Patents by Inventor Masahiro Tadokoro

Masahiro Tadokoro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190184737
    Abstract: An omni-directional rotational drive mechanism and a moving body in which production and maintenance can be facilitated, while the size can be reduced, by making the number of components smaller. A rotating body provided for a wheel member rotatable about a ring-shaped shaft having a rotating shaft of the wheel member as its center. The rotating body is configured to rotate integrally with the wheel member about the rotating shaft. A pair of worms rotatable about the same shaft as the rotating shaft of the wheel member. A pair of worm wheels are provided for the wheel member so as to be rotatable by meshing with different worms, and capable of transmitting each of rotations to the rotating body. The rotating body is configured so as to rotate or stop with respect to the wheel member in accordance with the rotational direction and the rotational speed of the respective worms.
    Type: Application
    Filed: March 31, 2017
    Publication date: June 20, 2019
    Applicant: TOHOKU UNIVERSITY
    Inventors: Kenjiro TADAKUMA, Eri TAKANE, Masahiro FUJITA, Masashi KONYO, Satoshi TADOKORO
  • Patent number: 10143436
    Abstract: The particle therapy system includes a particle beam generator for generating a particle beam; an irradiation nozzle arranged in a treatment room and irradiating a target with the particle beam; a particle beam transport system communicating the particle beam generator with the irradiation nozzle; an X-ray imaging device arranged in the treatment room and imaging the position of the target through irradiation with X-rays; a dosimeter arranged at a position passed by the particle beam in the irradiation nozzle; and a control apparatus performing control to exclude the measurement result of the X-rays from the measurement result obtained using the dosimeter when the X-rays are emitted during treatment.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: December 4, 2018
    Assignee: Hitachi, Ltd.
    Inventors: Arao Nishimura, Koji Matsuda, Ryosuke Shinagawa, Taisuke Takayanagi, Masahiro Tadokoro, Takao Kidani, Hideaki Nihongi, Kikuo Umegaki, Taeko Matsuura
  • Patent number: 9502282
    Abstract: In a method of manufacturing a semiconductor device using high-NA ArF liquid immersion exposure of a photoresist, a layer arrangement is provided capable of increasing reflection of a reference beam in an oblique incidence autofocus optical system, thereby enhancing autofocus and making it possible to reduce variation in the diameter of a contact hole.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: November 22, 2016
    Assignee: Renesas Electronics Corporation
    Inventors: Takuya Hagiwara, Tatsunori Murata, Masahiro Tadokoro
  • Patent number: 9415241
    Abstract: The charged particle beam irradiation system includes a charged particle beam generating unit, scanning electromagnets, a beam irradiation apparatus, beam radiation dose measuring instrument(s), and a beam position measuring instrument for obtaining one or both of the position and the width of the beam scanned by the scanning electromagnets. The beam position measuring instrument obtains one or both of the position and the width of the beam for each irradiation spot and determines whether the obtained result is within an allowable range and obtains one or both of the position and the width of the charged particle beam for each split during irradiation to the spot with the charged particle beam regarding a split of which a dose is managed by dividing a part of or all of irradiation spots into irradiation sections and determines whether the obtained result is within an allowable range.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 16, 2016
    Assignee: Hitachi, Ltd.
    Inventors: Yuki Ito, Koji Matsuda, Ryosuke Shinagawa, Masahiro Tadokoro, Arao Nishimura
  • Publication number: 20150374324
    Abstract: There is provided a particle therapy system including: a particle beam generator for generating a particle beam; an irradiation nozzle arranged in a treatment room and irradiating a target with the particle beam; a particle beam transport system 6 communicating the particle beam generator with the irradiation nozzle; an X-ray imaging device arranged in the treatment room and imaging the position of the target through irradiation with X-rays; a dosimeter 8 arranged at a position passed by the particle beam in the irradiation nozzle; and a control apparatus 400 performing control to exclude the measurement result of the X-rays from the measurement result obtained using the dosimeter 8 when the X-rays are emitted during treatment.
