apparatus to a floor or floor plate is described, the interface plate comprising: an install block having an install surface configured to receive an interface surface of the apparatus or assembly; an adjustment mechanism configured to adjust a position or orientation of the install block relative to the floor or floor plate; and a mounting mechanism configured to rigidly mount the install block to the floor or floor plate.Type: ApplicationFiled: March 24, 2021Publication date: May 18, 2023Applicant: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie BAGGEN, Jasper Hendrik GRASMAN, Chin-Fa TU, Lucas KUINDERSMA
-
Patent number: 11621142Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.Type: GrantFiled: August 12, 2020Date of Patent: April 4, 2023Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Peter Paul Hempenius, Maarten Frans Janus Kremers, Robertus Jacobus Theodorus Van Kempen, Sven Antoin Johan Hol, Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Niels Johannes Maria Bosch, Maarten Hartger Kimman
-
Patent number: 11476077Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.Type: GrantFiled: April 3, 2020Date of Patent: October 18, 2022Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Wouter Onno Pril, Engelbertus Antonius Fransiscus Van Der Pasch
-
Patent number: 11315752Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: GrantFiled: December 10, 2020Date of Patent: April 26, 2022Assignee: ASML Netherlands B.V.Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
-
Patent number: 11302512Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.Type: GrantFiled: March 4, 2020Date of Patent: April 12, 2022Assignee: ASML Netherlands B.V.Inventors: Marcel Koenraad Marie Baggen, Antonius Henricus Arends, Lucas Kuindersma, Johannes Hubertus Antonius Van De Rijdt, Peter Paul Hempenius, Robertus Jacobus Theodorus Van Kempen, Niels Johannes Maria Bosch, Henricus Martinus Johannes Van De Groes, Kuo-Feng Tseng, Hans Butler, Michael Johannes Christiaan Ronde
-
Publication number: 20210151282Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: ApplicationFiled: December 10, 2020Publication date: May 20, 2021Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
-
Patent number: 10867770Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: GrantFiled: May 2, 2019Date of Patent: December 15, 2020Assignee: ASML Netherlands B.V.Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
-
Publication number: 20200373118Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.Type: ApplicationFiled: August 12, 2020Publication date: November 26, 2020Inventors: Marcel Koenraad Marie BAGGEN, Peter Paul HEMPENIUS, Maarten Frans Janus KREMERS, Robertus Jacobus Theodorus VAN KEMPEN, Sven Antoin Johan HOL, Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Niels Johannes Maria BOSCH, Maarten Hartger KIMMAN
-
Patent number: 10809634Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.Type: GrantFiled: March 14, 2018Date of Patent: October 20, 2020Assignee: ASML Netherlands B.V.Inventors: Peter Paul Hempenius, Marcel Koenraad Marie Baggen, Thomas Jan De Hoog, Sinar Juliana, Henricus Martinus Johannes Van De Groes
-
Publication number: 20200234911Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.Type: ApplicationFiled: April 3, 2020Publication date: July 23, 2020Inventors: Marcel Koenraad Marie BAGGEN, Wouter Onno PRIL, Engelbertus Antonius Fransiscus VAN DER PASCH
-
Publication number: 20200203118Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.Type: ApplicationFiled: March 4, 2020Publication date: June 25, 2020Inventors: Marcel Koenraad Marie BAGGEN, Antonius Henricus ARENDS, Lucas KUINDERSMA, Johannes Hubertus, Antonius VAN DE RIJDT, Peter Paul HEMPENIUS, Robertus Jacobus, Theodorus VAN KEMPEN, Niels Johannes, Maria BOSCH, Henricus Martinus, Johannes VAN DE GROES, Kuo-Feng TSENG, Hans BUTLER, Michael Johannes, Christiaan RONDE
-
Publication number: 20190341224Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.Type: ApplicationFiled: May 2, 2019Publication date: November 7, 2019Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
-
Patent number: 10191393Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: GrantFiled: February 22, 2016Date of Patent: January 29, 2019Assignee: ASML Netherlands B.V.Inventors: Jan Steven Christiaan Westerlaken, Marcel Koenraad Marie Baggen, Fransiscus Mathijs Jacobs, Jeroen Arnoldus Leonardus Johannes Raaymakers, Frank Pieter Albert Van Den Berkmortel, Marc Wilhelmus Maria Van Der Wijst
-
Publication number: 20180267410Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.Type: ApplicationFiled: March 14, 2018Publication date: September 20, 2018Applicant: ASML Netherlands B.V.Inventors: Peter Paul HEMPENIUS, Marcel Koenraad Marie BAGGEN, Thomas Jan DE HOOG, Sinar JULIANA, Henricus Martinus Johannes VAN DE GROES
-
Publication number: 20180059555Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.Type: ApplicationFiled: February 22, 2016Publication date: March 1, 2018Applicant: ASML Netherlands B.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Marcel Koenraad Marie BAGGEN, Fransiscus Mathijs JACOBS, Jeroen Arnoldus Leonardus Johannes RAAYMAKERS, Frank Pieter Albert VAN DEN BERKMORTEL, Marc Wilhelmus Maria VAN DER WIJST
-
Patent number: 9097990Abstract: A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.Type: GrantFiled: February 23, 2012Date of Patent: August 4, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Jan-Gerard Cornelis Van Der Toorn, Marcel Koenraad Marie Baggen, Stefan Geerte Kruijswijk, Jeroen Pieter Starreveld, Michael Johannes Vervoordeldonk, Mark Constant Johannes Baggen
-
Patent number: 8368868Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: GrantFiled: November 30, 2009Date of Patent: February 5, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
-
Publication number: 20120242271Abstract: A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.Type: ApplicationFiled: February 23, 2012Publication date: September 27, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Jan-Gerard Cornelis VAN DER TOORN, Marcel Koenraad Marie BAGGEN, Stefan Geerte KRUIJSWIJK, Jeroen Pieter STARREVELD, Michael Johannes Vervoordeldonk, Mark Constant Johannes BAGGEN
-
Patent number: 7884919Abstract: A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.Type: GrantFiled: February 9, 2006Date of Patent: February 8, 2011Assignee: ASML Netherlands B.V.Inventors: Peter Hempenius, Marcel Koenraad Marie Baggen, Dirk-Jan Bijvoet, Sjoerd Nicolaas Lambertus Donders, Youssef Karel Maria De Vos
-
Patent number: 7830495Abstract: A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.Type: GrantFiled: July 10, 2007Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Olaf Hubertus Wilhelmus Van Bruggen, Marcel Koenraad Marie Baggen, Johannes Roland Dassel, Remko Wakker, Stoyan Nihtianov, Frank Auer, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Tom Van Zutphen