Patents by Inventor Mark L. Doerre

Mark L. Doerre has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7438392
    Abstract: A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: October 21, 2008
    Assignee: Lexmark International, Inc.
    Inventors: Karthik Vaideeswaran, Andrew L. McNees, John W. Krawczyk, James M. Mrvos, Mark L. Doerre, Jason T. Vanderpool, Girish S. Patil, Richard L. Warner
  • Patent number: 7041226
    Abstract: A method for improving fluidic flow for a microfluidic device having a through hole or slot therein. The method includes the steps of forming one or more openings through at least part of a thickness of a substrate from a first surface to an opposite second surface using a reactive ion etching process whereby an etch stop layer is applied to side wall surfaces in the one or more openings during alternating etching and passivating steps as the openings are etched through at least a portion of the substrate. Substantially all of the etch stop layer coating is removed from the side wall surfaces by treating the side wall surfaces using a method selected from chemical treatment and mechanical treatment, whereby a surface energy of the treated side wall surfaces is increased relative to a surface energy of the side wall surfaces containing the etch stop layer coating.
    Type: Grant
    Filed: November 4, 2003
    Date of Patent: May 9, 2006
    Assignee: Lexmark International, Inc.
    Inventors: Karthik Vaideeswaran, Andrew L. McNees, John W. Krawczyk, James M. Mrvos, Cory N. Hammond, Mark L. Doerre, Jason T. Vanderpool, Girish S. Patil, Christopher J. Money, Gary R. Williams, Richard L. Warner
  • Patent number: 5344424
    Abstract: A retractable, disposable surgical knife that includes a hollow sheath and a blade assembly received for sliding movement within the hollow sheath. The blade assembly includes a slide block and a knife blade held by the slide block. A mechanism including a cooperating resilient actuator and guide track allows the blade assembly to be selectively secured in a first, retracted position wherein the blade is withdrawn into the sheath and a second, extended position wherein the blade extends from the sheath for use. A separate mechanism is provided for permanently locking the blade assembly in a third, fully retracted position wherein blade is fully withdrawn within the sheath to prevent inadvertent sticks. The permanent locking mechanism is fully concealed within the sheath so as to prevent inadvertent engagement with an object and possible release from the permanently locked position.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: September 6, 1994
    Inventors: Philip L. Roberts, Mark L. Doerre