Abstract: Light-stabilized polymer microparticles, which contain at least one light stabilizer and free epoxy groups, and processes for the preparation of these microparticles by polymerization of suitable monomers, at least one of these monomers being an epoxide which contains at least one further reactive group, and at least part of the polymerization being carried out in the presence of at least one light stabilizer, are described. The polymer microparticles can be used in coating compositions which comprise a disperse phase, containing these particles, and a liquid continuous phase.Coatings and paints based on the compositions according to the invention are distinguished by improved weathering resistance, in particular high light stability.

Abstract: Compounds of the formula I ##STR1## is hydrogen, chlorine, lower alkyl or lower alkoxy, R.sup.2 is hydrogen or alkyl, R.sup.3 is lower alkenoyl, X and Y are independently --O-- or --NH--, m is 0, 1 or 2 and n is 0 or 1, are suitable as copolymerisable UV stabilizers for polymers obtainable from ethylenically unsaturated monomers. The compounds of the formula I are readily obtainable, and are particularly valuable as UV absorbers by virtue of their good solubility in copolymerisable monomers.

Abstract: Light-stabilized star polymer microparticles are described which are prepared with particular advantage by group transfer polymerization. The light stabilization is effected by carrying out at least a part step of the polymerization in the presence of a light stabilizer, for example a hindered amine or/and a UV absorber. With particular advantage, those light stabilizers are used which contain reactive groups in the molecule and, in this way, can be chemically incorporated into the polymer. The polymer microparticles show excellent light stability and are outstandingly suitable as constituents in coating compositions which can be processed, for example, to give coating films of high light stability.

Abstract: The novel UV-absorbers are compounds of the formula ##STR1## in which R.sup.1 is, for example, hydrogen, n is one of the numbers 1 or 2 and R.sup.2 is an appropriate monovalent or divalent radical, for example --OH or --O--CH.sub.2 CH.sub.2 --O--. The UV-absorbers are used in particular for stabilising and improving lacquers and photographic material.

Abstract: Aromatic ketones or .alpha.-diketones can be prepared from the corresponding carbinols by reaction with molar amounts of a sulfonyl chloride in the presence of a base. The corresponding sulfinic acid or salt thereof with the base is formed simultaneously.

Abstract: Sterically hindered cyclic amines which are substituted by a photoactivatable acyl group at the basic nitrogen atom can be deacylated by irradiation with UV light. This is advantageous if the basicity of the amines proves troublesome during application. Examples of such photoactivatable acyl groups are phenylglyoxyl, phenylacetyl or naphthylacetyl groups.

Abstract: Compounds of the formula I ##STR1## wherein R.sup.1 is hydrogen, chlorine, lower alkyl or lower alkoxy, R.sup.2 is hydrogen or alkyl, R.sup.3 is lower alkenoyl, X and Y are independently --O-- or --NH--, m is 0, 1 or 2 and n is 0 or 1, are suitable as copolymerizable UV stabilizers for polymers obtainable from ethylenically unsaturated monomers. The compounds of the formula I are readily obtainable, and are particularly valuable as UV absorbers by virtue of their good solubility in copolymerizable monomers.

Abstract: Blocked benzotriazoles of the formula I or II ##STR1## where x is 1 or 2, R.sup.1 in the case of x=1 and in the formula II is an acyl group of the formula --CO--R.sup.5, a sulfonyl group of the formula --SO.sub.2 --R.sup.6, a phosphoryl group of the formula --P(O).sub.r (R.sup.14)(R.sup.15), and in the case of x=2 is --CO-- or a diacyl group of the formula --CO--CO-- or --CO--R.sup.7 --CO--, and R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.14 and R.sup.15 have the meanings defined in claim 1, are crypto light stabilizers which can be activated by short-wave irradiation. Their use in coating materials is of interest in cases in which light stabilizers containing the free OH compounds have disadvantages with regard to their application.

Abstract: Polyalkylpiperidinesulfonic acid esters of the formulae I and IIB--X--O--SO.sub.2 --A).sub.m (I)(B'--X--O--SO.sub.2).sub.2 A' (II),in which A, A', B, B', X and m are as defined in claim 1, the polyalkylpiperidine group being present in each of the substituents B and B'. These esters are suitable for use as curing catalysts for acid-curable resins and act therein, at the same time, as light stabilizers.

Abstract: Compounds which contain, in their molecule, at least one 2-(2'-hydroxyphenyl)-benztriazole group or one 2-hydroxybenzophenone group and at least one polyalkylpiperidine group are effective light stabilizers for organic materials, in particular for polymers. The use of the compounds as light stabilizers for lacquers is of particular importance.

Abstract: Compounds which contain, in their molecule, at least one 2-(2'-hydroxyphenyl)-benztriazole group or one 2-hydroxybenzophenone group and at least one polyalkylpiperidine group are effective light stabilizers for organic materials, in particular for polymers. The use of the compounds as light stabilizers for lacquers is of particular importance.

Abstract: Compounds of the formula ##STR1## and their acid addition salts, wherein n is an integer from 1 to 4, R.sup.1 is hydrogen or CH.sub.3, each of R.sup.2 and R.sup.3 independently is hydrogen, C.sub.1 -C.sub.18 alkyl, C.sub.6 -C.sub.10 aryl or C.sub.7 -C.sub.9 aralkyl which is unsubsititued or substituted by chlorine or C.sub.1 -C.sub.4 alkyl, or R.sup.2 and R.sup.3 together with the carbon atom to which they are attached form a cycloalkane or alkylcycloalkane radical containing 5 to 20 carbon atoms or a polyalkylpiperidine radical, R.sup.4 is a monovalent radical as defined in claim 1, and R.sup.5 is a mono- to tetravalent radical as defined in claim 1. These compounds are valuable stabilizers for plastics. They are obtained by N-substitution of the compounds in which R.sup.4 and R.sup.5 are hydrogen.