Patents by Inventor Marinus Johannes Maria Van Dam
Marinus Johannes Maria Van Dam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940739Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: December 27, 2021Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Patent number: 11549806Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.Type: GrantFiled: January 5, 2021Date of Patent: January 10, 2023Assignee: ASML Netherland B.V.Inventors: Marinus Johannes Maria Van Dam, Arie Jeffrey Den Boef, Nitesh Pandey
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Publication number: 20220299365Abstract: Disclosed is a wavelength selection module for a metrology apparatus. The wavelength selection module comprises one or more filter elements being operable to receive an input radiation beam comprising multiple wavelengths to provide selective control of a wavelength characteristic of a corresponding output radiation beam. At least one of said one or more filter elements comprises at least two linear variable filters.Type: ApplicationFiled: July 23, 2020Publication date: September 22, 2022Applicant: ASML Netherlands B.V.Inventors: Gerbrand VAN DER ZOUW, Marinus Johannes Maria VAN DAM, Jacob SONNEVELD, Ramon Pascal VAN GORKOM
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Patent number: 11262661Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: GrantFiled: June 5, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscus Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Johannes Raaymakers, Marinus Petrus Reijnders
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Publication number: 20210123724Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.Type: ApplicationFiled: January 5, 2021Publication date: April 29, 2021Applicant: ASML Netherlands B.V.Inventors: Marinus Johannes Maria VAN DAM, Arie Jeffrey Den Boef, Nitesh Pandey
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Patent number: 10895452Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.Type: GrantFiled: September 3, 2019Date of Patent: January 19, 2021Assignee: ASML Netherlands B.V.Inventors: Marinus Johannes Maria Van Dam, Arie Jeffrey Den Boef, Nitesh Pandey
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Patent number: 10809193Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.Type: GrantFiled: March 25, 2019Date of Patent: October 20, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Marinus Johannes Maria Van Dam, Richard Carl Zimmerman
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Patent number: 10775704Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302?, 304?) of both the first radiation and second radiation.Type: GrantFiled: July 29, 2019Date of Patent: September 15, 2020Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Marinus Johannes Maria Van Dam
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Publication number: 20200072599Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.Type: ApplicationFiled: September 3, 2019Publication date: March 5, 2020Applicant: ASML Netherlands B.V.Inventors: Marinus Johannes Maria VAN DAM, Arie Jeffrey DEN BOEF, Nitesh PANDEY
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Patent number: 10488765Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.Type: GrantFiled: September 27, 2018Date of Patent: November 26, 2019Assignee: ASML Netherlands B.V.Inventors: Johan Maria Van Boxmeer, Marinus Johannes Maria Van Dam, Koos Van Berkel, Sietse Thijmen Van Der Post, Johannes Hubertus Antonius Van De Rijdt
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Publication number: 20190346771Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302?, 304?) of both the first radiation and second radiation.Type: ApplicationFiled: July 29, 2019Publication date: November 14, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Marinus Johannes Maria VAN DAM
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Publication number: 20190310190Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.Type: ApplicationFiled: March 25, 2019Publication date: October 10, 2019Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Marinus Johannes Maria VAN DAM, Richard Carl Zimmerman
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Patent number: 10365565Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302?, 304?) of both the first radiation and second radiation.Type: GrantFiled: February 17, 2017Date of Patent: July 30, 2019Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Marinus Johannes Maria Van Dam
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Publication number: 20190107786Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.Type: ApplicationFiled: September 27, 2018Publication date: April 11, 2019Applicant: ASML Netherlands B.V.Inventors: Johan Maria VAN BOXMEER, Marinus Johannes Maria VAN DAM, Koos VAN BERKEL, Sietse Thijmen VAN DER POST, Johannes Hubertus Antonius VAN DE RIJDT
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Patent number: 9927711Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet (362) and the shield (820).Type: GrantFiled: December 2, 2014Date of Patent: March 27, 2018Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Andrea Lodovico Mancuso, Hendricus Johannes Maria Meijer, Erik Maria Rekkers, Marinus Johannes Maria Van Dam
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Patent number: 9785051Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.Type: GrantFiled: September 17, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom
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Publication number: 20170242343Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302?, 304?) of both the first radiation and second radiation.Type: ApplicationFiled: February 17, 2017Publication date: August 24, 2017Applicant: ASML Netherlands B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Marinus Johannes Maria VAN DAM
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Publication number: 20160313649Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields whilst also minimizing attraction between the permanent magnet (362) and the shield (820).Type: ApplicationFiled: December 2, 2014Publication date: October 27, 2016Applicant: ASML, Netherlands B.V.Inventors: Sven Antoin Johan HOL, Andrea Lodovico MANCUSO, Hendricus Johnnes, Maria MEIJER, Erik Maria REKKERS, Marinus Johannes Maria VAN DAM
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Publication number: 20150277233Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.Type: ApplicationFiled: September 17, 2013Publication date: October 1, 2015Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom