Patents by Inventor Mari Kato

Mari Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6439973
    Abstract: An end face polishing apparatus in which whereas a jig board mounted with a rod-like member is supported by an apparatus main body by a supporting mechanism, a polishing board mounted with a polishing member for polishing the rod-like member is supported by the apparatus main body rotatably and pivotably by a drive mechanism for polishing the rod-like member mounted to the jig board by the supporting mechanism by pressing the rod-like member to the rotating and pivoting polishing board, wherein the polishing member is mounted to the polishing board attachably thereto and detachably therefrom, further comprising an automatic interchanging device for interchanging the polishing member which is mounted to the polishing board and which has been used with the polishing member which is stored at a predetermined position and which is to be used by which the operational performance is promoted.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: August 27, 2002
    Assignee: Seiko Instruments Inc.
    Inventors: Mari Kato, Kouji Minami, Masaharu Sugiyama
  • Publication number: 20010041512
    Abstract: An end face polishing apparatus in which whereas a jig board mounted with a rod-like member is supported by an apparatus main body by a supporting mechanism, a polishing board mounted with a polishing member for polishing the rod-like member is supported by the apparatus main body rotatably and pivotably by a drive mechanism for polishing the rod-like member mounted to the jig board by the supporting mechanism by pressing the rod-like member to the rotating and pivoting polishing board, wherein the polishing member is mounted to the polishing board attachably thereto and detachably therefrom, further comprising an automatic interchanging device for interchanging the polishing member which is mounted to the polishing board and which has been used with the polishing member which is stored at a predetermined position and which is to be used by which the operational performance is promoted.
    Type: Application
    Filed: July 12, 2001
    Publication date: November 15, 2001
    Inventors: Mari Kato, Kouji Minami, Masaharu Sugiyama
  • Patent number: 6302773
    Abstract: An end face polishing apparatus comprises a polishing board and a jig board for supporting workpieces. A polishing member is detachably arranged on the polishing board and has a polishing film for polishing end faces of the workpieces while the workpieces are supported by the jig board. A first holding device holdings unused polishing members each having a new polishing film preliminarily attached thereto. At least one second holding device holds used polishing members which have been removed from the polishing board. A polishing member exchanging device is mounted for linear movement in horizontal and vertical directions for exchanging a used polishing member arranged on the polishing board with an unused polishing member by seizing the used polishing member from the polishing board and conveying the used polishing member to the second holding device, and by taking an unused polishing member from the first holding device and placing the unused polishing member on the polishing board.
    Type: Grant
    Filed: July 26, 1999
    Date of Patent: October 16, 2001
    Assignee: Seiko Instruments Inc.
    Inventors: Mari Kato, Kouji Minami, Masaharu Sugiyama
  • Patent number: 6280293
    Abstract: An end face polishing apparatus comprises a jig plate for supporting a workpiece, a polishing member for polishing an end face of the workpiece, and a movable lever connected to the jig plate. A pressurizing section presses the lever to bring the end face of the workpiece into pressure contact with the polishing member. The pressurizing section has a first spring member for biasing the lever in a first direction, a pressurizing head for biasing the lever in a second direction opposite to the first direction, a second spring member for biasing the pressurizing head in the second direction, and a pressure sensor disposed between the pressurizing head and the lever for detecting a pressure applied by the end face of the ferrule onto the polishing member when the lever is pressed by the pressurizing section. A pressurization control section controls the pressure applied by the end face of the workpiece onto the polishing member when the lever is pressed by the pressurizing section.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: August 28, 2001
    Assignee: Seiko Instruments Inc.
    Inventors: Kouji Minami, Mari Kato, Masaharu Sugiyama
  • Patent number: 4673476
    Abstract: An antireflective film (7, 8) for photoelectric devices comprises at least a layer having a refractive index being the largest on the side abutting on the light receiving surface (2a) or the light emitting surface of a photoelectric device and continuously decreasing according to the distance outward from said side.
    Type: Grant
    Filed: October 21, 1986
    Date of Patent: June 16, 1987
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kotaro Mitsui, Mari Kato, Takao Oda, Susumu Yoshida
  • Patent number: 4649088
    Abstract: An antireflective film (7, 8) for photoelectric devices comprises at least a layer having a refractive index being the largest on the side abutting on the light receiving surface (2a) or the light emitting surface of a photoelectric device and continuously decreasing according to the distance outward from said side.
    Type: Grant
    Filed: February 22, 1985
    Date of Patent: March 10, 1987
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kotaro Mitsui, Mari Kato, Takao Oda, Susumu Yoshida
  • Patent number: 4215356
    Abstract: An N.sup.- semiconductor layer is epitaxially grown on an N.sup.+ semiconductor substrate serving as a drain region and overlaid with an N type epitaxial layer. Two opposite P.sup.+ gate regions are disposed in the surface portion of the N layer to define a channel region between them, and an N.sup.+ source region is located above the channel region. That portion of the N layer located between each gate region and the N.sup.- layer has a thickness not smaller than one-half of the channel width of the channel region.
    Type: Grant
    Filed: April 19, 1978
    Date of Patent: July 29, 1980
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Mari Kato