Patents by Inventor Mark-Jan SPIJKMAN

Mark-Jan SPIJKMAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230417628
    Abstract: A measurement system (11), the measurement system comprising: a sensor apparatus (22); an illumination system (IL1) arranged to illuminate the sensor apparatus with radiation, the sensor apparatus comprising a patterned region arranged to receive a radiation beam and to form a plurality of diffraction beams, the diffraction beams being separated in a shearing direction; the sensor apparatus comprising a radiation detector (24); wherein the patterned region is arranged such that at least some of the diffraction beams form interference patterns on the radiation detector; wherein the sensor apparatus comprises a plurality of patterned regions (19a-19c, 20a, 20b), and wherein pitches of the patterned regions are different in adjacent patterned regions.
    Type: Application
    Filed: October 5, 2021
    Publication date: December 28, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Achim WOESSNER, Roberto PAGANO, Mark-Jan SPIJKMAN