Abstract: Polymeric substrate are coated by a process comprising pretreating the polymeric substrate by at least one physical method selected from the group consisting of corona discharge, flaming, glow discharge, irradiation with electromagnetic waves, and a plasma pretreatment, then coating the pretreated polymeric substrate with a composition comprising a fluoroalkyl-containing silicon compound. The resulting coated is very thin, highly hydrophobic and oleophobic. The coatings prepared by the process of the present invention are stable in boiling water and are resistant to abrasion.

Abstract: A surface structure having protuberances with at least one protuberance configured as a three-dimensional rotationally symmetric shape. The surface structure can be included as surfaces on containers, pipettes, films, semifinished products, or reaction vessels.

Abstract: A self-cleaning surface which has an artificial, at least partially hydrophobic, surface structure made from elevations and depressions, where the elevations and depressions are formed by particles secured to the surface, wherein the particles have a fissured structure with elevations and/or depressions in the nanometer range; a process for making such a surface; and particles having a fissured structure with elevations and/or depressions in the nanometer range

Abstract: A condensation apparatus for condensing a gas on a surface, where the surface for condensing the gas has elevations of average height of from 50 nm to 1 mm, and with an average separation of from 50 nm to 1 mm, allows increased condensation efficiency. The apparatus is used for condensing organic or inorganic gases and may be incorporated into distillation systems.

Abstract: A process for producing self-cleaning surfaces, in which an at least partially hydrophobic, surface structure is formed by securing particles on a polymer surface, which comprises applying, to the polymer surface, at least one solvent which comprises the particles and which solvates the polymer surface, and securing at least part of the particles to the polymer surface by removing the solvent; self-cleaning surfaces obtained by the process; and objects containing self-cleaning surfaces obtained by the process.

Abstract: A self-cleaning surface which has an artificial, at least partially hydrophobic, surface structure containing elevations and depressions,

Abstract: A self-cleaning surface which has an artificial, at least partially hydrophobic, surface structure of elevations and depressions, where the elevations and depressions are formed by particles secured by a carrier on the surface, wherein the particles have a fissured structure with elevations and/or depressions in the nanometer range; and a process for making such a surface.

Abstract: A process for embossing hydrophobic polymers with metallic embossing dies or embossing rolls, where the embossing dies or embossing rolls are hydrophobicized prior to the first embossing procedure. An embossing die or embossing roll for embossing hydrophobic polymers is also provided.