Patents by Inventor Masahiko Yasuda

Masahiko Yasuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10352395
    Abstract: A vibration-damping electromagnetic actuator including: a tubular stator including at least one coil member having a coil and an outer yoke attached to the coil; a mover including a permanent magnet and at least one inner yoke superposed in an axial direction of the stator, the mover being inserted into the tubular stator as axially displaceable relative to the stator through energization to the coil; and an inner tubular part provided at the outer yoke being superposed on an inner peripheral face of the coil to have a magnetic gap, wherein the at least one inner yoke has a thick part at an outer peripheral part thereof, and a lightening part at an inner peripheral part thereof so that an axial dimension of the inner yoke is smaller in a formation part of the lightening part than in the thick part.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: July 16, 2019
    Assignee: SUMITOMO RIKO COMPANY LIMITED
    Inventors: Takayoshi Yasuda, Hironori Koyama, Masahiko Nagasawa, Yushi Hashimoto
  • Patent number: 10305009
    Abstract: A semiconductor light emitting device includes semiconductor light source, a resin package surrounding the semiconductor light source, and a lead fixed to the resin package. The lead is provided with a die bonding pad for bonding the semiconductor light source, and with an exposed surface opposite to the die bonding pad The exposed surface is surrounded by the resin package in the in-plane direction of the exposed surface.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: May 28, 2019
    Assignee: ROHM CO., LTD.
    Inventors: Masahiko Kobayakawa, Kazuhiro Mireba, Shintaro Yasuda, Junichi Itai, Taisuke Okada
  • Publication number: 20190155168
    Abstract: An exposure apparatus includes (i) a projection optical system, (ii) a substrate stage having a substrate holder on which a substrate is held, which is movable while holding the substrate with the substrate holder, and (iii) a reference member having a first reference and a second reference for performing an alignment process, the reference member being provided on the substrate stage. At least part of an upper surface of the reference member includes a liquid repellent material. The substrate is aligned based on information obtained from the alignment process. The substrate is exposed through liquid in a liquid immersion area formed locally on an upper surface of the substrate.
    Type: Application
    Filed: January 24, 2019
    Publication date: May 23, 2019
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Takahiro MASADA, Yuho KANAYA, Tadashi NAGAYAMA
  • Patent number: 10222708
    Abstract: An exposure method and apparatus expose a substrate with illumination light via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A second stage on which the substrate is held and a third stage are relatively moved, based on outer periphery positional information of the second stage, in order to cause the second stage to come close, from one side in a first direction, to the third stage that faces the projection optical system. The second and third stages that have come close together are moved from the one side to an other side in the first direction with respect to the projection optical system to place the second stage to face the projection optical system instead of the third stage while substantially maintaining the liquid immersion area under the projection optical system.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: March 5, 2019
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 10209623
    Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: February 19, 2019
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Takahiro Masada, Yuho Kanaya, Tadashi Nagayama
  • Publication number: 20180081283
    Abstract: An exposure method and apparatus expose a substrate with illumination light via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A second stage on which the substrate is held and a third stage are relatively moved, based on outer periphery positional information of the second stage, in order to cause the second stage to come close, from one side in a first direction, to the third stage that faces the projection optical system. The second and third stages that have come close together are moved from the one side to an other side in the first direction with respect to the projection optical system to place the second stage to face the projection optical system instead of the third stage while substantially maintaining the liquid immersion area under the projection optical system.
    Type: Application
    Filed: November 28, 2017
    Publication date: March 22, 2018
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Taro SUGIHARA
  • Patent number: 9857692
    Abstract: An exposure method and apparatus exposes an object with an exposure beam via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A first stage on which the object is held and a second stage are moved relative to each other so that the second stage approaches the first stage that is placed facing the projection optical system, the second stage having an upper surface contactable with a liquid immersion area. The first and second stages that have approached each other are moved with respect to the projection optical system so that the second stage is placed facing the projection optical system instead of the first stage. For relative movement of the first and second stages in the approaching, driving of the first and second stages is controlled based on outer periphery positional information of the first stage.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: January 2, 2018
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Publication number: 20160313650
    Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
    Type: Application
    Filed: June 30, 2016
    Publication date: October 27, 2016
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Takahiro MASADA, Yuho KANAYA, Tadashi NAGAYAMA
  • Patent number: 9383656
    Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
    Type: Grant
    Filed: April 22, 2015
    Date of Patent: July 5, 2016
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Takahiro Masada, Yuho Kanaya, Tadashi Nagayama
  • Publication number: 20160161861
    Abstract: An exposure method and apparatus exposes an object with an exposure beam via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A first stage on which the object is held and a second stage are moved relative to each other so that the second stage approaches the first stage that is placed facing the projection optical system, the second stage having an upper surface contactable with a liquid immersion area. The first and second stages that have approached each other are moved with respect to the projection optical system so that the second stage is placed facing the projection optical system instead of the first stage. For relative movement of the first and second stages in the approaching, driving of the first and second stages is controlled based on outer periphery positional information of the first stage.
    Type: Application
    Filed: February 17, 2016
    Publication date: June 9, 2016
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Taro SUGIHARA
  • Patent number: 9348238
    Abstract: An exposure apparatus exposes an object with an exposure beam. The apparatus includes first and second stages, a measurement device and a controller. The first stage mounts the object. The second stage is movable relative to the first stage. The measurement device obtains position information of an outer periphery edge of the first stage. The controller controls at least one of a position of the first stage and a position of the second stage based on the position information of the outer periphery edge so that the first and second stages do not touch each other.
    Type: Grant
    Filed: August 12, 2013
    Date of Patent: May 24, 2016
    Assignee: NIKO CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 9298108
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: March 29, 2016
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Publication number: 20160018745
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Application
    Filed: September 29, 2015
    Publication date: January 21, 2016
    Inventors: Masahiko YASUDA, Taro SUGIHARA
  • Patent number: 9223230
    Abstract: A loading method and apparatus loads an object via a carrier system in an exposure apparatus that exposes the object with an exposure beam via a projection optical system and a liquid. Position information of the depressed section is obtained by detecting a part of a stage that mounts the object in a depressed section placed at a part of an upper surface of the stage. The carrier system carries the object to above the stage placed at an exchange position of the object, the exchange position being distanced from the projection optical system. The object is loaded on the stage based on the position information of the depressed section so that the carried object is mounted in the depressed section.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: December 29, 2015
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 9223231
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: December 29, 2015
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Publication number: 20150227058
    Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
    Type: Application
    Filed: April 22, 2015
    Publication date: August 13, 2015
    Inventors: Masahiko YASUDA, Takahiro MASADA, Yuho KANAYA, Tadashi NAGAYAMA
  • Patent number: 9063438
    Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: June 23, 2015
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Takahiro Masada, Yuho Kanaya, Tadashi Nagayama
  • Patent number: 8947665
    Abstract: To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and ? of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
    Type: Grant
    Filed: June 13, 2012
    Date of Patent: February 3, 2015
    Assignee: Nikon Corporation
    Inventors: Mitsuru Kobayashi, Masahiko Yasuda
  • Publication number: 20130329208
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Application
    Filed: August 13, 2013
    Publication date: December 12, 2013
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Taro SUGIHARA
  • Publication number: 20130329200
    Abstract: An exposure apparatus exposes an object with an exposure beam. The apparatus includes first and second stages, a measurement device and a controller. The first stage mounts the object. The second stage is movable relative to the first stage. The measurement device obtains position information of an outer periphery edge of the first stage. The controller controls at least one of a position of the first stage and a position of the second stage based on the position information of the outer periphery edge so that the first and second stages do not touch each other.
    Type: Application
    Filed: August 12, 2013
    Publication date: December 12, 2013
    Applicant: NIKON CORPORATION
    Inventors: Masahiko YASUDA, Taro SUGIHARA