Patents by Inventor Marie Angelopoulos

Marie Angelopoulos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11237713
    Abstract: A mechanism is provided in a data processing system to implement a feature extraction tool for graphical user interface based feature extraction. The feature extraction tool receives selection by a user of a dataset from which features are to be extracted. The feature extraction tool loads a plurality of feature definitions. The feature extraction tool generates a graphical user interface that allows the user to add features from the plurality of features to a feature file. The feature extraction tool presents the graphical user interface to the user and receives user selection of at least one feature to be added to the feature file. The feature extraction tool generates the feature file based on the user selection of the at least one feature.
    Type: Grant
    Filed: January 21, 2019
    Date of Patent: February 1, 2022
    Assignee: International Business Machines Corporation
    Inventors: Leemor M. Yuravlivker, Vijay K. Naik, Balaji Krishnapuram, Faisal Farooq, Marie Angelopoulos, Michal Ozery-Flato, Shilpa N. Mahatma, Brendan Shea
  • Patent number: 11163836
    Abstract: Methods and systems are provided to extract information within complex documents, and the extracted information may be compared to identify differences between complex documents or the extracted information may be analyzed with respect to the individual document. Information is extracted from complex documents comprising unstructured data to create a structured data repository, or analytics knowledge base. This database may be utilized to compare concepts that are common to one or more documents, allowing ease of comparison of documents, and identification of information that is different or identification of (same or similar) information that is presented differently in a set of complex documents.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: November 2, 2021
    Assignee: International Business Machines Corporation
    Inventors: Ritwik Ray, Marie Angelopoulos, Frederick Roberts, Christopher Gagen, Maria Gabrani
  • Patent number: 11163837
    Abstract: Methods and systems are provided to extract information within complex documents, and the extracted information may be compared to identify differences between complex documents or the extracted information may be analyzed with respect to the individual document. Information is extracted from complex documents comprising unstructured data to create a structured data repository, or analytics knowledge base. This database may be utilized to compare concepts that are common to one or more documents, allowing ease of comparison of documents, and identification of information that is different or identification of (same or similar) information that is presented differently in a set of complex documents.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: November 2, 2021
    Assignee: International Business Machines Corporation
    Inventors: Ritwik Ray, Marie Angelopoulos, Frederick Roberts, Christopher Gagen, Maria Gabrani
  • Patent number: 11132920
    Abstract: A system provides an intervention for a user and comprises at least one processor. The system monitors behavior and context of a user to generate a behavior history. One or more models are utilized to determine an intervention for the user to induce a behavior modification, wherein the one or more models map interventions to user context and behavior and utilize the behavior history to determine an effective intervention for the user. The intervention is provided to the user and feedback is received in response to the intervention. The one or more models are updated based on the feedback. Embodiments of the present invention further include a method and computer program product for providing an intervention to a user in substantially the same manner described above.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: September 28, 2021
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Shahram Ebadollahi, Stewart T. Sill, Michal Rosen-Zvi, Ching-Hua Chen, James V. Codella, Si Sun
  • Publication number: 20200233571
    Abstract: A mechanism is provided in a data processing system to implement a feature extraction tool for graphical user interface based feature extraction. The feature extraction tool receives selection by a user of a dataset from which features are to be extracted. The feature extraction tool loads a plurality of feature definitions. The feature extraction tool generates a graphical user interface that allows the user to add features from the plurality of features to a feature file. The feature extraction tool presents the graphical user interface to the user and receives user selection of at least one feature to be added to the feature file. The feature extraction tool generates the feature file based on the user selection of the at least one feature.
    Type: Application
    Filed: January 21, 2019
    Publication date: July 23, 2020
    Inventors: Leemor M. Yuravlivker, Vijay K. Naik, Balaji Krishnapuram, Faisel Farooq, Marie Angelopoulos, Michal Ozery-Flato, Shilpa N. Mahatma, Brendan Shea
  • Publication number: 20190303412
    Abstract: Methods and systems are provided to extract information within complex documents, and the extracted information may be compared to identify differences between complex documents or the extracted information may be analyzed with respect to the individual document. Information is extracted from complex documents comprising unstructured data to create a structured data repository, or analytics knowledge base. This database may be utilized to compare concepts that are common to one or more documents, allowing ease of comparison of documents, and identification of information that is different or identification of (same or similar) information that is presented differently in a set of complex documents.
    Type: Application
    Filed: June 18, 2019
    Publication date: October 3, 2019
    Inventors: Ritwik Ray, Marie Angelopoulos, Frederick Roberts, Christopher Gagen, Maria Gabrani
  • Publication number: 20190251182
    Abstract: Methods and systems are provided to extract information within complex documents, and the extracted information may be compared to identify differences between complex documents or the extracted information may be analyzed with respect to the individual document. Information is extracted from complex documents comprising unstructured data to create a structured data repository, or analytics knowledge base. This database may be utilized to compare concepts that are common to one or more documents, allowing ease of comparison of documents, and identification of information that is different or identification of (same or similar) information that is presented differently in a set of complex documents.
    Type: Application
    Filed: February 12, 2018
    Publication date: August 15, 2019
    Inventors: Ritwik Ray, Marie Angelopoulos, Frederick Roberts, Christopher Gagen, Maria Gabrani
  • Publication number: 20190189025
    Abstract: A system provides an intervention for a user and comprises at least one processor. The system monitors behavior and context of a user to generate a behavior history. One or more models are utilized to determine an intervention for the user to induce a behavior modification, wherein the one or more models map interventions to user context and behavior and utilize the behavior history to determine an effective intervention for the user. The intervention is provided to the user and feedback is received in response to the intervention. The one or more models are updated based on the feedback. Embodiments of the present invention further include a method and computer program product for providing an intervention to a user in substantially the same manner described above.
    Type: Application
    Filed: December 20, 2017
    Publication date: June 20, 2019
    Inventors: Marie Angelopoulos, Shahram Ebadollahi, Stewart T. Sill, Michal Rosen-Zvi, Ching-Hua Chen, James V. Codella, Si Sun
  • Patent number: 8609322
    Abstract: A lithographic structure comprising: an organic antireflective material disposed on a substrate, and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: December 17, 2013
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle, Arpan P. Mahorowala, Dirk Pfeiffer
  • Publication number: 20130017486
    Abstract: A lithographic structure comprising: an organic antireflective material disposed on a substrate, and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 17, 2013
    Applicant: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle, Arpan P. Mahorowala, Dirk Pfeiffer
  • Patent number: 8293454
    Abstract: A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or 157 nm radiation. In combination, the organic antireflective material and the silicon antireflective material provide an antireflective material suitable for deep ultraviolet lithography. The invention is also directed to a process of making the lithographic structure.
    Type: Grant
    Filed: November 18, 2008
    Date of Patent: October 23, 2012
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle, Arpan P. Mahorowala, Dirk Pfeiffer
  • Patent number: 8198396
    Abstract: Methods of forming materials containing precursors to electrically conductive polymers and electrically conductive polymers are described which have a high degree of crystallinity. The high degree of crystallinity is achieved by preparing the materials under conditions which provide a high degree of mobility to the polymer molecules permitting them to associate with one another to form a crystalline state. High levels of electrical conductivity are achieved in in the electrically conductive materials without stretch orienting the material. The enhanced electrical conductivity is isotropic as compared to a stretch oriented film which has isotropic electrical conductivity. In the preferred embodiment, additives are added to a solution containing a solvent and the precursor or electrically conductive polymer. The additives are preferably plasticizer of diluents. As the solvent is removed the material dries and contains a higher degree of crystallinity than in the absence of the additive.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: June 12, 2012
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Yun-Hsin Liao, Ravi F. Saraf
  • Patent number: 7968270
    Abstract: A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the group consisting of Si, Ge, B, Sn, Fe and Ti, and wherein X is not present or is one or more elements selected from the group consisting of O, N, S and F; and a photoresist material disposed on the RCHX material. The invention is also directed to methods of making the lithographic structure, and using the structure to pattern a substrate.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: June 28, 2011
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor, Scott D. Halle, Arpan P. Mahorowala, Dirk Pfeiffer
  • Patent number: 7960095
    Abstract: Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
    Type: Grant
    Filed: February 11, 2004
    Date of Patent: June 14, 2011
    Assignee: International Business Machines Corporation
    Inventors: Wayne M. Moreau, Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Karen E. Petrillo
  • Patent number: 7901977
    Abstract: Electronic assemblies, especially one containing volatile memory, used a flexible membrane with conducting lines which acts as an intrusion sensor against chemical and mechanical attacks. The lines are fabricated from inherently conducting polymers which are solution processed and directly patterned. The material was applied to a flexible polymer film by spin coating and patterned by application of a resist, followed by exposure/development of the resist and transferring the image into the polyaniline by reactive ion etching techniques. The conducting lines have high conductivity, tranparency properties which made them difficult to detect and possess excellent adhesion to the substrate film, as well as to the potting material which enclosed the structure. They also offered lightweight advantages over conventionally filled materials. These materials can also be used in conjunction with conventional conductor materials to further enhance protection against intrusion by sophisticated mechanical means.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: March 8, 2011
    Inventors: Marie Angelopoulos, Teresita O. Graham, Sampath Purushothaman, Steve H. Weingart
  • Patent number: 7901864
    Abstract: A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid generator. Another radiation-senstive composition (and method of fabricating a device using the composition) includes a nonpolymerc silsesquioxane including at least one aqueous base soluble moiety, a polymer including an aqueous base soluble moiety, a crosslinker, and a radiation-sensitive acid generator.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: March 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Marie Angelopoulos, Timothy A. Brunner, Dirk Pfeiffer, Ratnam Sooriyakumaran
  • Patent number: 7902323
    Abstract: Methods of forming materials containing precursors to electrically conductive polymers and electrically conductive polymers are described which have a high degree of crystallinity. The high degree of crystallinity is achieved by preparing the materials under conditions which provide a high degree of mobility to the polymer molecules permitting them to associate with one another to form a crystalline state. High levels of electrical conductivity are achieved in in the electrically conductive materials without stretch orienting the material. The enhanced electrical conductivity is isotropic as compared to a stretch oriented film which has isotropic electrical conductivity. In the preferred embodiment, additives are added to a solution containing a solvent and the precursor or electrically conductive polymer. The additives are preferably plasticizer of diluents. As the solvent is removed the material dries and contains a higher degree of crystallinity than in the absence of the additive.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: March 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Yun-Hsin Liao, Ravi F. Saraf
  • Patent number: 7736833
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: June 15, 2010
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7709177
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: May 4, 2010
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7638266
    Abstract: A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: December 29, 2009
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Robert Neal Lang, Wenjie Li, David R. Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo