Patents by Inventor Marcus Gerhardus Hendrikus Meijerink

Marcus Gerhardus Hendrikus Meijerink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8717535
    Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: May 6, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
  • Patent number: 8585224
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: February 10, 2013
    Date of Patent: November 19, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands b.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Patent number: 8382301
    Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: February 26, 2013
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Stephan Muellender, Thomas Stein, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Dieter Kraus, Richard Versluis, Marcus Gerhardus Hendrikus Meijerink
  • Patent number: 7826037
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: November 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi André Maria Schreel, Cornelis Cornelia De Bruijn
  • Patent number: 7714986
    Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: May 11, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
  • Patent number: 7671347
    Abstract: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: March 2, 2010
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Dirk Heinrich Ehm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Marcus Gerhardus Hendrikus Meijerink, Thomas Stein
  • Publication number: 20090244506
    Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
    Type: Application
    Filed: December 22, 2008
    Publication date: October 1, 2009
    Applicant: ASML Netherlands B.V
    Inventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
  • Publication number: 20090231707
    Abstract: An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).
    Type: Application
    Filed: March 12, 2009
    Publication date: September 17, 2009
    Applicants: Carl Zeiss SMT AG, AMSL NETHERLANDS B.V.
    Inventors: Dirk Heinrich EHM, Stephan MUELLENDER, Thomas STEIN, Johannes Hubertus Josephina MOORS, Bastiaan Theodoor WOLSCHRIJN, Dieter KRAUS, Richard VERSLUIS, Marcus Gerhardus Hendrikus MEIJERINK
  • Publication number: 20080291417
    Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
    Type: Application
    Filed: May 24, 2007
    Publication date: November 27, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
  • Publication number: 20080111981
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Application
    Filed: August 30, 2007
    Publication date: May 15, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Huibert VISSER, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi Andre Maria Schreel, Cornelis Cornelia De Bruijn
  • Publication number: 20080083878
    Abstract: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.
    Type: Application
    Filed: October 10, 2006
    Publication date: April 10, 2008
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Dirk Heinrich Ehm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Marcus Gerhardus Hendrikus Meijerink, Thomas Stein