Patents by Inventor Masaharu Sakamoto

Masaharu Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170232773
    Abstract: A method for printing and extracting of a barcode for an object includes dividing a barcode into disjointed regions and assigning the disjointed regions to different locations on an object. The disjointed regions are printed on the object at the different locations wherein the disjointed regions are printed visibly or invisibly.
    Type: Application
    Filed: May 2, 2017
    Publication date: August 17, 2017
    Inventors: Koichi Kamijo, Masaharu Sakamoto
  • Patent number: 9659202
    Abstract: A method for printing and extracting of a barcode for an object includes dividing a barcode into disjointed regions and assigning the disjointed regions to different locations on an object. The disjointed regions are printed on the object at the different locations wherein the disjointed regions are printed visibly or invisibly.
    Type: Grant
    Filed: August 13, 2015
    Date of Patent: May 23, 2017
    Assignee: International Business Machines Corporation
    Inventors: Koichi Kamijo, Masaharu Sakamoto
  • Patent number: 9651856
    Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: May 16, 2017
    Assignee: International Business Machines Corporation
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Publication number: 20170053040
    Abstract: A method and system are provided for data driven shrinkage compensation. The method includes subdividing, by a polygon subdivider, polygons in a three-dimensional file into facets. The method further includes calculating, by an axis dimension calculator, dimensions of an object from an x-directional strand disposed between two facets of a first predetermined facet pair, a y-directional strand disposed between two facets of second predetermined facet pair, and a z-directional strand disposed between two facets of a third predetermined facet pair. The object is formed from at least some of the polygons. The method also includes predicting, by a dimension change predictor, dimensional changes in the strands based on a shape shrinkage model. The method additionally includes correcting, by a dimension change compensator, x-coordinate data, y-coordinate data, and z-coordinate data of at least one facet of the predetermined facet pairs to compensate for the dimensional changes in the strands.
    Type: Application
    Filed: August 21, 2015
    Publication date: February 23, 2017
    Inventor: Masaharu Sakamoto
  • Publication number: 20170046548
    Abstract: A method for printing and extracting of a barcode for an object includes dividing a barcode into disjointed regions and assigning the disjointed regions to different locations on an object. The disjointed regions are printed on the object at the different locations wherein the disjointed regions are printed visibly or invisibly.
    Type: Application
    Filed: August 13, 2015
    Publication date: February 16, 2017
    Inventors: Koichi Kamijo, Masaharu Sakamoto
  • Patent number: 9395622
    Abstract: In one embodiment, a source mask optimization (SMO) method is provided that includes controlling bright region efficiency during at least one optical domain step. The bright region efficiency being the proportion of the total transmitted light that is transferred to bright areas of a target pattern. The optical domain intermediate solution provided by the at least one optical domain step may then be binarized to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor). The MEEF is controlled during at least one spatial domain step that optimizes the initial spatial domain solution.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: July 19, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Publication number: 20160109795
    Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape.
    Type: Application
    Filed: December 30, 2015
    Publication date: April 21, 2016
    Inventors: TADANOBU INOUE, DAVID O. MELVILLE, ALAN E. ROSENBLUTH, MASAHARU SAKAMOTO, KEHAN TIAN
  • Publication number: 20160103389
    Abstract: A system and method for optimizing (designing) a mask pattern, in which SMO and OPC are collaboratively used to exert a sufficient collaborative effect or are appropriately used in different manners. The method for designing a source and a mask for lithography includes a step (S1) of selecting a set of patterns; a step of performing source mask optimization (SMO) using the set of patterns, under an optical proximity correction (OPC) restriction rule which is used for selectively restricting shifting of an edge position of a polygon when OPC is applied to the set of patterns; and a step (S3, S4) of determining a layout of the mask for lithography, by applying OPC to all patterns constituting the mask for lithography using the source optimized through the SMO.
    Type: Application
    Filed: May 9, 2014
    Publication date: April 14, 2016
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Patent number: 9250535
    Abstract: Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 2, 2016
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Publication number: 20150234970
    Abstract: In one embodiment, a source mask optimization (SMO) method is provided that includes controlling bright region efficiency during at least one optical domain step. The bright region efficiency being the proportion of the total transmitted light that is transferred to bright areas of a target pattern. The optical domain intermediate solution provided by the at least one optical domain step may then be binarized to obtain an initial spatial domain solution with a controlled MEEF (Mask Error Enhancement Factor). The MEEF is controlled during at least one spatial domain step that optimizes the initial spatial domain solution.
    Type: Application
    Filed: February 20, 2014
    Publication date: August 20, 2015
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Publication number: 20150088292
    Abstract: Acquiring expected precision even in a case that partial shrinkage occurs. The present invention is a technique for providing data for minimizing a difference between dimensions of a three-dimensional structure formed by laser radiation and design values of a scan path of the three-dimensional structure, in which the technique includes: modeling a manufacturing process of the three-dimensional structure and formulating a shrinkage of material used in the manufacturing process; and performing an optimization calculation for minimizing the difference between the dimensions of the three-dimensional structure after the shrinkage of the material and the design values by using the formulated shrinkage model to compute the scan length x minimizing the difference, and in which the formulation includes formulating a shrinkage function in the case where the material shrinks according to the scan length xi of the scan path of the laser.
    Type: Application
    Filed: September 19, 2014
    Publication date: March 26, 2015
    Inventors: Tadanobu Inoue, Yasunao Katayama, Masaharu Sakamoto
  • Patent number: 8959462
    Abstract: A method, an article of manufacture, and a system for designing a mask. The method for designing a mask is implemented by a computer device having a memory, a processor device communicatively coupled to the memory, and a module configured to carry out the method including the steps of: generating an optical domain representation from a design pattern and an imaging light; and optimizing the optical domain representation under a constraint that values of negative excursions at predetermined evaluation points must be greater than or equal to predetermined negative threshold values assigned to the predetermined evaluation points; where: the optical domain representation is a variable representation of a wavefront; the imaging light is light that is transmitted through the mask; the negative excursions are in an object domain representation of the optical domain representation; and the predetermined evaluation points are in the object domain representation.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: February 17, 2015
    Assignee: International Business Machines Corporation
    Inventors: Tadanobu Inoue, David O Melville, Alan E Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Patent number: 8954898
    Abstract: Systems and methods for optimizing a source shape and a mask shape for a lithography process are disclosed. One such method includes performing a mask optimization for the lithography process in accordance with a set of parameters including at least one variable representation, at least one objective and problem constraints. Further, a light source optimization for the lithography process is performed in accordance with the set of parameters. In addition, a joint light source-mask optimization is performed in accordance with the set of parameters. The method further includes iterating at least one of the mask optimization or the light source optimization by changing at least one of the variable representation, the objective or the problem constraints to maximize a common process window for the lithography process.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 10, 2015
    Assignee: International Business Machines Corporation
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Patent number: 8719735
    Abstract: Mask layout data of a lithographic mask includes polygons that each include horizontal and vertical edges. Each of a number of target edge pairs is defined by two edges of one or more of the polygons. A search box having a boundary coincident with a given edge of the edges of the polygons is specified. Whether the search box includes at least one edge of the edges of the polygons in addition to the given edge is determined. Where the search box includes at least one edge, at least one of the target edge pairs is specified as including the given edge and one of the at least one edge. For each target edge pair that has been specified, a manufacturability penalty value is determined. A dynamic manufacturability constraint table and a non-zero multiplier table are maintained.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: May 6, 2014
    Assignee: International Business Machines Corporation
    Inventors: Masaharu Sakamoto, Alan E. Rosenbluth, Marc Alan Szeto-Millstone, Tadanobu Inoue, Kehan Tian, Andreas Waechter, Jonathan Lee, David Osmond Melville
  • Publication number: 20130263063
    Abstract: A method, an article of manufacture, and a system for designing a mask. The method for designing a mask is implemented by a computer device having a memory, a processor device communicatively coupled to the memory, and a module configured to carry out the method including the steps of: generating an optical domain representation from a design pattern and an imaging light; and optimizing the optical domain representation under a constraint that values of negative excursions at predetermined evaluation points must be greater than or equal to predetermined negative threshold values assigned to the predetermined evaluation points; where: the optical domain representation is a variable representation of a wavefront; the imaging light is light that is transmitted through the mask; the negative excursions are in an object domain representation of the optical domain representation; and the predetermined evaluation points are in the object domain representation.
    Type: Application
    Filed: March 12, 2013
    Publication date: October 3, 2013
    Inventors: Tadanobu Inoue, David O. Melville, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian
  • Patent number: 8539390
    Abstract: The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for determining a manufacturing penalty in making the mask. The manufacturability of the mask, including the manufacturing penalty in making the mask, is determined based on the target edge pairs as selected, and is dependent on the manufacturing penalty in making the mask. Determining the manufacturability of the mask includes, for a selected edge pair having first and second edges that are at least substantially parallel to one another, determining a manufacturing shape penalty owing to an aspect ratio of the first edge relative to a size of a gap between the first edge and the second edge. This penalty takes into account a pair of connected edges of the first edge that are at least substantially parallel to the first edge.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: September 17, 2013
    Assignee: International Business Machines Corporation
    Inventors: Tadanobu Inoue, Alan E. Rosenbluth, Kehan Tian, David O. Melville, Masaharu Sakamoto
  • Patent number: 8453076
    Abstract: Optical wave data for a semiconductor device design is divided into regions. First wavefront engineering is performed on the wave data of each region, accounting for just the wave data of each region and not accounting for the wave data of neighboring regions of each region. The optical wave data of each region is normalized based on results of the first wavefront engineering. Second wavefront engineering is performed on the wave data of each region, based at least on the wave data of each region as has been normalized. The second wavefront engineering takes into account the wave data of each region and a guard band around each region that includes the wave data of the neighboring regions of each region. The second wavefront engineering can be sequentially performed by organizing the regions into groups, and sequentially performing the second wavefront engineering on the regions of each group in parallel.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: May 28, 2013
    Assignee: International Business Machines Corporation
    Inventors: Tadanobu Inoue, David O. Melville, Hidemasa Muta, Alan E. Rosenbluth, Kehan Tian, Masaharu Sakamoto, Saeed Bagheri
  • Publication number: 20130019211
    Abstract: Mask layout data of a lithographic mask includes polygons that each include horizontal and vertical edges. Each of a number of target edge pairs is defined by two edges of one or more of the polygons. A search box having a boundary coincident with a given edge of the edges of the polygons is specified. Whether the search box includes at least one edge of the edges of the polygons in addition to the given edge is determined. Where the search box includes at least one edge, at least one of the target edge pairs is specified as including the given edge and one of the at least one edge. For each target edge pair that has been specified, a manufacturability penalty value is determined. A dynamic manufacturability constraint table and a non-zero multiplier table are maintained.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 17, 2013
    Inventors: Masaharu Sakamoto, Alan E. Rosenbluth, Marc Alan Szeto-Millstone, Tadanobu Inoue, Kehan Tian, Andreas Waechter, Jonathan Lee, David Osmond Melville
  • Patent number: 8332636
    Abstract: A method, computer program product, and data processing system are disclosed for ensuring that applications executed in the data processing system originate only from trusted sources are disclosed. In a preferred embodiment, a secure operating kernel maintains a “key ring” containing keys corresponding to trusted software vendors. The secure kernel uses vendor keys to verify that a given application was signed by an approved vendor. To make it possible for users to execute software from independent software developers, an administrative user may disable the above-described vendor key-checking as an option.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: December 11, 2012
    Assignee: International Business Machines Corporation
    Inventors: Masana Murase, Masaharu Sakamoto, Kanna Shimizu, Vladimir Zbarsky
  • Publication number: 20120196210
    Abstract: The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for determining a manufacturing penalty in making the mask. The manufacturability of the mask, including the manufacturing penalty in making the mask, is determined based on the target edge pairs as selected, and is dependent on the manufacturing penalty in making the mask. Determining the manufacturability of the mask includes, for a selected edge pair having first and second edges that are at least substantially parallel to one another, determining a manufacturing shape penalty owing to an aspect ratio of the first edge relative to a size of a gap between the first edge and the second edge. This penalty takes into account a pair of connected edges of the first edge that are at least substantially parallel to the first edge.
    Type: Application
    Filed: January 31, 2011
    Publication date: August 2, 2012
    Inventors: Tadanobu Inoue, Alan E. Rosenbluth, Kehan Tian, David O. Melville, Masaharu Sakamoto