    Type: Application
    Filed: October 10, 2013
    Publication date: December 31, 2015
    Inventors: Arao NISHIMURA, Koji MATSUDA, Ryosuke SHINAGAWA, Taisuke TAKAYANAGI, Masahiro TADOKORO, Takao KIDANI, Hideaki NIHONGI, Kikuo UMEGAKI, Taeko MATSUURA
  • Patent number: 9188685
    Abstract: A stacked type of radiation detector and a calibration method that enables the radiation detector to correct variations in sensor-specific output easily and within a short time, without using a water-phantom dose detector. The radiation detector is equipped with a sensor section including a plurality of sensors arranged in layers in a traveling direction of a particle beam. A dummy absorber has water-equivalent thickness equal to an average water-equivalent thickness of the sensors. A signal-processing unit calculates sensor-specific calibration coefficients using a measurement result obtained during irradiation of the radiation detector with the radiation when electrical signals developed in each sensor are measured, and a measurement result obtained during irradiation of the radiation detector with the radiation when the sensor section is moved in the traveling direction of the radiation, then the dummy absorber is set in place, and electrical signals developed in each sensor are measured.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: November 17, 2015
    Assignee: HITACHI, LTD.
    Inventors: Taisuke Takayanagi, Hideaki Nishiuchi, Masahiro Tadokoro, Yusuke Fujii, Takeji Sakae, Toshiyuki Terunuma
  • Patent number: 9162081
    Abstract: A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adjacent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: October 20, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Yoshihito Hori, Takayoshi Matsushita, Kunio Moriyama, Masahiro Tadokoro
  • Publication number: 20150273241
    Abstract: The charged particle beam irradiation system includes a charged particle beam generating unit, scanning electromagnets, a beam irradiation apparatus, beam radiation dose measuring instrument(s), and a beam position measuring instrument for obtaining one or both of the position and the width of the beam scanned by the scanning electromagnets. The beam position measuring instrument obtains one or both of the position and the width of the beam for each irradiation spot and determines whether the obtained result is within an allowable range and obtains one or both of the position and the width of the charged particle beam for each split during irradiation to the spot with the charged particle beam regarding a split of which a dose is managed by dividing a part of or all of irradiation spots into irradiation sections and determines whether the obtained result is within an allowable range.
    Type: Application
    Filed: February 19, 2015
    Publication date: October 1, 2015
    Inventors: Yuki Ito, Koji Matsuda, Ryosuke Shinagawa, Masahiro Tadokoro, Arao Nishimura
  • Publication number: 20150194340
    Abstract: In high-NA ArF liquid immersion exposure after the 45 nm technology node, particularly, in microfabrication steps such as contact step, variation in the diameter of a contact hole or the like has occurred frequently. A silicon nitride-based insulating film is inserted between a multilayer resist and an insulating film to be processed in a contact step and the like. This makes it possible to reduce variation in the diameter of a contact hole in the contact step and the like.
    Type: Application
    Filed: December 30, 2014
    Publication date: July 9, 2015
    Inventors: Takuya Hagiwara, Tatsunori Murata, Masahiro Tadokoro
  • Publication number: 20150151140
    Abstract: A beam monitor system having a simple configuration for improving a measurement precision specifying a position and the width. A beam monitor system, comprising collection electrodes that include a plurality of groups each having a plurality of adjacent wire electrodes, and detect an ionized particle beam passing therethrough, a first signal processing device that sets one wire electrode in the groups of the collection electrodes as a typical wire electrode, receives a detection signal output from the typical wire electrode to process the signal and a beam monitor controller that obtains a beam position of the ionized particle beam that has passed through the wire electrodes on the basis of a processed signal from the first signal processing device.
