Patents by Inventor Mario Johannes Meissl

Mario Johannes Meissl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8215946
    Abstract: System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: July 10, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Mario Johannes Meissl
  • Publication number: 20110260361
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: April 27, 2011
    Publication date: October 27, 2011
    Applicant: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 7943081
    Abstract: Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.
    Type: Grant
    Filed: April 19, 2010
    Date of Patent: May 17, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael P. C. Watts, Mario Johannes Meissl
  • Patent number: 7874831
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: January 25, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Publication number: 20110001954
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Application
    Filed: July 1, 2010
    Publication date: January 6, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Publication number: 20100102469
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: October 23, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20100072652
    Abstract: System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
    Type: Application
    Filed: October 20, 2009
    Publication date: March 25, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Mahadevan GanapathiSubramanian, Byung-Jin Choi, Mario Johannes Meissl