Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several pr

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: A projection exposure method for exposing a substrate through a projection optical system with a predetermined pattern formed on a mask. The method includes the steps of calculating an amount of lateral variation of a pattern image in a direction perpendicular to an optical axis of the projection optical system, determining a distortion produced solely by the projection optical system, obtaining a total expected distortion by a summation of the distortion produced solely by the projection optical system and the calculated variation of the positions at which the image of the pattern of the mask is formed, and exposing the substrate while partially correcting the positions at which the image of the pattern of the mask is formed through the projection optical system based on the total expected distortion.

Abstract: Any deflection of a mask is detected and corrected to ensure a good projection of a mask pattern. When a mask suffers a deflection due to some reasons such as the gravity and/or thermal expansion, the deflection is detected by a mask-deflection detection system and the detection result is supplied to an arithmetic operation unit. The arithmetic operation unit uses the detection result supplied from the mask-deflection detection system so to calculate the magnitude of the deflection, and then calculate a pneumatic-pressure control value for controlling the pneumatic-pressure within a mask-deflection correction unit. The pneumatic-pressure control value is supplied to a pneumatic-pressure control unit, which controls the pneumatic pressure within the air chamber of the mask-deflection correction unit such that the deflection of the mask may be corrected.

Abstract: The present invention provides an adhesive comprising a polyester polyol or polyurethane polyol possessing structural units represented by the following general formula (I) within its molecular structure, and an organic polyisocyanate in which the isocyanate groups may be protected: wherein R1 and R2 are the same or different and each represents lower alkyl. The adhesive of the present invention exhibits an excellent initial adhesion strength; and provides adhered objects that exhibit an excellent permanent adhesion strength, hot water resistance, flexibility, flexibility at a low temperature, and fatigue resistance, and is useful in adhering plastic, metal, and the like. In addition, the present invention provides a method of mixing the aforementioned components and using the mixture for adhesion, and a use of the mixture of the aforementioned components.

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several pr

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several pr

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: The present invention provides a polyester polyol comprising within its molecular structure both structural units respectively represented by the following general formula (I) and general formula (II). In addition, the present invention provides a polyurethane using the polyester polyol of the present invention. This polyurethane exhibits excellent resistance to hydrolysis, resistance to alkali, mechanical strength, and the like. ##STR1## (wherein R.sup.1 and R.sup.2 are the same or different and each represents lower alkyl having 1 to 8 carbon atoms), ##STR2## (wherein R.sup.3 and R.sup.4 are the same or different and each represents lower alkyl having 1 to 8 carbon atoms).

Abstract: A projection exposure apparatus includes different wavelength alignment systems and exposure wavelength alignment systems for positional adjustment for a mask and a substrate. A fiducial plate with incused diffraction grating marks is used on a substrate stage for alignment. Positional discrepancy amounts between marks on the mask and marks on the fiducial plate are previously determined at various measuring points on the fiducial plate. The discrepancy results from difference in drawing error on the fiducial plate. When a mask having different mark positions is used for overlay exposure, the mask and the substrate undergo positional adjustment in accordance with change in positions of the alignment systems by using the previously determined positional discrepancy amounts.

Abstract: An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

Abstract: A polyurethane resin is synthesized from a reaction mixture of at least one phosphorus compound, an epoxy compound, a polyisocyanate, a polyfunctional hydroxy compound, and optionally a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000 to about 200,000 number average molecular weight of the polyurethane resin. The weight average molecular weight of the polyurethane resin is from about 10,000 to about 250,000. A magnetic coating formulation is comprised of principally of magnetic particles and a binder. A magnetic recording media comprises a laminate as in the form of a magnetic layer composed principally of magnetic particles and a binder wherein at least a portion of the binder is the polyurethane resin. The substrate of the magnetic recording medium is a suitable polymer such as polyester, and the like.

Abstract: A polyurethane resin is synthesized from a reaction mixture of at least one phosphorus compound, an epoxy compound, a polyisocyanate, a polyfunctional hydroxy compound, and optionally a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000 to about 200,000 number average molecular weight of the polyurethane resin. The weight average molecular weight of the polyurethane resin is from about 10,000 to about 250,000. A magnetic coating formulation is comprised of principally of magnetic particles and a binder. A magnetic recording media comprises a laminate as in the form of a magnetic layer composed principally of magnetic particles and a binder wherein at least a portion of the binder is the polyurethane resin. The substrate of the magnetic recording medium is a suitable polymer such as polyester, and the like.

Abstract: A polyurethane resin is synthesized from a reaction mixture of at least one phosphorus compound, an epoxy compound, a polyisocyanate, a polyfunctional hydroxy compound, and optionally a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000 to about 200,000 number average molecular weight of the polyurethane resin. The weight average molecular weight of the polyurethane resin is from about 10,000 to about 250,000. A magnetic coating formulation is comprised of principally of magnetic particles and a binder. A magnetic recording media comprises a laminate as in the form of a magnetic layer composed principally of magnetic particles and a binder wherein at least a portion of the binder is the polyurethane resin. The substrate of the magnetic recording medium is a suitable polymer such as polyester, and the like.

Abstract: A magnetic coating formulation is composed principally of magnetic particles and a binder. At least a portion of the binder is a polyurethane resin synthesized from a reactant mixture of specific phosphorus compound, epoxy compound, isocyanate compound and polyfunctional hydroxy compounds. The reactant mixture may optionally contain a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000-200,000 number average molecular weight of the polyurethane resin, and has a number average molecular weight of 4,000-150,000. A magnetic recording medium with a magnetic coating layer formed from the magnetic coating formulation is also disclosed. The magnetic coating layer features not only excellent dispersion of magnetic particles, in other words, excellent magnetic characteristics but also superb durability.

Abstract: A magnetic coating formulation is composed principally of magnetic particles and a binder. At least a portion of the binder is a polyurethane resin synthesized from a reactant mixture of specific phosphorus compound, epoxy compound, isocyanate compound and polyfunctional hydroxy compounds. The reactant mixture may optionally contain a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000-200,000 number average molecular weight of the polyurethane resin, and has a number average molecular weight of 4,000-150,000. A magnetic recording medium with a magnetic coating layer formed from the magnetic coating formulation is also disclosed. The magnetic coating layer features not only excellent dispersion of magnetic particles, in other words, excellent magnetic characteristics but also superb durability.