    Type: Application
    Filed: November 20, 2014
    Publication date: June 4, 2015
    Inventors: Yoshihito HORI, Takayoshi MATSUSHITA, Kunio MORIYAMA, Masahiro TADOKORO
  • Patent number: 9044605
    Abstract: A charge collection electrode is formed of a plurality of groups each of which is made up of a plurality of adjoining wire electrodes. Further, all the wire electrodes are connected to channels of a signal processing device by the same number of lines as the wire electrodes belonging to one group so that each detection signal outputted from one wire electrode selected from each group is inputted through the same line and so that no two adjoining channels are physically continuous in regard to a certain set of consecutive measurement channels. The signal processing device determines group information indicating to which group the wire electrodes that sent the inputted detection signals belong and outputs a processing signal including the group information to a beam monitor controller. The beam monitor controller determines the position and the beam width of the charged particle beam that passed through the wire electrodes.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: June 2, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Yoshihito Hori, Kunio Moriyama, Tomohisa Iwamoto, Masahiro Tadokoro
  • Publication number: 20150041673
    Abstract: A charge collection electrode is formed of a plurality of groups each of which is made up of a plurality of adjoining wire electrodes. Further, all the wire electrodes are connected to channels of a signal processing device by the same number of lines as the wire electrodes belonging to one group so that each detection signal outputted from one wire electrode selected from each group is inputted through the same line and so that no two adjoining channels are physically continuous in regard to a certain set of consecutive measurement channels. The signal processing device determines group information indicating to which group the wire electrodes that sent the inputted detection signals belong and outputs a processing signal including the group information to a beam monitor controller. The beam monitor controller determines the position and the beam width of the charged particle beam that passed through the wire electrodes.
    Type: Application
    Filed: July 30, 2014
    Publication date: February 12, 2015
    Inventors: Yoshihito HORI, Kunio Moriyama, Tomohisa Iwamoto, Masahiro Tadokoro
  • Patent number: 8874385
    Abstract: The present invention provides, at low cost, a multilayer radiation detector whose position relative to a beam axis can be verified. The radiation detector includes a plurality of sensors that react to radiation and are stacked in parallel inlayers in a traveling direction of the radiation. The sensors are each sectioned into a central region including the center of the sensor and another region surrounding the central region. The radiation detector independently measures signals measured by the central regions and signals measured by the other regions. Thus, the position of the radiation detector can be verified.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: October 28, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Taisuke Takayanagi, Hideaki Nihongi, Yusuke Fujii, Hiroshi Akiyama, Masahiro Tadokoro, Rintaro Fujimoto
  • Patent number: 8684151
    Abstract: A loading apparatus for loading raw material into a processing apparatus includes an accommodation section accommodating the raw material, upstream and downstream paths through which the raw material is fed in an airtight state into the processing apparatus, a feeding mechanism that feeds in an airtight state the raw material from the accommodation section to the upstream path, a joint section that separates and joins the upstream and downstream paths, and a closing section, positioned in the second path, that can be opened and closed to maintain the processing apparatus and a portion of the downstream path located downstream of the closing section in an airtight state when the joint section separates the upstream and downstream paths. The downstream path is extendable and contractible to move its downstream end with respect to the joint section while the upstream and downstream paths remain joined.
    Type: Grant
    Filed: March 14, 2012
    Date of Patent: April 1, 2014
    Assignee: Sinfonia Technology Co., Ltd.
    Inventors: Masahiro Tadokoro, Takaya Nakamura
  • Patent number: 8674319
    Abstract: Disclosed is a beam monitor system in which signals outputted from a plurality of wires are divided in a multi-wire type monitor for measuring a beam profile of a charged particle beam, an identical number of the wires are grouped, the signals of the respective groups are taken out one piece by one piece to be connected with each other, and the number of the pieces, corresponding to a number of the wires belonging to the one group, are put together to be connected to a signal processor storing connection information.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: March 18, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Tomohisa Iwamoto, Yoshihito Hori, Takayoshi Matsushita, Kunio Moriyama, Masahiro Tadokoro
  • Publication number: 20130231517
    Abstract: Disclosed is a beam monitor system in which signals outputted from a plurality of wires are divided in a multi-wire type monitor for measuring a beam profile of a charged particle beam, an identical number of the wires are grouped, the signals of the respective groups are taken out one piece by one piece to be connected with each other, and the number of the pieces, corresponding to a number of the wires belonging to the one group, are put together to be connected to a signal processor storing connection information.
    Type: Application
    Filed: February 25, 2013
    Publication date: September 5, 2013
    Applicant: HITACHI, LTD.
    Inventors: Tomohisa IWAMOTO, Yoshihito HORI, Takayoshi MATSUSHITA, Kunio MORIYAMA, Masahiro TADOKORO
  • Publication number: 20120228081
    Abstract: A loading apparatus for loading raw material into a processing apparatus includes an accommodation section accommodating the raw material, upstream and downstream paths through which the raw material is fed in an airtight state into the processing apparatus, a feeding mechanism that feeds in an airtight state the raw material from the accommodation section to the upstream path, a joint section that separates and joins the upstream and downstream paths, and a closing section, positioned in the second path, that can be opened and closed to maintain the processing apparatus and a portion of the downstream path located downstream of the closing section in an airtight state when the joint section separates the upstream and downstream paths. The downstream path is extendable and contractible to move its downstream end with respect to the joint section while the upstream and downstream paths remain joined.
    Type: Application
    Filed: March 14, 2012
    Publication date: September 13, 2012
    Applicant: SINFONIA TECHNOLOGY CO., LTD.
    Inventors: Masahiro Tadokoro, Takaya Nakamura
  • Patent number: 8253113
    Abstract: A charged particle beam irradiation system includes a synchrotron which accelerates an ion beam, an irradiation apparatus for irradiating an object with the ion beam introduced from the synchrotron, detection means for measuring an amount of accumulated charge of the ion beam that orbits in the synchrotron immediately before an extraction control period in an operating cycle of the synchrotron, and beam extraction control means for controlling extraction of the ion beam based on the measurement result of the accumulated beam charge amount so that extraction of a total amount of the ion beam is to be completed with an expiration of an extraction control time, the extraction control time representing a length of the extraction control period of the synchrotron and being set in advance.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: August 28, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Nishiuchi, Kazuyoshi Saito, Masahiro Tadokoro, Hiroshi Akiyama, Kazuo Hiramoto
  • Patent number: 8092703
    Abstract: It is an object of the present invention to provide a method of manufacturing a semiconductor device that reduces the deterioration in processed configuration and the pattern roughness of a film to be processed, and is close to the original design and applicable to a dual damascene step and the like. The manufacturing method comprises a processing mask layer forming step of forming a processing mask layer (a lower organic film and a middle layer) comprising at least one film, and hardening treatment for at least one film of the processing mask layer by applying a film and heat hardening treatment; a processing mask layer etching step of applying a resist film for exposure to the processing mask layer, exposing and developing it to form a resist pattern, and etching the processing mask layer using the resist pattern as a mask; and a film to be processed etching step of etching the film to be processed using the pattern of the processing mask layer formed at the processing mask layer etching step as a mask.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: January 10, 2012
    Assignee: Renesas Electronics Corporation
    Inventors: Takeo Ishibashi, Kazumasa Yonekura, Masahiro Tadokoro, Kazunori Yoshikawa, Yoshiharu Ono
  • Publication number: 20110250752
    Abstract: In forming five trenches buried with an intermediate conductive layer for connecting transfer MISFETs and driving MISFETs with vertical MISFETs formed thereover, in which the second and third trenches, and the first, fourth, and fifth trenches are formed separately by twice etching using first and second photoresist films as a mask. Since all the trenches can be formed at a good accuracy even in a case where the shortest distance between the first trench and the second or third trench, and the shortest distance between the second or third trench and the fourth trench is smaller than the resolution limit for the exposure light, the distance between each of the five trenches arranged in one identical memory cell can be reduced to be smaller than resolution limit for the exposure light.
    Type: Application
    Filed: June 22, 2011
    Publication date: October 13, 2011
    Inventors: Hiraku Chakihara, Mitsuhiro Noguchi, Masahiro Tadokoro, Naonori Wada, Akio Nishida