Patents by Inventor Masahiko Minemura

Masahiko Minemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120116028
    Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility, as well as a contact lens gel material having excellent oxygen permeability and transparency can be provided. The present invention relates to a contact lens material comprising a polycarbonate resin derived from at least two compounds among compounds represented by a general formula (A), a general formula (B) and a general formula (C), a highly polar molecular weight control modifier (chain terminator) and a compound forming a carbonic acid ester, wherein the compound of the general formula (A) is essentially comprised, and to a production method thereof.
    Type: Application
    Filed: July 15, 2009
    Publication date: May 10, 2012
    Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
  • Patent number: 8173720
    Abstract: A transparent gel is disclosed which has an interpenetrating polymer network of a copolymer containing a polysiloxane structure and a polycarbonate structure and a hydrophilic polymer obtained by polymerizing a hydrophilic monomer. The transparent gel is useful as a cultivation substrate, a container for storage and an ophthalmic material, comprising an easily synthesizable and purifiable silicon-containing resin, wherein a gel strength, transparency, oxygen permeability, birefringence and other characteristics are excellent.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: May 8, 2012
    Assignees: Mitsubishi Gas Chemical Company, Inc., Menicon Co., Ltd.
    Inventors: Kazuhiko Nakada, Takahito Nakase, Takahiro Adachi, Akira Yamamoto, Masahiko Minemura
  • Publication number: 20120095135
    Abstract: A flexible, abrasion-resistant, dry to the touch thermoplastic elastomer made of a hydrogenated block copolymer having a weight-average molecular weight of 80,000 to 1,000,000, an olefin-based crystalline resin, a hydrocarbon-based softening agent for rubbers and an acryl-modified organopolysiloxane. At least the block copolymer and the organopolysiloxane are dynamically heat-treated in the presence of an organic peroxide.
    Type: Application
    Filed: November 30, 2011
    Publication date: April 19, 2012
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., MITSUBISHI CHEMICAL CORPORATION
    Inventors: Hiroyuki MORI, Eiichirou Azami, Masahiko Minemura, Masaki Tanaka
  • Patent number: 8080627
    Abstract: The present invention provides an electrophotographic photoreceptor having excellent lubricity and abrasion resistance by using a novel polycarbonate resin comprising structural units having a polysiloxane chain in the shape of grafts as represented by the following general formula (1) with a viscosity-average molecular weight of 12,000 to 100,000 as a binder resin for a charge transport layer of a electrophotographic photoreceptor. wherein R1 to R5 each independently represents hydrogen, fluorine, chlorine, bromine, iodine, an alkyl group, an aryl group, an alkoxy group or an aralkyl group. R6 represents an alkylene group. Y represents a polysiloxane chain.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: December 20, 2011
    Assignees: Shin-Etsu Chemical Co., Ltd., Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masahiko Minemura, Noriyoshi Ogawa
  • Publication number: 20110207053
    Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.
    Type: Application
    Filed: January 31, 2011
    Publication date: August 25, 2011
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Masahiko Minemura, Seiji Makino, Kanji Takeuchi, Noboru Sugiyama, Kozo Ogino
  • Publication number: 20110086227
    Abstract: Provided are an acrylic resin composition with which the peeling properties are improved when multi-layer sheets are formed and roll attachment is reduced, and an acrylic/polycarbonate multi-layer sheet having good environmental resistance and good producibility in which said composition is used. A terminally-modified polycarbonate resin (0.1 to 10 wt %) having terminal groups which can be represented by general formula (1): (where R1 represents an alkylene group, R2 to R8 represent hydrogen, an alkyl group, aryl group or the like, and a is an integer from 1 to 1000) is compounded with an acrylic resin to produce the acrylic resin composition, and this is molded into a multi-layer sheet by co-extrusion with polycarbonate resin.
    Type: Application
    Filed: February 23, 2009
    Publication date: April 14, 2011
    Inventors: Masahiko Minemura, Noriyoshi Ogawa, Tatsuya Kanagawa
  • Publication number: 20100294132
    Abstract: Disclosed is an asymmetric membrane having a porous layer and a dense layer adjacent to the porous layer. The porous layer and the dense layer are made of a polymer material. The porous layer and/or the dense layer contains a filler.
    Type: Application
    Filed: October 27, 2008
    Publication date: November 25, 2010
    Applicants: SHIN-ETSU POLYMER CO., LTD., DENSO CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Junya Ishida, Mitsuaki Negishi, Yuzo Morioka, Mika Kawakita, Katsunori Iwase, Manabu Maeda, Masahiko Minemura, Mamoru Hagiwara
  • Publication number: 20100138019
    Abstract: A method of performing an optical proximity effect correction to a first photomask pattern for a wiring of a semiconductor device for use in combination with a second photomask pattern for a via, the wiring including an end portion coupled to the via, the method being performed by a computer including a memory storing layout data of the first photomask pattern and the second photomask pattern, including extracting a pattern of layout data of the first photomask pattern for the wiring corresponding to the end portion of the wiring and layout data of the second photomask pattern for the via.
    Type: Application
    Filed: February 2, 2010
    Publication date: June 3, 2010
    Applicant: FUJITSU MICROELECTRONICS LIMITED
    Inventors: Norimasa Nagase, Koichi Suzuki, Masahiko Minemura
  • Publication number: 20100132559
    Abstract: A permselective material has a polymer having an organosiloxane skeleton and containing a dispersed solid additive. When oxygen and nitrogen are passed through a membrane having the permselective material, the relation between the permeability coefficients [cm3·cm·sec?1·cm?2·cmHg?1] of oxygen and nitrogen at a temperature of 23±2° C. under a pressure difference of 1.05 atm to 1.20 atm through the membrane is expressed by Formula (1): 0.94 ? P ? ( O 2 ) P ? ( N 2 ) < 1 ( 1 ) where P(O2) denotes the permeability coefficient of oxygen, while P(N2) denotes the permeability coefficient of nitrogen.
    Type: Application
    Filed: December 26, 2007
    Publication date: June 3, 2010
    Applicants: SHIN-ETSU POLYMER CO., LTD., DENSO CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Junya Ishida, Katsunori Iwase, Akira Yamamoto, Masahiko Minemura
  • Patent number: 7631288
    Abstract: A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: December 8, 2009
    Assignee: Fujitsu Microelectronics Limited
    Inventors: Mitsuo Sakurai, Masahiko Minemura
  • Publication number: 20090270529
    Abstract: Provided is a siloxane compound having one end modified with at least one (meth)acrylic group via a spacer, the spacer being a straight chain having at least three ether bonds or a branched structure having at least one ether bond. The (meth)acrylic-modified siloxane compound is added to a heat or photo-curable composition, which cures into a product exhibiting water repellent, antifouling, lubricating and other properties inherent to siloxane.
    Type: Application
    Filed: April 17, 2009
    Publication date: October 29, 2009
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroyuki KUME, Masahiko Minemura, Mamoru Hagiwara
  • Publication number: 20090012205
    Abstract: A transparent gel is disclosed which has an interpenetrating polymer network of a copolymer containing a polysiloxane structure and a polycarbonate structure and a hydrophilic polymer obtained by polymerizing a hydrophilic monomer. The transparent gel is useful as a cultivation substrate, a container for storage and an ophthalmic material, comprising an easily synthesizable and purifiable silicon-containing resin, wherein a gel strength, transparency, oxygen permeability, birefringence and other characteristics are excellent.
    Type: Application
    Filed: January 13, 2006
    Publication date: January 8, 2009
    Inventors: Kazuhiko Nakada, Takahito Nakase, Takahiro Adachi, Akira Yamamoto, Masahiko Minemura
  • Publication number: 20080199796
    Abstract: The present invention provides an electrophotographic photoreceptor having excellent lubricity and abrasion resistance by using a novel polycarbonate resin comprising structural units having a polysiloxane chain in the shape of grafts as represented by the following general formula (1) with a viscosity-average molecular weight of 12,000 to 100,000 as a binder resin for a charge transport layer of a electrophotographic photoreceptor. wherein R1 to R5 each independently represents hydrogen, fluorine, chlorine, bromine, iodine, an alkyl group, an aryl group, an alkoxy group or an aralkyl group. R6 represents an alkylene group. Y represents a polysiloxane chain.
    Type: Application
    Filed: February 13, 2008
    Publication date: August 21, 2008
    Inventors: Masahiko Minemura, Noriyoshi Ogawa
  • Patent number: 7342049
    Abstract: A novel dilatant fluid which keeps fluid state within a broad temperature range, is excellent in storage stability, has large mechanical strength and shows large changing quantity of viscosity resistance accompanied by the increase of shear stress. It was found that excellent dilatancy is expressed markedly specifically in a composition comprising (B) from 0.5 to 100 parts by weight of a particle dispersing agent and (C) from 5 to 1,000 parts by weight of a silicone medium, based on (A) 100 parts by weight an inorganic fine particle having a primary particle size of from 2 nm to 30 ?m.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: March 11, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiko Minemura, Masanao Kamei
  • Patent number: 7303845
    Abstract: A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: December 4, 2007
    Assignee: Fujitsu Limited
    Inventors: Tomoyuki Okada, Masahiko Minemura, Mitsuo Sakurai, Ryo Tsujimura
  • Publication number: 20060214119
    Abstract: A pattern data creation method creates mask pattern data on an exposure mask, the exposure mask having a surface divided into plural unit regions and the mask pattern data including pattern data parts each defined for one of the plural unit regions, each of the pattern data parts including pattern information of a pattern included in the unit region and header information indicative of a location of the unit region on the surface of the exposure mask. The pattern data creation method includes the steps of replacing, in a part of said plural unit regions, the pattern information in the mask pattern data part with new pattern information, and reconstructing the header for that unit region in which the pattern information is replaced.
    Type: Application
    Filed: July 14, 2005
    Publication date: September 28, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Syuzi Katase, Kazuhiko Takahashi, Masahiko Minemura, Shuji Osada
  • Publication number: 20060190920
    Abstract: A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area.
    Type: Application
    Filed: February 21, 2006
    Publication date: August 24, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Mitsuo Sakurai, Masahiko Minemura
  • Publication number: 20060160951
    Abstract: The present invention relates to a thermoplastic elastomer comprising: (a) a hydrogenated block copolymer having a weight-average molecular weight of 80,000 to 1,000,000, which is produced by hydrogenating a (A)-(B) type block copolymer and/or a (A)-(B)-(A) type block copolymer wherein (A) represents a vinyl aromatic compound block and (B) represents a conjugated diene polymer block, such that at least 90% of double bonds of a conjugated diene moiety of the block copolymers are saturated; (b) an olefin-based crystalline resin; (c) a hydrocarbon-based softening agent for rubbers; and (d) an acryl-modified organopolysiloxane, wherein a weight ratio of the component (a) to the component (b) ((a)/(b)) is 15:85 to 85:15; the component (c) is contained in an amount of 10 to 300 parts by weight based on 100 parts by weight of the component (a); the component (d) is contained in an amount of 0.
    Type: Application
    Filed: December 21, 2005
    Publication date: July 20, 2006
    Applicants: Advanced Plastics Compounds Company, Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroyuki Mori, Eiichirou Azami, Masahiko Minemura, Masaki Tanaka
  • Patent number: 7039889
    Abstract: An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: May 2, 2006
    Assignee: Fujitsu Limited
    Inventors: Kazuhiko Takahashi, Masahiko Minemura, Mitsuo Sakurai, Kazuya Sugawa
  • Patent number: 6942820
    Abstract: A dimethylpolysiloxane composition comprising at least two dimethylpolysiloxanes selected from dimethylpolysiloxanes represented by formula (1) or formula (2), wherein m is an integer with 0?m?10 and n is an integer with 3?n?10, one of said at least two dimethylpolysiloxanes is dodecamethylpentasiloxane contained in an amount of 15 to 95 wt % based on a total weight of the composition, and the composition has a moisture content of at most 50 ppm based on the total weight of the composition.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: September 13, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshiaki Ihara, Sinobu Sato, Ichiro Ono, Hiroshi Nakayama, Masahiko Minemura