Patents by Inventor Mario J. Meissl

Mario J. Meissl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190196324
    Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.
    Type: Application
    Filed: December 26, 2017
    Publication date: June 27, 2019
    Inventors: Seth J. Bamesberger, Jeremy Sevier, Byung-Jin Choi, Philip D. Schumaker, Mario Johannes Meissl
  • Publication number: 20110221095
    Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
    Type: Application
    Filed: May 16, 2011
    Publication date: September 15, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
  • Publication number: 20110171340
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Application
    Filed: March 28, 2011
    Publication date: July 14, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20100291257
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Application
    Filed: July 19, 2010
    Publication date: November 18, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20100201042
    Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
    Type: Application
    Filed: April 19, 2010
    Publication date: August 12, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P.C. Watts, Mario J. Meissl
  • Patent number: 7727453
    Abstract: The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: June 1, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
  • Publication number: 20100040718
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
    Type: Application
    Filed: October 26, 2009
    Publication date: February 18, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Patent number: 7641840
    Abstract: The present invention is directed towards a method of expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
    Type: Grant
    Filed: May 17, 2007
    Date of Patent: January 5, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Mahadevan GanapathiSubramanian, Yeong-jun Choi, Mario J. Meissl
  • Patent number: 7635445
    Abstract: The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: December 22, 2009
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Anshuman Cherala, Yeong-jun Choi, Mario J. Meissl, Sidlgata V. Sreenivasan, Norman E. Schumaker, Xiaoming Lu, Ian M. McMackin, Daniel A. Babbs
  • Publication number: 20090004319
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1√ód<t<a/c2; wherein d is said first thickness, t is said second thickness, a is said third thickness, c1 has a value greater than 20, and c2 has a value greater than 350.
    Type: Application
    Filed: May 30, 2008
    Publication date: January 1, 2009
    Applicant: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Patent number: 7420654
    Abstract: The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly while facilitating movement of the actuator assembly with respect to the substrate to minimize reactive forces generated in response to the compressive forces being sensed by the chuck.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: September 2, 2008
    Assignee: Molecular Imprints, Inc.
    Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K. Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
  • Publication number: 20080160129
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Application
    Filed: May 4, 2007
    Publication date: July 3, 2008
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Douglas J. Resnick, Mario J. Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 7338275
    Abstract: The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: March 4, 2008
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung Jin Choi, Mario J. Meissl, Sidlagata V. Sreenivasan, Michael P. C. Watts
  • Patent number: 7298456
    Abstract: The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: November 20, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K. Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
  • Patent number: 7224443
    Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: May 29, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel A. Babbs, Mario J. Meissl, Hillman L. Bailey, Norman E. Schumaker
  • Patent number: 7170589
    Abstract: The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: January 30, 2007
    Assignee: Molecular Imprints, Inc.
    Inventors: Anshuman Cherala, Byung-Jin Choi, Pawan K Nimmakayala, Mario J. Meissl, Sidlgata V. Sreenivasan
  • Patent number: 7150622
    Abstract: The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: December 19, 2006
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan, Mario J. Meissl
  • Patent number: 7077992
    Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: July 18, 2006
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung J. Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario J. Meissl
  • Patent number: 7019819
    Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: March 28, 2006
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung J. Choi, Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael P. C. Watts, Daniel Babbs, Mario J. Meissl, Hillman Bailey, Norman E. Schumaker
  • Patent number: RE47483
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: July 2, 2019
    Assignees: Molecular Imprints, Inc., Canon Nanotechnologies, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan