Patents by Inventor Masahiro Shibamoto
Masahiro Shibamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230187338Abstract: Provided are a laminated body and a laminated body manufacturing method that can improve adhesiveness between a resin layer and a seed layer. The laminated body has a substrate, a first wiring layer, a resin layer, and a second wiring layer in this order, and the second wiring layer includes at least an adhesive layer and a seed layer in this order.Type: ApplicationFiled: February 15, 2023Publication date: June 15, 2023Inventors: HIROSHI YAKUSHIJI, REIJI SAKAMOTO, MASAHIRO SHIBAMOTO
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Patent number: 11600295Abstract: A vacuum process method for a magnetic recording medium having a surface protective layer for protecting a magnetic recording layer formed on a substrate includes a ta-C film forming step of forming a ta-C film on the magnetic recording layer, a transportation step of transporting a substrate on which the ta-C film is formed, a radical generation step of generating radicals by exciting a process gas, and a radical process step of irradiating a surface of the ta-C film with the radicals.Type: GrantFiled: April 18, 2016Date of Patent: March 7, 2023Assignee: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Masahiro Shibamoto
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Publication number: 20230002886Abstract: A film forming apparatus has a process chamber and a processing unit provided in the process chamber and forming adhesive film. The surface of the inner walls of the process chamber is formed of a material having a large getter effect on gas or water (H2O) remaining in the process chamber.Type: ApplicationFiled: September 9, 2022Publication date: January 5, 2023Inventors: HIROSHI YAKUSHIJI, REIJI SAKAMOTO, MASAHIRO SHIBAMOTO
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Patent number: 11289305Abstract: A deposition method of arranging a discharge portion of a striker near a target to induce arc discharge and forming a film on a substrate using a plasma generated by the arc discharge is disclosed. The method includes a changing step of changing a position for inducing the arc discharge by the striker in a region set in the target, a deposition step of forming the film on the substrate using the plasma generated by inducing the arc discharge at the position, and a reduction step of reducing the region in accordance with use of the target.Type: GrantFiled: June 24, 2020Date of Patent: March 29, 2022Assignee: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Yuzuru Miura, Masahiro Shibamoto
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Patent number: 10971332Abstract: A plasma processing apparatus includes a processing chamber configured to process a substrate, a plasma generator configured to generate a plasma, a transport unit configured to transport, to the processing chamber, the plasma generated by the plasma generator, and a scanning magnetic field generator configured to generate a magnetic field which deflects the plasma so as to scan the substrate by the plasma. The scanning magnetic field generator is configured to be capable of adjusting a center of a locus of the plasma.Type: GrantFiled: May 11, 2020Date of Patent: April 6, 2021Assignee: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Yuto Watanabe, Masahiro Shibamoto
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Patent number: 10917960Abstract: A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.Type: GrantFiled: December 30, 2016Date of Patent: February 9, 2021Assignee: CANON ANELVA CORPORATIONInventors: Masahiro Atsumi, Hidekazu Nishimura, Masahiro Shibamoto, Hiroshi Yakushiji
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Publication number: 20200328062Abstract: A deposition method of arranging a discharge portion of a striker near a target to induce arc discharge and forming a film on a substrate using a plasma generated by the arc discharge is disclosed. The method includes a changing step of changing a position for inducing the arc discharge by the striker in a region set in the target, a deposition step of forming the film on the substrate using the plasma generated by inducing the arc discharge at the position, and a reduction step of reducing the region in accordance with use of the target.Type: ApplicationFiled: June 24, 2020Publication date: October 15, 2020Applicant: Canon Anelva CorporationInventors: Hiroshi Yakushiji, Yuzuru Miura, Masahiro Shibamoto
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Publication number: 20200273672Abstract: A plasma processing apparatus includes a processing chamber configured to process a substrate, a plasma generator configured to generate a plasma, a transport unit configured to transport, to the processing chamber, the plasma generated by the plasma generator, and a scanning magnetic field generator configured to generate a magnetic field which deflects the plasma so as to scan the substrate by the plasma. The scanning magnetic field generator is configured to be capable of adjusting a center of a locus of the plasma.Type: ApplicationFiled: May 11, 2020Publication date: August 27, 2020Applicant: CANON ANELVA CORPORATIONInventors: Hiroshi YAKUSHIJI, Yuto WATANABE, Masahiro SHIBAMOTO
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Patent number: 10731245Abstract: A vacuum arc deposition apparatus for forming a ta-C film on a substrate using arc discharge includes a holding unit that holds a target unit, an anode unit into which electrons emitted from the target unit flow, and a power supply that supplies, between the target unit and the anode unit, a current for generating a plasma by arc discharge. The current supplied by the power supply at the time of the arc discharge is generated by superimposing, on a DC current, a pulse current of a pulse frequency not higher than 140 Hz.Type: GrantFiled: November 8, 2017Date of Patent: August 4, 2020Assignee: Canon Anelva CorporationInventors: Hiroshi Yakushiji, Yuto Watanabe, Masahiro Shibamoto, Yuzuru Miura
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Patent number: 10626494Abstract: In one embodiment of the invention, a protective film formation chamber for forming a carbon protective film on a magnetic film includes: a gas introduction part which introduces a source gas to a vacuum vessel; a discharge electrode having a discharge surface at a position facing a substrate conveyed to a predetermined position in the vacuum vessel; a plasma formation part which applies voltage between the discharge surface and the substrate conveyed to the predetermined position; a permanent magnet being provided on a back side of the discharge surface and having a first magnet and a second magnet provided such that their magnetic poles facing the discharge surface are opposite to each other; and a no-erosion-portion mask being provided in parallel to the discharge surface and covering an area of the discharge surface surrounding a portion facing the permanent magnet.Type: GrantFiled: December 16, 2013Date of Patent: April 21, 2020Assignee: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Masahiro Shibamoto, Kazuto Yamanaka, Shogo Hiramatsu, Susumu Karino
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Patent number: 10011899Abstract: A deposition apparatus comprises a target unit, an anode unit into which electrons emitted from the target unit flow, a striker configured to come into contact with the target unit to render the target unit and the anode unit conductive, so as to cause arc discharge between the target unit and the anode unit, a striker driving unit configured to drive the striker in one of a direction toward the target unit and a direction to retract from the target unit, a power supply unit configured to supply power to the target unit and the anode unit, and a control unit configured to control the striker driving unit and the power supply unit. The control unit supplies the power to the target unit and the anode unit after bringing the striker into contact with the target unit.Type: GrantFiled: November 11, 2015Date of Patent: July 3, 2018Assignee: CANON ANELVA CORPORATIONInventors: Teruaki Ono, Masahiro Shibamoto
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Publication number: 20180163342Abstract: An object of the present invention is to provide a processing apparatus with which an operation for retaining and switching a processing subject can be shortened in order to reduce an amount of time required for folding processing. A processing apparatus (1C) for unfurling or folding a processing subject (T) includes a first retaining device (300A) and a second retaining device (300B) that are capable of moving within a first area and retaining the processing subject (T), a carrying device (400) disposed within the first area so as to be capable of carrying the processing subject (T), and a third retaining device (300C) that is capable of moving within a second area disposed below the first area so as to overlap the first area, and retaining the processing subject (T) below the carrying device (400).Type: ApplicationFiled: May 24, 2016Publication date: June 14, 2018Inventors: Hiroshi Kitagawa, Hajime Ishihara, Masahiro Shibamoto, Kouki Takasugi, Shuichi Kojima, Shinichiro Ono
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Publication number: 20180066353Abstract: A vacuum arc deposition apparatus for forming a ta-C film on a substrate using arc discharge includes a holding unit that holds a target unit, an anode unit into which electrons emitted from the target unit flow, and a power supply that supplies, between the target unit and the anode unit, a current for generating a plasma by arc discharge. The current supplied by the power supply at the time of the arc discharge is generated by superimposing, on a DC current, a pulse current of a pulse frequency not higher than 140 Hz.Type: ApplicationFiled: November 8, 2017Publication date: March 8, 2018Applicant: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Yuto Watanabe, Masahiro Shibamoto, Yuzuru Miura
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Publication number: 20170202077Abstract: A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.Type: ApplicationFiled: December 30, 2016Publication date: July 13, 2017Applicant: CANON ANELVA CORPORATIONInventors: Masahiro ATSUMI, Hidekazu NISHIMURA, Masahiro SHIBAMOTO, Hiroshi YAKUSHIJI
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Publication number: 20160232932Abstract: A vacuum process method for a magnetic recording medium having a surface protective layer for protecting a magnetic recording layer formed on a substrate includes a ta-C film forming step of forming a ta-C film on the magnetic recording layer, a transportation step of transporting a substrate on which the ta-C film is formed, a radical generation step of generating radicals by exciting a process gas, and a radical process step of irradiating a surface of the ta-C film with the radicals.Type: ApplicationFiled: April 18, 2016Publication date: August 11, 2016Applicant: CANON ANELVA CORPORATIONInventors: Hiroshi YAKUSHIJI, Masahiro SHIBAMOTO
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Publication number: 20160060750Abstract: A deposition apparatus comprises a target unit, an anode unit into which electrons emitted from the target unit flow, a striker configured to come into contact with the target unit to render the target unit and the anode unit conductive, so as to cause arc discharge between the target unit and the anode unit, a striker driving unit configured to drive the striker in one of a direction toward the target unit and a direction to retract from the target unit, a power supply unit configured to supply power to the target unit and the anode unit, and a control unit configured to control the striker driving unit and the power supply unit. The control unit supplies the power to the target unit and the anode unit after bringing the striker into contact with the target unit.Type: ApplicationFiled: November 11, 2015Publication date: March 3, 2016Applicant: CANON ANELVA CORPORATIONInventors: Teruaki ONO, Masahiro SHIBAMOTO
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Publication number: 20160056026Abstract: The present invention provides a processing apparatus including a vacuum vessel, a plurality of electrodes arranged in the vacuum vessel, a plurality of power supplies configured to apply potentials to the plurality of electrodes, a detector configured to detect a potential in a process space between a substrate transferred into the vacuum vessel and each of the plurality of electrodes, and a controller configured to control phases of the potentials to be applied to the plurality of electrodes by the plurality of power supplies based on the potential detected by the detector.Type: ApplicationFiled: November 4, 2015Publication date: February 25, 2016Applicant: CANON ANELVA CORPORATIONInventors: Hidetomo NARADATE, Masahiro SHIBAMOTO
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Publication number: 20160027624Abstract: A sputtering apparatus that forms a film on a substrate by sputtering in a chamber includes an electrode including a holding portion that holds a target, and configured to apply a potential to the target via the holding portion, a first magnet and second magnet arranged to sandwich a space between the holding portion, and a substrate arrangement surface on which the substrate should be arranged, and to be spaced apart from each other in a direction along the substrate arrangement surface, a shield arranged between the first magnet and the second magnet, and between the substrate arrangement surface and the holding portion, and a rotation driving unit configured to integrally rotate the target, the first magnet, and the second magnet.Type: ApplicationFiled: July 7, 2015Publication date: January 28, 2016Applicant: CANON ANELVA CORPORATIONInventors: Susumu KARINO, Masahiro SHIBAMOTO
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Publication number: 20150348579Abstract: A magnetic recording medium having high coercivity, in which an L10-type ordered alloy with a high magnetic anisotropy is used in a magnetic recording layer, and a method for manufacturing the magnetic recording medium at high throughput are provided. By providing a metal base layer having a face-centered cubic structure below an orientation control layer which is for enhancing crystallinity of the magnetic recording layer that contains the ordered alloy having an L10-type structure, the magnetic recording layer that has enough high coercivity even in the case of reducing a thickness of the orientation control layer can be deposited, and the thickness of the orientation control layer that is mainly made of oxide can be reduced, whereby the throughput can be improved.Type: ApplicationFiled: December 18, 2013Publication date: December 3, 2015Applicant: CANON ANELVA CORPORATIONInventors: Hidetomo NARADATE, Akio SATO, Masahiro SHIBAMOTO, Kazuto YAMANAKA
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Publication number: 20150083586Abstract: A deposition apparatus comprises a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit.Type: ApplicationFiled: September 12, 2014Publication date: March 26, 2015Applicant: CANON ANELVA CORPORATIONInventors: Teruaki ONO, Masahiro SHIBAMOTO