Patents by Inventor Marius Ravensbergen

Marius Ravensbergen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8537330
    Abstract: In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.
    Type: Grant
    Filed: January 11, 2011
    Date of Patent: September 17, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Marius Ravensbergen, Franciscus Johannes Joseph Janssen
  • Patent number: 8089672
    Abstract: A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: January 3, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Heine Melle Mulder, Marius Ravensbergen, Wilfred Edward Endendijk, Jozef Ferdinand Dymphna Verbeeck
  • Patent number: 8052289
    Abstract: A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
    Type: Grant
    Filed: June 7, 2006
    Date of Patent: November 8, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marius Ravensbergen, Heine Melle Mulder
  • Patent number: 7999914
    Abstract: A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: August 16, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Marc Wilhelmus Maria Van Der Wijst, Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Marius Ravensbergen
  • Publication number: 20110176121
    Abstract: In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.
    Type: Application
    Filed: January 11, 2011
    Publication date: July 21, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Marius RAVENSBERGEN, Franciscus Johannes Joseph JANSSEN
  • Patent number: 7800079
    Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: September 21, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Levinus Pieter Bakker, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Yurii Victorvitch Sidelnikov, Marcel Mathijs Theodore Marie Dierichs, Marius Ravensbergen
  • Publication number: 20090190197
    Abstract: A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven.
    Type: Application
    Filed: December 19, 2008
    Publication date: July 30, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patricius Aloysius Jacobus Tinnemans, Heine Melle Mulder, Marius Ravensbergen, Wilfred Edward Endendijk, Jozef Ferdinand Dymphna Verbeeck
  • Patent number: 7525640
    Abstract: A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
    Type: Grant
    Filed: November 7, 2006
    Date of Patent: April 28, 2009
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Bastiaan Stephanus Hendricus Jansen, Erik Roelof Loopstra, Marius Ravensbergen, Markus Josef Hauf
  • Patent number: 7436484
    Abstract: A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: October 14, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Marc Wilhelmus Maria Van Der Wijst, Dominicus Jacobus Petrus Adrianus Franken, Erik Roelof Loopstra, Marius Ravensbergen
  • Publication number: 20080218722
    Abstract: A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
    Type: Application
    Filed: April 24, 2008
    Publication date: September 11, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marc Wilhelmus Maria VAN DER WIJST, Dominicus Jacobus Petrus Adrianus FRANKEN, Erik Roelof LOOPSTRA, Marius RAVENSBERGEN
  • Patent number: 7423721
    Abstract: A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: September 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Antonius Johannes Josephus Van Dijsseldonk, Mustafa Amhaouch, Wilhelmus Josephus Box, Johannes Henricus Wilhelmus Jacobs, Hernes Jacobs, Marius Ravensbergen, Martinus Arnoldus Henricus Terken, Robert Gordon Livesey, Franciscus Catharina Bernardus Marinus Van Vroonhoven
  • Publication number: 20080123066
    Abstract: A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
    Type: Application
    Filed: November 7, 2006
    Publication date: May 29, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bastiaan Stephanus Hendricus Jansen, Erik Roelof Loopstra, Marius Ravensbergen, Markus Josef Hauf
  • Patent number: 7375353
    Abstract: An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.
    Type: Grant
    Filed: September 13, 2005
    Date of Patent: May 20, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrik Antony Johannes Neerhof, Hako Botma, Marius Ravensbergen
  • Publication number: 20070285638
    Abstract: A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.
    Type: Application
    Filed: June 7, 2006
    Publication date: December 13, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Marius Ravensbergen, Heine Melle Mulder
  • Publication number: 20070170376
    Abstract: An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device may be provided to adjust the members in such a manner as to control attenuation of a radiation beam projected onto a target portion of a substrate across the cross-section of the radiation beam.
    Type: Application
    Filed: November 2, 2006
    Publication date: July 26, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hendrik Neerhof, Hako Botma, Marius Ravensbergen, Gerardus Baas
  • Publication number: 20070057201
    Abstract: An attenuation adjustment device is disposed in a radiation system of a lithography device and includes a plurality of members for casting penumbras in the radiation beam illuminating the patterning device. Furthermore an attenuation control device is provided for adjusting the members in such a manner as to control the attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross-section of the patterned radiation beam. The attenuation control device incorporates a detector for providing an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the angle detector after attenuation by the member.
    Type: Application
    Filed: September 13, 2005
    Publication date: March 15, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Hendrik Neerhof, Hako Botma, Marius Ravensbergen
  • Publication number: 20060139585
    Abstract: A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
    Type: Application
    Filed: December 28, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marc Maria Van Der Wijst, Dominicus Jacobus Franken, Erik Loopstra, Marius Ravensbergen
  • Publication number: 20060126041
    Abstract: A vacuum operated lithographic apparatus is disclosed. The apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
    Type: Application
    Filed: December 15, 2004
    Publication date: June 15, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Antonius Van Dijsseldonk, Mustafa Amhaouch, Wilhelmus Box, Johannes Jacobs, Hernes Jacobs, Marius Ravensbergen, Martinus Arnoldus Terken, Robert Livesey, Franciscus Catharina Van Vroonhoven
  • Publication number: 20050133727
    Abstract: An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.
    Type: Application
    Filed: December 22, 2003
    Publication date: June 23, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Levinus Bakker, Johannes Hubertus Moors, Lucas Henricus Johannes Stevens, Yurii Sidelnikov, Marcel Mathijs Dierichs, Marius Ravensbergen
  • Patent number: 6819400
    Abstract: A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.
    Type: Grant
    Filed: March 13, 2003
    Date of Patent: November 16, 2004
    Assignee: ASMl Netherlands B.V.
    Inventor: Marius Ravensbergen